Gas delivery device for improved deposition of dielectric material

Abstract

A gas delivery device useful in material deposition processes executed during semiconductor device fabrication in a reaction chamber, including the gas delivery device of the present invention and a method for carrying out a material deposition process, including introducing process gas into a reaction chamber using the gas delivery device of the present invention. In each embodiment, the gas delivery device of the present invention includes a plurality of active diffusers and a plurality of gas delivery nozzles, which extend into the reaction chamber. Before entering the reaction chamber through one of the plurality of gas delivery nozzles, process gas must first pass through one of the plurality active diffusers. Each of the active diffusers is centrally controllable such that the rate at which process gas flows through each active diffuser is exactly controlled at all times throughout a given deposition process.

1 . A process gas delivery device for a reaction chamber comprising: 
 a gas delivery system;    a plurality of gas delivery nozzles extending into a reaction chamber;    a plurality of active diffusers, each active diffuser of the plurality of active diffusers being controllable by a central controller to provide a desired amount of process gas flow from the gas delivery system, through the plurality of gas delivery nozzles, and into the reaction chamber.    
   
   
       2 . The process gas delivery device of  claim 1 , wherein the plurality of active diffusers comprises a plurality of piezoelectric valves.  
   
   
       3 . The process gas delivery device of  claim 1 , wherein the gas delivery system comprises: 
 a primary gas delivery line;    a plenum; and    a plurality of secondary gas delivery lines, each secondary gas delivery line of the plurality of secondary gas delivery lines extending between the plenum and an active diffuser included in the plurality of active diffusers.    
   
   
       4 . The process gas delivery device of  claim 3 , further comprising a plurality of tertiary gas delivery lines, each tertiary gas delivery line of the plurality of tertiary gas delivery lines extending between an active diffuser included in the plurality of active diffusers and a gas delivery nozzle of the plurality of gas delivery nozzles.  
   
   
       5 . The process gas delivery device of  claim 1 , wherein the plurality of active diffusers comprises a first plurality of active diffusers and a second plurality of active diffusers and the gas delivery system includes a primary gas delivery line, a plenum, a plurality of secondary gas delivery lines, each secondary gas delivery line of the plurality of secondary gas delivery lines extending between the plenum and an active diffuser of the first plurality of active diffusers and a plurality of tertiary gas delivery lines, each tertiary gas delivery line of the plurality of tertiary gas delivery lines extending between a first active diffuser of the first plurality of active diffusers and a second active diffuser of the second plurality of active diffusers.  
   
   
       6 . The process gas delivery device of  claim 1 , further comprising a manifold having an outside diameter and an inside diameter, wherein the plurality of gas delivery nozzles extending into the reaction chamber extends away from the inside diameter of the manifold, and each active diffuser of the plurality of active diffusers is disposed around the outside diameter of the manifold.  
   
   
       7 . The process gas delivery device of  claim 1 , further comprising: 
 a first manifold having a first inside diameter and a first outside diameter, each active diffuser of the plurality of active diffusers disposed around the first outside diameter and a plurality of gas passageways extending away from the first inside diameter; and    a second manifold having a second inside diameter and a second outside diameter, wherein the plurality of gas passageways extending away from the first inside diameter of the first manifold extends into the second outside diameter of the second manifold, forming sealed passageways enabling fluid communication between the first and the second manifolds and the plurality of gas delivery nozzles extends away from the second diameter of the second manifold.    
   
   
       8 . A reaction chamber comprising: 
 a sealable chamber sized and shaped such that at least one semiconductor substrate may be placed within the sealable chamber; and    a gas delivery device comprising a gas delivery system, a plurality of gas delivery nozzles extending into the reaction chamber, and a plurality of active diffusers, each active diffuser of the plurality of active diffusers being controllable by a central controller to provide a desired amount of process gas flow from the gas delivery system, through the plurality of gas delivery nozzles, and into the sealable chamber.    
   
   
       9 . The reaction chamber of  claim 8 , wherein the plurality of active diffusers of the gas delivery device comprises a plurality of piezoelectric valves.  
   
   
       10 . The reaction chamber of  claim 8 , wherein the gas delivery system of the gas delivery device comprises: 
 a primary gas delivery line;    a plenum; and    a plurality of secondary gas delivery lines, each secondary gas delivery line of the plurality of secondary gas delivery lines extending between the plenum and an active diffuser included in the plurality of active diffusers.    
   
   
       11 . The reaction chamber of  claim 10 , wherein the gas delivery system of the gas delivery device further comprises a plurality of tertiary gas delivery lines, each tertiary gas delivery line of the plurality of tertiary gas delivery lines extending between an active diffuser included in the plurality of active diffusers and a gas delivery nozzle of the plurality of gas delivery nozzles.  
   
