Pattern formation method and pattern formation apparatus, method for manufacturing device, electro-optical device, electronic device, and method for manufacturing active matrix substrate

Abstract

A pattern formation method for forming a film pattern upon a substrate, including the steps of: forming banks in a predetermined pattern upon the substrate; disposing liquid drops of a functional liquid at the end portions of groove portions which are defined between the banks; and after having disposed the drops at the end portions of the groove portions, disposing liquid drops in positions of the groove portions other than the end portions thereof.

1 . Pattern formation apparatus for forming a film pattern upon a substrate, comprising a liquid drop ejection device for disposing liquid drops of a functional liquid upon said substrate, wherein said liquid drop ejection device is adapted to: 
 dispose liquid drops at end portions of groove portions which are defined between banks which have been formed in advance upon said substrate according to a predetermined pattern; and    dispose liquid drops at positions of said groove portions other than said end portions after disposing said liquid drops at said end portions of groove.    
     
     
         2 . Pattern formation apparatus for forming a film pattern upon a substrate, comprising a liquid drop ejection device for disposing liquid drops of a functional liquid upon said substrate, wherein said liquid drop ejection device is adapted to: 
 dispose liquid drops at end portions of a pattern formation region upon said substrate in which a predetermined pattern is to be formed and around which a liquid repelling layer has been provided in advance; and    dispose liquid drops at positions of said pattern formation region other than said end portions after disposing said liquid drops at said end portions of said pattern formation region.