Substrate processing apparatus and substrate processing method

Abstract

A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.

1 . A substrate processing apparatus that is arranged adjacent to an exposure device, comprising: 
 a processing section for applying processing to a substrate; and    an interface for exchanging the substrate between said processing section and said exposure device, wherein    said processing section includes a first processing unit that applies a processing liquid to the substrate, and    said interface includes:    a second processing unit that washes the substrate before exposure processing by said exposure device; and    a transport device that transports the substrate between said processing section, said exposure device, and said second processing unit.    
   
   
       2 . The substrate processing apparatus according to  claim 1 , wherein 
 said first processing unit applies a resist liquid to the substrate as the processing liquid.    
   
   
       3 . The substrate processing apparatus according to  claim 1 , wherein 
 said interface further includes a third processing unit that applies given processing to the substrate and a platform on which the substrate is temporarily mounted, and    said transport device includes:    a first transport unit that transports the substrate between said processing section, said third processing unit, and said platform; and    a second transport unit that transports the substrate between said platform, said second processing unit, and said exposure device, and wherein    said second transport unit transports the substrate from said platform to said second processing unit.    
   
   
       4 . The substrate processing apparatus according to  claim 3 , wherein 
 said third processing unit includes an edge exposure unit for subjecting a peripheral portion of the substrate to exposure.    
   
   
       5 . The substrate processing apparatus according to  claim 3 , wherein 
 said first transport unit comprises first and second holders for holding the substrate, and wherein    said first transport unit holds the substrate with said first holder when transporting the substrate before the exposure processing by said exposure device, and holds the substrate with said second holder when transporting the substrate after the exposure processing by said exposure device,    said second transport unit comprises third and fourth holders for holding the substrate, and wherein    said second transport unit holds the substrate with said third holder when transporting the substrate before the exposure processing by said exposure device, and holds the substrate with said fourth holder when transporting the substrate after the exposure processing by said exposure device.    
   
   
       6 . The substrate processing apparatus according to  claim 5 , wherein 
 said second holder is provided below said first holder, and said fourth holder is provided below said third holder.    
   
   
       7 . The substrate processing apparatus according to  claim 1 , wherein 
 said second processing unit further dries the substrate after washing the substrate.    
   
   
       8 . The substrate processing apparatus according to  claim 7 , wherein 
 said second processing unit comprises:    a substrate holding device that holds the substrate substantially horizontally;    a rotation-driving device that rotates the substrate held on said substrate holding device about an axis vertical to the substrate;    a washing liquid supplier that supplies a washing liquid onto the substrate held on said substrate holding device; and    an inert gas supplier that supplies an inert gas onto the substrate after the washing liquid has been supplied onto the substrate by said washing liquid supplier.    
   
   
       9 . The substrate processing apparatus according to  claim 8 , wherein 
 said inert gas supplier supplies the inert gas so that the washing liquid supplied onto the substrate from said washing liquid supplier is removed from the substrate as the washing liquid moves outwardly from the center of the substrate.    
   
   
       10 . The substrate processing apparatus according to  claim 8 , wherein 
 said second processing unit further comprises a rinse liquid supplier that supplies a rinse liquid onto the substrate after the supply of the washing liquid from said washing liquid supplier and before the supply of the inert gas from said inert gas supplier.    
   
   
       11 . The substrate processing apparatus according to  claim 10 , wherein 
 said inert gas supplier supplies the inert gas so that the rinse liquid supplied onto the substrate from said rinse liquid supplier is removed from the substrate as the rinse liquid moves outwardly from the center of the substrate.    
   
   
       12 . The substrate processing apparatus according to  claim 1 , wherein 
 said second processing unit washes the substrate by supplying a fluid mixture containing a washing liquid and a gas onto the substrate from a fluid nozzle.    
   
   
       13 . The substrate processing apparatus according to  claim 12 , wherein 
 said gas is an inert gas.    
   
   
       14 . The substrate processing apparatus according to  claim 12 , wherein 
 said second processing unit further dries the substrate after washing the substrate.    
   
   
       15 . The substrate processing apparatus according to  claim 14 , wherein 
 said second processing unit includes an inert gas supplier that dries the substrate by supplying an inert gas onto the substrate.    
   
   
       16 . The substrate processing apparatus according to  claim 15 , wherein 
 said fluid nozzle functions as said inert gas supplier.    
   
   
       17 . The substrate processing apparatus according to  claim 15 , wherein 
 said second processing unit further includes:    a substrate holding device that holds the substrate substantially horizontally; and    a rotation-driving device that rotates the substrate held on said substrate holding device about an axis vertical to the substrate.    
   
   
       18 . The substrate processing apparatus according to  claim 15 , wherein 
 said second processing unit supplies the inert gas so that the fluid mixture supplied onto the substrate from said fluid nozzle is removed from the substrate as the fluid mixture moves outwardly from the center of the substrate.    
   
   
       19 . The substrate processing apparatus according to  claim 15 , wherein 
 said second processing unit further includes a rinse liquid supplier that supplies a rinse liquid onto the substrate, after the supply of the fluid mixture from said fluid nozzle and before the supply of the inert gas from said inert gas supplier.    
   
   
       20 . The substrate processing apparatus according to  claim 19 , wherein 
 said fluid nozzle functions as said rinse liquid supplier.    
   
   
       21 . The substrate processing apparatus according to  claim 19 , wherein 
 said second processing unit supplies the inert gas so that the rinse liquid supplied onto the substrate from said rinse liquid supplier is removed from the substrate as the rinse liquid moves outwardly from the center of the substrate.    
   
   
       22 . The substrate processing apparatus according to  claim 12 , wherein 
 said fluid nozzle has a liquid flow passage through which a liquid flows, a gas flow passage through which a gas flows, a liquid discharge port having an opening that communicates with said liquid flow passage, and a gas discharge port that is provided near said liquid discharge port and having an opening that communicates with said gas flow passage.    
   
   
       23 . A substrate processing method for processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and comprises a first processing unit, a transport device, and a second processing unit, comprising the steps of: 
 applying a processing liquid to the substrate by said first processing unit;    transporting the substrate to said second processing unit by said transport device before exposure processing by said exposure device;    washing the substrate by said second processing unit; and    transporting the substrate washed by said second processing unit to said exposure device by said transport device.    
   
   
       24 . The substrate processing method according to  claim 23 , further comprising the step of drying the substrate by said second processing unit after said step of washing the substrate by said second processing unit and before said step of transporting the substrate to said exposure device by said transport device.