   
       12 . The reaction chamber of  claim 11 , wherein the plurality of active diffusers of the gas delivery device comprises a first plurality of active diffusers and a second plurality of active diffusers, and the gas delivery system of the gas delivery device includes a primary gas delivery line, the plenum, a plurality of secondary gas delivery lines, each secondary gas delivery line of the plurality of secondary gas delivery lines extending between the plenum and an active diffuser of the first plurality of active diffusers, and a plurality of tertiary gas delivery lines, each tertiary gas delivery line of the plurality of tertiary gas delivery lines extending between a first active diffuser of the first plurality of active diffusers and a second active diffuser of the second plurality of active diffusers.  
   
   
       13 . The reaction chamber of  claim 8 , wherein the gas delivery device further comprises a manifold having an outside diameter and an inside diameter, the plurality of gas delivery nozzles extending into the reaction chamber extends away from the inside diameter of the manifold, and each active diffuser of the plurality of active diffusers is disposed around the outside diameter of the manifold.  
   
   
       14 . The reaction chamber of  claim 8 , wherein the gas delivery device further comprises: 
 a first manifold having a first inside diameter and a first outside diameter, wherein each active diffuser of the plurality of active diffusers is disposed around the first outside diameter and a plurality of gas passageways extends away from the first inside diameter; and    a second manifold having a second inside diameter and a second outside diameter, wherein the plurality of gas passageways extending away from the first inside diameter of the first manifold extends into the second outside diameter of the second manifold, forming sealed passageways enabling fluid communication between the first and the second manifolds, and the plurality of gas delivery nozzles extends away from the second diameter of the second manifold.    
   
   
       15 . A gas delivery device for a reaction chamber for a deposition process comprising: 
 a gas delivery system;    a plurality of gas delivery nozzles extending into a reaction chamber;    a plurality of active diffusers, each active diffuser of the plurality of active diffusers being controllable by a central controller to provide a desired amount of process gas flow from the gas delivery system, through the plurality of gas delivery nozzles, and into the reaction chamber.    
   
   
       16 . The gas delivery device of  claim 15 , wherein the plurality of active diffusers comprises a plurality of piezoelectric valves.  
   
   
       17 . The gas delivery device of  claim 15 , wherein the gas delivery system comprises: 
 a primary gas delivery line;    a plenum; and    a plurality of secondary gas delivery lines, each secondary gas delivery line of the plurality of secondary gas delivery lines extending between the plenum and an active diffuser included in the plurality of active diffusers.    
   
   
       18 . The gas delivery device of  claim 17 , further comprising a plurality of tertiary gas delivery lines, each tertiary gas delivery line of the plurality of tertiary gas delivery lines extending between an active diffuser included in the plurality of active diffusers and a gas delivery nozzle of the plurality of gas delivery nozzles.  
   
   
       19 . The gas delivery device of  claim 15 , wherein the plurality of active diffusers comprises a first plurality of active diffusers and a second plurality of active diffusers and the gas delivery system includes a primary gas delivery line, a plenum, a plurality of secondary gas delivery lines, each secondary gas delivery line of the plurality of secondary gas delivery lines extending between the plenum and an active diffuser of the first plurality of active diffusers and a plurality of tertiary gas delivery lines, each tertiary gas delivery line of the plurality of tertiary gas delivery lines extending between a first active diffuser of the first plurality of active diffusers and a second active diffuser of the second plurality of active diffusers.  
   
   
       20 . The gas delivery device of  claim 15 , further comprising a manifold having an outside diameter and an inside diameter, wherein the plurality of gas delivery nozzles extending into the reaction chamber extends away from the inside diameter of the manifold, and each active diffuser of the plurality of active diffusers is disposed around the outside diameter of the manifold.  
   
   
       21 . The gas delivery device of  claim 15 , further comprising: 
 a first manifold having a first inside diameter and a first outside diameter, each active diffuser of the plurality of active diffusers disposed around the first outside diameter and a plurality of gas passageways extending away from the first inside diameter; and    a second manifold having a second inside diameter and a second outside diameter, wherein the plurality of gas passageways extending away from the first inside diameter of the first manifold extends into the second outside diameter of the second manifold, forming sealed passageways enabling fluid communication between the first and the second manifolds and the plurality of gas delivery nozzles extends away from the second diameter of the second manifold.    
   
   
       22 . A chamber for a process comprising: 
 a sealable chamber sized and shaped such that at least one semiconductor substrate may be placed within the sealable chamber; and    a gas delivery device comprising a gas delivery system, a plurality of gas delivery nozzles extending into the sealable chamber, and a plurality of active diffusers, each active diffuser of the plurality of active diffusers being controllable by a central controller to provide a desired amount of gas flow from the gas delivery system, through the plurality of gas delivery nozzles, and into the sealable chamber.    
   
   
       23 . The chamber of  claim 22 , wherein the plurality of active diffusers of the gas delivery device comprises a plurality of piezoelectric valves.  
   
