Electroless plating method, electroless plating device, and production method and production device of semiconductor device

Abstract

The invention is purposed to reduce the amount of the electroless plating solution used for plating, to facilitate compositional control of the plating solution, and to prevent degradation of quality of the plating film (deposit) by oxygen dissolved in the plating solution. An electroless plating method in which a previously prepared electroless plating solution is exposed to a depressurized atmosphere to decrease the gas components existing in the solution, and while maintaining the plating solution in the form of a continuous thin layer, the surface to be plated of the substrate on which to form an electroless plating film is brought into contact with said layer of the plating solution and maintained in this state for a required period of time to perform electroless plating. An electroless plating device, and a production method and a production device of semiconductor devices are also disclosed.

1 . An electroless plating method comprising the step of carrying out an electroless plating treatment by, while keeping an electroless plating solution beforehand prepared at a continuous thin liquid layer, bringing a surface to be plated of a substrate, on which an electroless plating is to be formed, into contact with the liquid layer and by maintaining the contacting state for a prescribed period of time.  
     
     
         2 . The method according to  claim 1  wherein, in the electroless plating treatment step, the electroless plating solution is exposed to a depressurized atmosphere to decrease gas components staying dissolved in the solution.  
     
     
         3 . The method according to  claim 1  wherein said electroless plating treatment is conducted on each of the substrates piece by piece, and an amount of the electroless plating solution used per substrate is 5 to 150 ml.  
     
     
         4 . The method according to  claim 1  wherein the electroless plating solution, at least in a region where the electroless plating is to be conducted, is kept in a substantially closed atmosphere shut off from an outer air.  
     
     
         5 . The method according to  claim 1  wherein the layer of the plating solution is kept in a non-oxidizing atmosphere.  
     
     
         6 . The method according to  claim 1  wherein the liquid layer of the solution is substantially kept horizontally, and a downward facing surface to be plated of the substrate is brought into contact with the surface of the plating solution.  
     
     
         7 . The method according to  claim 1  wherein the surface to be plated has a copper interconnect, and an interconnect protective film is formed on said copper interconnect by said electroless plating.  
     
     
         8 . The method according to  claim 4  wherein the electroless plating treatment is carried out in a nitrogen gas or argon gas atmosphere.  
     
     
         9 . The method according to  claim 1  wherein, at least during the electroless plating treatment, an opening of a container forming the layer of the electroless plating solution is closed by the surface to be plated of the substrate.  
     
     
         10 . The method according to  claim 1  wherein a thickness of the layer of the electroless plating solution is 0.01 to 5 mm.  
     
     
         11 . The method according to  claim 1  wherein a flow of the electroless plating solution is stopped during the electroless plating treatment.  
     
     
         12 - 18 . (canceled)  
     
     
         19 . A method for producing a semiconductor device comprising the steps of: 
 holding a semiconductor substrate so as to bring a region, at which an interconnect protective film on the semiconductor substrate having a metal interconnect is to be formed, into contact with a thin layer of an electroless plating solution beforehand prepared;    degassing the electroless plating solution to decrease gas components therein; and    conducting an electroless plating treatment while shutting off an atmosphere of the electroless plating solution from an outer air to form the interconnect protective film.    
     
     
         20 . (canceled)