Mirror holding mechanism in exposure apparatus, and device manufacturing method

Abstract

Disclosed is a mirror holding system by which aberration resulting from deformation or positional deviation of an optical member, causing degradation of imaging performance, can be reduced whereby a desired optical performance is assured. Also disclosed is an exposure apparatus and a device manufacturing method based on such mirror holding system. The holding system includes a supporting member for supporting the optical element at a plurality of supports which are movable along an approximately radial direction about a predetermined point.

1 . A holding system, comprising: 
 a supporting member for supporting an optical element approximately at six points through three first spherical members,    wherein said supporting member has three grooves each extending in an approximately radial direction about a predetermined point,    wherein the three grooves and the three first spherical members are engaged with each other to position the optical element, and    wherein each of the three grooves is movable in the approximately radiation direction.