Substrate processing apparatus and substrate processing method

Abstract

A substrate processing apparatus according to the present invention comprises a substrate holding mechanism for holding a substrate and rotating the held substrate; a process liquid supply mechanism for supplying a process liquid to the substrate; a process liquid acquisition section arranged so as to enclose the substrate holding mechanism and having an acquisition port for acquiring the process liquid scattered by the rotation of the substrate; a movement mechanism for changing a relative position between the process liquid acquisition section and the substrate held by the substrate holding mechanism; and a control mechanism for controlling, when the process liquid scattered by the rotation of the substrate is acquired in the acquisition port, a relative position between the substrate and the acquisition port such that the scattered process liquid is acquired in the acquisition port on the basis of predetermined substrate process condition.

1 . A substrate processing apparatus comprising: 
 a substrate holding mechanism for holding a substrate and rotating the held substrate;    a process liquid supply mechanism for supplying a process liquid to the substrate held by the substrate holding mechanism;    a process liquid acquisition section arranged so as to enclose the substrate holding mechanism and having an acquisition port for acquiring the process liquid scattered by the rotation of the substrate held by the substrate holding mechanism;    a movement mechanism for changing a relative position between the process liquid acquisition section and the substrate held by the substrate holding mechanism; and    a control mechanism for controlling, when the process liquid scattered by the rotation of the substrate held by the substrate holding mechanism is acquired in the acquisition port, a relative position between the substrate held by the substrate holding mechanism and the acquisition port such that the scattered process liquid is acquired in the acquisition port on the basis of predetermined substrate process condition.    
   
   
       2 . The substrate processing apparatus according to  claim 1 , wherein 
 the substrate process condition is the rotation speed of the substrate held by the substrate holding mechanism.    
   
   
       3 . The substrate processing apparatus according to claim  2 , wherein 
 the control mechanism carries out control, in the relative position to the substrate held by the substrate holding mechanism, such that the position of the acquisition port in a case where the rotation speed is a first speed is higher than the position of the acquisition port in a case where the rotation speed is a second speed lower than the first speed.    
   
   
       4 . The substrate processing apparatus according to  claim 1 , wherein 
 the substrate process condition is the state of the process liquid supplied from the process liquid supply mechanism.    
   
   
       5 . The substrate processing apparatus according to  claim 4 , wherein 
 the state of the process liquid is the concentration of the process liquid supplied from the process liquid supply mechanism.    
   
   
       6 . The substrate processing apparatus according to  claim 5 , wherein 
 the control mechanism carries out control, in the relative position to the substrate held by the substrate holding mechanism, such that the position of the acquisition port in a case where the concentration of the process liquid supplied from the process liquid supply mechanism is a first concentration is higher than the position of the acquisition port in a case where the concentration of the process liquid is a second concentration higher than the first concentration.    
   
   
       7 . The substrate processing apparatus according to  claim 4 , wherein 
 the state of the process liquid is the temperature of the process liquid supplied from the process liquid supply mechanism.    
   
   
       8 . The substrate processing apparatus according to  claim 7 , wherein 
 the control mechanism carries out control, in the relative position to the substrate held by the substrate holding mechanism, such that the position of the acquisition port in a case where the temperature of the process liquid supplied from the process liquid supply mechanism is a first temperature is higher than the position of the acquisition port in a case where the temperature of the process liquid is a second temperature lower than the first temperature.    
   
   
       9 . The substrate processing apparatus according to  claim 4 , wherein 
 the state of the process liquid is the viscosity of the process liquid supplied from the process liquid supply mechanism.    
   
   
       10 . The substrate processing apparatus according to  claim 9 , wherein 
 the control mechanism carries out control, in the relative position to the substrate held by the substrate holding mechanism, such that the position of the acquisition port in a case where the viscosity of the process liquid supplied from the process liquid supply mechanism is a first viscosity is higher than the position of the acquisition port in a case where the viscosity of the process liquid is a second viscosity higher than the first viscosity.    
   
   
       11 . The substrate processing apparatus according to  claim 1 , wherein 
 the substrate process condition is the supply angle of the process liquid supplied from the process liquid supply mechanism.    
   
   
       12 . The substrate processing apparatus according to  claim 1 , wherein 
 the substrate process condition is the supply position on a surface of the substrate of the process liquid supplied from the process liquid supply mechanism.    
   
   
       13 . The substrate processing apparatus according to  claim 1 , wherein 
 the substrate process condition is the type of the process liquid supplied from the process liquid supply mechanism.    
   
   
       14 . The substrate processing apparatus according to  claim 1 , further comprising 
 a storage mechanism storing the most suitable relative position, corresponding to the substrate process conditions, between the substrate held by the substrate holding mechanism and the acquisition port,    the control mechanism controlling the movement mechanism on the basis of the storage mechanism.    
   
   
       15 . The substrate processing apparatus according to  claim 1 , further comprising 
 a detection mechanism for detecting the measured values of the substrate process conditions,    the control mechanism controlling the movement mechanism on the basis of the measured values detected by the detection mechanism.    
   
   
       16 . The substrate processing apparatus according to  claim 15 , wherein 
 the substrate process condition comprises the concentration of the process liquid supplied from the process liquid supply mechanism,    the detection mechanism comprises a concentration detection mechanism for detecting the concentration of the process liquid supplied from the process liquid supply mechanism.    
   
   
       17 . The substrate processing apparatus according to  claim 15 , wherein 
 the detection mechanism comprises a liquid amount detection mechanism for detecting the amount of the process liquid acquired in the process liquid acquisition section.    
   
   
       18 . In a substrate processing method for supplying a process liquid to a substrate and rotating the substrate to treat the substrate, 
 a substrate processing method comprising the step of controlling, when a process liquid acquisition section arranged so as to enclose the substrate and having an acquisition port for acquiring the process liquid scattered by the rotation of the substrate is used to acquire the process liquid scattered from the substrate in the acquisition port, a relative position between the substrate and the acquisition port such that the scattered process liquid is acquired in the acquisition port on the basis of predetermined substrate process condition.