US2006054497A1PendingUtilityA1

Apparatus, method and system for monitoring chamber parameters associated with a deposition process

Individually held — no corporate assignee on recordPriority: Jan 27, 2003Filed: Nov 1, 2005Published: Mar 16, 2006
Est. expiryJan 27, 2023(expired)· nominal 20-yr term from priority
C23C 14/54H01J 37/3482C23C 14/543C23C 14/3407C23C 14/564
61
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

Apparatus and methods for measuring characteristics of a metallic target as well as other interior surfaces of a sputtering chamber. The apparatus includes a sensor configured to emit an energy beam toward a surface of interest and to detect an energy beam therefrom, the detected energy beam being indicative of parameters of a characteristic of interest of the surface of interest. Quantitative and qualitative characteristics of interest may be determined. A sputtering system including the apparatus and operable according to the methods of the invention is also disclosed.

Claims

exact text as granted — not AI-modified
1 . An apparatus for measuring at least one characteristic of a surface in a chamber, the apparatus comprising: 
 a sensor configured to emit a first energy beam relative to an evaluation surface, detect a second energy beam therefrom and provide an output signal from which at least one characteristic associated with the evaluation surface may be determined; and    an arm coupled to the sensor, the arm configured to transport the sensor relative to the surface.    
     
     
         2 . The apparatus of  claim 1 , wherein the evaluation surface is a surface in the chamber selected from the group consisting of a target surface, a chamber wall, a pedestal positioned proximate the target surface, and a substrate disposed on the pedestal.  
     
     
         3 . The apparatus of  claim 1 , wherein the at least one characteristic of the evaluation surface is selected from the group consisting of erosion of the evaluation surface, roughness of the evaluation surface, a presence of asperities on the evaluation surface, a composition of deposits on the evaluation surface, and a concentration of deposits on the evaluation surface.  
     
     
         4 . The apparatus of  claim 1 , wherein the first energy beam comprises a visible light beam, an ultraviolet light beam, an infrared light beam, a radio frequency beam, a microwave beam or an ultrasound beam.  
     
     
         5 . The apparatus of  claim 1 , further comprising a pedestal positioned proximate a target surface, the target surface comprising the evaluation surface in the chamber, wherein the sensor and the arm coupled thereto are configured, positioned and sized to enter a gap between the target surface and the pedestal, wherein the arm is further configured to transport the sensor into the gap without contacting the pedestal or the target surface.  
     
     
         6 . The apparatus of  claim 1 , wherein the sensor comprises: 
 a transceiver configured to emit the first energy beam toward the evaluation surface and to detect a first portion of the second energy beam; and    at least one first detector configured to detect a second portion of the second energy beam.    
     
     
         7 . The apparatus of  claim 6 , wherein the first portion of the second energy beam comprises a coherently reflected portion of the first energy beam from the evaluation surface, and the second portion of the second energy beam comprises a scattered portion of the first energy beam from the evaluation surface.  
     
     
         8 . The apparatus of  claim 6 , further comprising an imaging device configured to direct the first portion of the second energy beam to the transceiver and to direct the second portion of the second energy beam to the at least one first detector.  
     
     
         9 . The apparatus of  claim 6 , wherein the transceiver comprises a second detector and a source element configured to emit the first energy beam.  
     
     
         10 . The apparatus of  claim 1 , further comprising: 
 a transmitter optically coupled to the sensor, the transmitter configured to transmit the first energy beam to the sensor; and    a spectrometer optically coupled to the sensor, the spectrometer configured to generate sensory signals related to spectra of the second energy beam incident thereon.    
     
     
         11 . The apparatus of  claim 10 , wherein the spectrometer is selected from the group consisting of a Raman spectrometer and an infrared absorption spectrometer.  
     
     
         12 . The apparatus of  claim 10 , wherein the spectrometer comprises: 
 a first mirror;    a second mirror configured to move relative to the first mirror;    a beam splitter interposed between the first mirror and the second mirror; and    a receiver configured to generate the sensory signals.    
     
     
         13 . A method for measuring surface characteristics, the method comprising: 
 selectively positioning a sensor relative to an evaluation surface;    illuminating a portion of the evaluation surface with a first energy beam;    detecting a second energy beam from the portion of the evaluation surface illuminated; and    analyzing the second energy beam to determine at least one characteristic of the evaluation surface.    
     
     
         14 . The method of  claim 13 , wherein the at least one characteristic of the evaluation surface is selected from the group consisting of erosion of the evaluation surface, roughness of the evaluation surface, a presence of asperities on the evaluation surface, a composition of deposits on the evaluation surface, and a concentration of deposits on the evaluation surface.  
     
     
         15 . The method of  claim 13 , wherein selectively positioning the sensor comprises moving the sensor to a location proximate the portion of the evaluation surface.  
     
     
         16 . The method of  claim 13 , wherein selectively positioning the sensor comprises inserting the sensor into a gap between a target surface and a pedestal positioned proximate the target surface.  
     
     
         17 . The method of  claim 13 , wherein selectively positioning the sensor comprises placing the sensor proximate a window outside the sputtering chamber.  
     
     
         18 . The method of  claim 17 , further comprising emitting the first energy beam into the sputtering chamber through the window.  
     
     
         19 . The method of  claim 13 , wherein detecting the second energy beam further comprises: 
 detecting a coherently reflected portion of the energy beam; and    detecting a scattered portion of the energy beam.    
     
     
         20 . The method of  claim 19 , further comprising collecting the coherently reflected portion of the energy beam and the scattered portion of the energy beam into a plurality of optical fibers.  
     
     
         21 . The method of  claim 19 , wherein illuminating the portion of the evaluation surface with the energy beam comprises emitting a coherent light beam from the sensor.  
     
     
         22 . The method of  claim 21 , wherein emitting the coherent light beam comprises collimating the coherent light beam as it exits an optical fiber.  
     
     
         23 . The method of  claim 13 , wherein illuminating the portion of the evaluation surface with the first energy beam comprises illumination with a visible light beam, an ultraviolet light beam, an infrared light beam, a radio frequency beam, a microwave beam or an ultrasound beam.  
     
     
         24 . The method of  claim 13 , wherein detecting the second energy beam comprises receiving at least a Raman scattered light beam as the second energy beam.  
     
     
         25 . The method of  claim 13 , wherein analyzing the second energy beam further comprises performing a spectral analysis.  
     
     
         26 . The method of  claim 25 , wherein performing the spectral analysis comprises employing Raman spectroscopy.  
     
     
         27 . The method of  claim 25 , wherein performing the spectral analysis comprises employing a Fourier-transform analysis.

Join the waitlist — get patent alerts

Track US2006054497A1 — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.