US2006062909A1PendingUtilityA1
Mesostructured thin film, mesoporous thin film, and process for production thereof
Est. expirySep 10, 2019(expired)· nominal 20-yr term from priority
Inventors:Hirokatsu Miyata
B01J 20/28035B01J 20/28083B01J 20/28033C03C 2217/425C03C 17/009B01J 37/0215B01J 29/0308B01J 37/0219C03C 17/006C01B 37/02B01J 37/0217C03C 17/34C03C 2217/213C03C 17/007B01J 2229/64
51
PatentIndex Score
0
Cited by
0
References
0
Claims
Abstract
An excellent mesostructured thin film, and a process for producing the mesostructured thin film are provided. In the process, the mesostructured thin film having an oriented rod-like pore structure is formed on a surface of a polymer compound containing a sequence of two or more adjacent methylene groups in the repeating unit of the molecule.
Claims
exact text as granted — not AI-modified1 . A process for producing a mesostructured film having an uniaxially oriented rod-shaped pore structure, comprising the step of forming the mesostructured film on a polymer compound containing a sequence of two or more adjacent methylene groups in a molecular structure of the repeating unit of the polymer compound, wherein the surface of the polymer compound is uniaxially oriented.
2 . The process for producing a mesostructured film according to claim 1 , wherein the process comprises the step of preparing the polymer compound.
3 . The process for producing a mesostructured film according to claim 2 , wherein the step of preparing the polymer compound is the step of forming a film of the polymer compound on a base plate.
4 . The process for producing a mesostructured film according to claim 2 , wherein the step of preparing the polymer compound is the step of forming a Langmuir-Blodgett film as the film of the polymer compound.
5 . The process for producing a mesostructured film according to claim 1 , wherein the mesostructured film contains silicon.
6 . The process for producing a mesostructured film according to claim 5 , wherein the mesostructured film contains silica.
7 . The process for producing a mesostructured film according to claim 1 , wherein the mesostructured film is formed by hydrolyzing a silicon alkoxide.
8 . The process for producing a mesostructured film according to claim 1 , wherein the mesostructured film is formed by hydrolysis reaction in the presence of a surfactant.
9 . The process for producing a mesostructured film according to claim 8 , wherein the surfactant is a quaternary alkylammonium salt.
10 . The process for producing a mesostructured film according to claim 8 , wherein the surfactant contains a polyethylene oxide as the hydrophilic group.
11 . The process for producing a mesostructured film according to claim 8 , further comprising the step of removing the surfactant after forming the mesostructured film.
12 . The process for producing a mesostructured film according to claim 11 , wherein the step of removing the surfactant is the step of baking the mesostructured film.
13 . The process for producing a mesostructured film according to claim 11 , wherein the step of removing the surfactant is the step of removing the surfactant by solvent-extraction.
14 . The process for producing a mesostructured film according to claim 1 , wherein the mesostructured film is formed by hydrolysis reaction under an acidic condition.
15 . The process for producing a mesostructured film according to claim 1 , wherein the mesostructured film is formed by bringing a solution containing a material for the mesostructured film into contact with a surface of the polymer compound.
16 . The process for producing a mesostructured film according to claim 1 , wherein the number of a sequence of adjacent methylene groups in the repeating unit of the polymer compound ranges from 2 to 20.
17 . The process for producing a mesostructured film according to claim 1 , wherein the sequence of adjacent methylene groups in the repeating unit of the polymer compound is contained in the main chain of the polymer compound.
18 . The process for producing a mesostructured film according to claim 1 , wherein the sequence of adjacent methylene groups in the repeating unit of the polymer compound is contained in the side chain of the polymer compound.Join the waitlist — get patent alerts
Track US2006062909A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.