US2006077374A1PendingUtilityA1
Step and repeat imprint lithography systems
Est. expiryJul 11, 2022(expired)· nominal 20-yr term from priority
Inventors:Sidlgata V. SreenivasanMichael WattsByung-Jin ChoiMario Johannes MeisslNorman E. SchumakerRonald D. Voisin
H10P 76/20B29C 35/0888B29C 2059/023G03F 7/0002B29C 59/022B29C 2035/0827B81C 1/0046B82Y 10/00B82Y 40/00
48
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Claims
Abstract
Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.
Claims
exact text as granted — not AI-modified1 . A system for forming a pattern on a substrate, the system comprising: a body; an imprint head coupled to the body, positioned opposite said substrate, with said imprint head having a template positioned thereupon; and a device coupled to the body, said device aligning said template and said substrate.
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