   
       24 . The chamber of  claim 22 , wherein the gas delivery system of the gas delivery device comprises: 
 a primary gas delivery line;    a plenum; and    a plurality of secondary gas delivery lines, each secondary gas delivery line of the plurality of secondary gas delivery lines extending between the plenum and an active diffuser included in the plurality of active diffusers.    
   
   
       25 . The chamber of  claim 24 , wherein the gas delivery system of the gas delivery device further comprises a plurality of tertiary gas delivery lines, each tertiary gas delivery line of the plurality of tertiary gas delivery lines extending between an active diffuser included in the plurality of active diffusers and a gas delivery nozzle of the plurality of gas delivery nozzles.  
   
   
       26 . The chamber of  claim 22 , wherein the plurality of active diffusers of the gas delivery device comprises a first plurality of active diffusers and a second plurality of active diffusers, and the gas delivery system of the gas delivery device includes a primary gas delivery line, a plenum, a plurality of secondary gas delivery lines, each secondary gas delivery line of the plurality of secondary gas delivery lines extending between the plenum and an active diffuser of the first plurality of active diffusers, and a plurality of tertiary gas delivery lines, each tertiary gas delivery line of the plurality of tertiary gas delivery lines extending between a first active diffuser of the first plurality of active diffusers and a second active diffuser of the second plurality of active diffusers.  
   
   
       27 . The chamber of  claim 22 , wherein the gas delivery device further comprises a manifold having an outside diameter and an inside diameter, the plurality of gas delivery nozzles extending into the sealable reaction chamber extends away from the inside diameter of the manifold, and each active diffuser of the plurality of active diffusers is disposed around the outside diameter of the manifold.  
   
   
       28 . The chamber of  claim 22 , wherein the gas delivery device further comprises: 
 a first manifold having a first inside diameter and a first outside diameter, wherein each active diffuser of the plurality of active diffusers is disposed around the first outside diameter and a plurality of gas passageways extends away from the first inside diameter; and    a second manifold having a second inside diameter and a second outside diameter, wherein the plurality of gas passageways extending away from the first inside diameter of the first manifold extends into the second outside diameter of the second manifold, forming sealed passageways enabling fluid communication between the first and the second manifolds, and the plurality of gas delivery nozzles extends away from the second diameter of the second manifold.    
   
   
       29 . A gas delivery device for a reaction chamber comprising: 
 a gas delivery system;    a plurality of gas delivery nozzles extending into a reaction chamber;    a plurality of active diffusers, each active diffuser of the plurality of active diffusers being controllable by a central controller to provide a desired amount of process gas flow from the gas delivery system, through the plurality of gas delivery nozzles, and into the reaction chamber.    
   
   
       30 . The gas delivery device of  claim 29 , wherein the plurality of active diffusers comprises a plurality of piezoelectric valves.  
   
   
       31 . The gas delivery device of  claim 29 , wherein the gas delivery system comprises: 
 a primary gas delivery line;    a plenum; and    a plurality of secondary gas delivery lines, each secondary gas delivery line of the plurality of secondary gas delivery lines extending between the plenum and an active diffuser included in the plurality of active diffusers.    
   
   
       32 . The gas delivery device of  claim 31 , further comprising a plurality of tertiary gas delivery lines, each tertiary gas delivery line of the plurality of tertiary gas delivery lines extending between an active diffuser included in the plurality of active diffusers and a gas delivery nozzle of the plurality of gas delivery nozzles.  
   
   
       33 . The gas delivery device of  claim 29 , wherein the plurality of active diffusers comprises a first plurality of active diffusers and a second plurality of active diffusers and the gas delivery system includes a primary gas delivery line, a plenum, a plurality of secondary gas delivery lines, each secondary gas delivery line of the plurality of secondary gas delivery lines extending between the plenum and an active diffuser of the first plurality of active diffusers and a plurality of tertiary gas delivery lines, each tertiary gas delivery line of the plurality of tertiary gas delivery lines extending between a first active diffuser of the first plurality of active diffusers and a second active diffuser of the second plurality of active diffusers.  
   
   
       34 . The gas delivery device of  claim 29 , further comprising a manifold having an outside diameter and an inside diameter, wherein the plurality of gas delivery nozzles extending into the reaction chamber extends away from the inside diameter of the manifold, and each active diffuser of the plurality of active diffusers is disposed around the outside diameter of the manifold.  
   
   
       35 . The gas delivery device of  claim 29 , further comprising: 
 a first manifold having a first inside diameter and a first outside diameter, each active diffuser of the plurality of active diffusers disposed around the first outside diameter and a plurality of gas passageways extending away from the first inside diameter; and    a second manifold having a second inside diameter and a second outside diameter, wherein the plurality of gas passageways extending away from the first inside diameter of the first manifold extends into the second outside diameter of the second manifold, forming sealed passageways enabling fluid communication between the first and the second manifolds and the plurality of gas delivery nozzles extends away from the second diameter of the second manifold.