US2006124467A1PendingUtilityA1
Metal nanodot arrays and fabrication methods thereof
Est. expiryMay 20, 2023(expired)· nominal 20-yr term from priority
C08F 8/50C08J 5/005B82Y 30/00
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Claims
Abstract
Metal nanodot arrays and fabrication methods thereof. A film of a block copolymer is deposited on a conductive substrate. The block copolymer comprises first polymer and second polymer blocks, wherein the first polymer blocks have a periodically ordered morphology. The first polymer blocks are selectively degraded to form a nanopatterned template comprising periodically ordered nanochannels. By electroplating, metal is deposited into the nanochannels that expose the conductive substrate, thus forming a metal nanodot array.
Claims
exact text as granted — not AI-modified1 . A method for fabricating a metal nanodot array, comprising:
providing a conductive substrate; depositing a film of a block copolymer on the conductive substrate, wherein the block copolymer comprises first polymer and second polymer blocks, the first polymer blocks forming a periodically ordered morphology; selectively degrading the first polymer blocks to form a nanopatterned template comprising periodically ordered nanochannels exposing the conductive substrate; and depositing metal into the nanochannels by electroplating, thereby forming the metal nanodot array.
2 . The method as claimed in claim 1 , wherein the conductive -substrate comprises a non-transparent substrate.
3 . The method as claimed in claim 1 , wherein the conductive substrate comprises a transparent substrate.
4 . The method as claimed in claim 1 , wherein the conductive substrate comprises conductive and non-conductive areas, and the step of depositing metal comprises selectively depositing metal into the nanochannels exposing the conductive areas.
5 . The method as claimed in claim 1 , wherein the conductive substrate comprises a periodic array of conductive areas.
6 . The method as claimed in claim 5. , wherein the conductive areas are arranged at an interval of about 1-300 μm.
7 . The method as claimed in claim 1 , wherein the metal is deposited by pulse electroplating.
8 . The method as claimed in claim 7 , wherein the pulse electroplating is performed with a current on/off ratio less than 10.
9 . The method as claimed in claim 1 , further comprising depositing more than one metals into the nanochannels by electroplating to form multi-level metal studs.
10 . The method as claimed in claim 1 , wherein the metal comprises one or more of Ni, Co, Fe, Mo, W, Pd, or alloys thereof.
11 . The method as claimed in claim 1 , further comprising forming a conductive layer overlying the nanopatterned template and the metal nanodot array.
12 . The method as claimed in claim 1 , further comprising removing the nanopatterned template after forming the metal nanodot array.
13 . The method as claimed in claim 12 , further comprising forming nanoscale objects using the metal nanodot array as catalyst after removing the nanopatterned template.
14 . The method as claimed in claim 13 , wherein the nanoscale objects comprise carbon nanotubes (CNTs).
15 . The method as claimed in claim 14 , wherein the nanopatterned template is removed by placing the substrate in a furnace at combustion atmosphere, and the carbon nanotubes are grown in-situ in the furnace at an elevated temperature.
16 . The method as claimed in claim 1 , wherein the first polymer blocks form a hexagonal cylindrical morphology with its axis perpendicular to a surface of the substrate.
17 . The method as claimed in claim 1 , wherein the first polymer blocks comprise poly(L-lactide), poly(D-lactide), poly(lactide), and the second polymer blocks comprise poly(styrene), poly(vinylpyridine), and poly(acrylonitrile).
18 . The method as claimed in claim 1 , wherein the first polymer blocks are poly(L-lactide) and the second polymer blocks are poly(styrene).
19 . The method as claimed in claim 1 , wherein the first polymer blocks are selectively degraded by hydrolysis.
20 . A metal nanodot array, comprising
a conductive substrate with conductive areas and non-conductive areas; and a metal nanodot array selectively disposed in the conductive areas of conductive substrate.
21 . The metal nanodot array as claimed in claim 20 , wherein the conductive substrate comprises a non-transparent substrate.
22 . The metal nanodot array as claimed in claim 20 , wherein the conductive substrate comprises a transparent substrate.
23 . The metal nanodot array as claimed in claim 20 , the conductive areas are formed as a periodic array.
24 . The metal nanodot array as claimed in claim 23 , the conductive areas have an interval of about 1-300 μm.
25 . The metal nanodot array as claimed in claim 20 , further comprising a nanopatterned template with periodically ordered nanochannels exposing the conductive substrate, and the metal nanodot array being disposed within the nanochannels that expose the conductive areas.
26 . The metal nanodot array as claimed in claim 25 , further comprising a conductive layer overlying the nanopatterned template and the metal nanodot array.
27 . The metal nanodot array as claimed in claim 20 , further comprising nanoscale objects overlying the metal nanodot array.
28 . The metal nanodot array as claimed in claim 27 , wherein the nanoscale objects comprises carbon nanotubes (CNTs).
29 . The metal nanodot array as claimed in claim 20 , wherein the metal nanodot array comprises multi-level metal studs formed of more than one metals.Join the waitlist — get patent alerts
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