Substrate processing apparatus and substrate processing method

Abstract

A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.

1 . A substrate processing apparatus that is arranged adjacent to an exposure device, comprising: 
 a processing section for applying processing to a substrate; and    an interface for exchanging the substrate between said processing section and said exposure device, wherein    said processing section includes a first processing unit that applies a processing liquid to the substrate, and    said interface includes:    a second processing unit that dries the substrate after exposure processing by said exposure device; and    a transport device that transports the substrate between said processing unit, said exposure device, and said second processing unit.    
   
   
       2 . The substrate processing apparatus according to  claim 1 , wherein 
 said second processing unit dries the substrate by supplying an inert gas onto the substrate.    
   
   
       3 . The substrate processing apparatus according to  claim 1 , wherein 
 said interface further includes a third processing unit that applies given processing to the substrate and a platform on which the substrate is temporarily mounted, and    said transport device includes:    a first transport unit that transports the substrate between said processing section, said third processing unit, and said platform; and    a second transport unit that transports the substrate between said platform, said second processing unit, and said exposure device, and wherein    said second transport unit transports the substrate from said exposure device to said second processing unit.    
   
   
       4 . The substrate processing apparatus according to  claim 3 , wherein 
 said second transport unit comprises a first holder and a second holder each for holding the substrate, wherein    said second transport unit holds the substrate with said first holder when transporting the substrate before exposure processing by said exposure device, and    said second transport unit holds the substrate with said second holder when transporting the substrate after exposure processing by said exposure device.    
   
   
       5 . The substrate processing apparatus according to  claim 4 , wherein 
 said second holder is provided below said first holder.    
   
   
       6 . The substrate processing apparatus according to  claim 3 , wherein 
 said third processing unit includes an edge exposure unit for subjecting a peripheral portion of the substrate to exposure.    
   
   
       7 . The substrate processing apparatus according to  claim 1 , wherein 
 said second processing unit further cleans the substrate before drying the substrate.    
   
   
       8 . The substrate processing apparatus according to  claim 7 , wherein 
 said second processing unit comprises:    a substrate holding device that holds the substrate substantially horizontally;    a rotation-driving device that rotates the substrate held on said substrate holding device about an axis vertical to the substrate;    a cleaning liquid supplier that supplies a cleaning liquid onto the substrate held on said substrate holding device; and    an inert gas supplier that supplies an inert gas onto the substrate after the cleaning liquid has been supplied onto the substrate by said cleaning liquid supplier.    
   
   
       9 . The substrate processing apparatus according to  claim 8 , wherein 
 said inert gas supplier supplies the inert gas so that the cleaning liquid supplied onto the substrate from said cleaning liquid supplier is removed from the substrate as the cleaning liquid moves outwardly from the center of the substrate.    
   
   
       10 . The substrate processing apparatus according to  claim 8 , wherein 
 said second processing unit further comprises a rinse liquid supplier that supplies a rinse liquid onto the substrate after the supply of the cleaning liquid from said cleaning liquid supplier and before the supply of the inert gas from said inert gas supplier.    
   
   
       11 . The substrate processing apparatus according to  claim 10 , wherein 
 said inert gas supplier supplies the inert gas so that the rinse liquid supplied onto the substrate from said rinse liquid supplier is removed from the substrate as the rinse liquid moves outwardly from the center of the substrate.    
   
   
       12 . A substrate processing method for processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and comprises a processing section that includes a first processing unit and an interface that includes a transport device and a second processing unit, comprising the steps of: 
 applying a processing liquid to the substrate by said first processing unit in said processing section;    transporting the substrate from said processing section to said exposure device to said second processing unit by means of said transport device in said interface;    transporting the substrate after exposure processing by said exposure device by means of said transport device in said interface;    drying the substrate by said second processing unit in said interface; and    transporting the substrate dried by said second processing unit in said interface to said processing section by means of said transport device.    
   
   
       13 . The substrate processing method according to  claim 12 , further comprising the step of cleaning the substrate by said second processing unit, after said step of transporting the substrate to said second processing unit by means of said transport device and before said step of drying the substrate by said second processing unit.  
   
   
       14 . A substrate processing apparatus that is arranged adjacent to an exposure device, comprising: 
 a processing section for applying processing to a substrate; and    an interface for exchanging the substrate between said processing section and said exposure device, wherein    said processing section includes a first processing unit that applies a processing liquid to the substrate, and    said interface includes:    a second processing unit that applies cleaning processing to the substrate with a fluid nozzle that supplies a fluid mixture containing a liquid and a gas onto the substrate after exposure processing by said exposure device; and    a transport device that transports the substrate between said processing section, said exposure device, and said second processing unit.    
   
   
       15 . The substrate processing method according to  claim 14 , wherein 
 said second processing unit applies said cleaning processing to the substrate by supplying a fluid mixture containing an inert gas and a cleaning liquid from said fluid nozzle.    
   
   
       16 . The substrate processing method according to claim  14 , wherein 
 said second processing unit applies drying processing to the substrate after said cleaning processing to the substrate.    
   
   
       17 . The substrate processing method according to  claim 16 , wherein 
 said second processing unit includes an inert gas supplier that applies drying processing to the substrate by supplying an inert gas onto the substrate.    
   
   
       18 . The substrate processing method according to  claim 17 , wherein 
 said fluid nozzle functions as said inert gas supplier.    
   
   
       19 . The substrate processing method according to  claim 17 , wherein 
 said second processing unit further includes:    a substrate holding device that holds the substrate substantially horizontally; and    a rotation-driving device that rotates the substrate held on said substrate holding device about an axis vertical to the substrate.    
   
   
       20 . The substrate processing method according to  claim 17 , wherein 
 said second processing unit supplies the inert gas so that the fluid mixture supplied onto the substrate from said fluid nozzle is removed from the substrate as the fluid mixture moves outwardly from the center of the substrate.    
   
   
       21 . The substrate processing method according to  claim 17 , wherein 
 said second processing unit further includes a rinse liquid supplier that supplies a rinse liquid onto the substrate, after the supply of the fluid mixture from said fluid nozzle and before the supply of the inert gas from said inert gas supplier.    
   
   
       22 . The substrate processing method according to  claim 21 , wherein 
 said fluid nozzle functions as said rinse liquid supplier.    
   
   
       23 . The substrate processing method according to  claim 21 , wherein 
 said second processing unit supplies the inert gas so that the rinse liquid supplied onto the substrate from said rinse liquid supplier is removed from the substrate as the rinse liquid moves outwardly from the center of the substrate.    
   
   
       24 . The substrate processing method according to claim  14 , wherein 
 said fluid nozzle has a liquid flow passage through which a liquid flows, a gas flow passage through which a gas flows, a liquid discharge port having an opening that communicates with said liquid flow passage, and a gas discharge port that is provided near said liquid discharge port and having an opening that communicates with said gas flow passage.    
   
   
       25 . A substrate processing method for processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and comprises a processing section that includes a processing unit and an interface that includes a transport device and a second processing unit, comprising the steps of: 
 applying a processing liquid to the substrate by said first processing unit in said processing section;    transporting the substrate from said processing section to said exposure device by means of said transport device in said interface;    transporting the substrate after exposure processing by said exposure device to said second processing unit by means of said transport device in said interface;    cleaning the substrate by said second processing unit in said interface using a fluid nozzle that supplies a fluid mixture containing a liquid and a gas; and    transporting the substrate cleaned by said second processing unit in said interface to said processing section by means of said transport device.    
   
   
       26 . The substrate processing method according to  claim 25 , further comprising the step of drying the substrate by said second processing unit, after said step of cleaning the substrate by said second processing unit and before said step of transporting the substrate cleaned by said second processing unit to said processing section by means of said transport device.