Metal based coating composition and related coated substrates

Abstract

A coated substrate is disclosed. The coated substrate includes a substrate and a coating composition over the substrate comprising at least one metal based layer selected from tungsten, chromium, tantalum, molybdenum, aluminum, niobium, and mixtures and alloys thereof; and mixtures and alloys of cobalt and chromium; and at least one dielectric layer including Si x N y , where x/y ranges from 0.75 to 1.5, over the metal based layer. The ΔE cmc(1.5:1) (T), ΔE cmc(1.5:1) (R1) and ΔE cmc(1.5:1) (R2) of a non-heat treated, coated substrate as compared to a heat treated, coated substrate according to the present invention are no greater than 8 units.

1 . A coated substrate comprising: 
 a. a substrate; and    b. a coating composition over the substrate comprising: 
 i. at least one metal based layer selected from tungsten, chromium, tantalum, molybdenum, aluminum, niobium, and mixtures and alloys thereof; and alloys of cobalt and chromium; and  
 ii. at least one dielectric layer comprising Si x N y , where x/y ranges from 0.75 to 1.5, over the metal based layer.  
   
     
     
         2 . The coated substrate according to  claim 1 , wherein the metal based layer comprises an alloy of cobalt and chromium.  
     
     
         3 . The coated substrate according to  claim 2 , wherein the metal based layer has a thickness ranging from 1 nm to 50 nm.  
     
     
         4 . The coated substrate according to  claim 1 , wherein the dielectric layer is Si 3 N 4 .  
     
     
         5 . The coated substrate according to  claim 4 , wherein the dielectric layer has a thickness of greater than or equal to 5 nm.  
     
     
         6 . The coated substrate according to  claim 4 , further comprising a layer of titanium nitride, chromium nitride, tungsten nitride or mixtures thereof over the dielectric layer.  
     
     
         7 . The coated substrate according to  claim 1 , wherein the dielectric layer is a multiple film configuration comprising (i) a first dielectric film comprising Si x N y  having an index of refraction; (ii) a second dielectric film over the first dielectric film having an index of refraction lower than the index of refraction of the first dielectric film; and (iii) a third dielectric film comprising Si x N y  over the second film.  
     
     
         8 . The coated substrate according to  claim 7 , wherein the first and third dielectric films are the same material.  
     
     
         9 . The coated substrate according to  claim 7 , wherein the second dielectric film is silicon dioxide.  
     
     
         10 . The coated substrate according to  claim 1 , further comprising a protective overcoat as the last layer of the coating stack, the protective overcoat selected from silicon dioxide, zirconium dioxide, titanium dioxide, niobium dioxide, chromium dioxide and silicon oxynitride as well as mixtures thereof.  
     
     
         11 . The coated substrate according to  claim 1 , wherein a non-heat treated, coated substrate as compared to a heat treated, coated substrate has a ΔE cmc(1.5:1)  (T), a ΔE cmc(1.5:1)  (R1) and a ΔE cmc(1.5:1)  (R2) no greater than 8 units.  
     
     
         12 . The coated substrate according to  claim 1 , wherein the substrate is glass.  
     
     
         13 . The coated substrate according to  claim 12 , wherein the glass substrate is incorporated into an insulating glass unit.  
     
     
         14 . The coated substrate according to  claim 13 , incorporated into an insulating glass unit, wherein the insulating glass unit exhibits at least one of the following: a visible transmittance of no greater than 90% and an R2 visible light reflectance of greater than 4%.  
     
     
         15 . A coated substrate comprising: 
 a. a substrate;    b. a first dielectric layer comprising Si x N y , where x/y ranges from 0.75 to 1.5 over the substrate;    c. a metal based layer selected from tungsten, chromium, tantalum, molybdenum, aluminum and mixtures and alloys thereof; and alloys of cobalt and chromium over the first dielectric layer; and    d. a second dielectric layer comprising Si x N y , where x/y ranges from 0.75 to 1.5, over the metal based layer.    
     
     
         16 . The coated substrate according to  claim 15 , wherein the first and/or second dielectric layer is a multiple film configuration comprising (i) a first dielectric film comprising Si x N y  having an index of refraction; (ii) a second dielectric film over the first dielectric film having an index of refraction lower than the index of refraction of the first dielectric film; and (iii) a third dielectric film comprising Si x N y  over the second film.  
     
     
         17 . The coated substrate according to  claim 15 , wherein the metal based layer comprises an alloy of cobalt and chromium.  
     
     
         18 . The coated substrate according to  claim 17 , wherein the metal based layer has a thickness ranging from 1 nm to 50 nm.  
     
     
         19 . The coated substrate according to  claim 15 , wherein the first and/or second dielectric layer is Si 3 N 4 .  
     
     
         20 . The coated substrate according to  claim 19 , wherein the first and/or second dielectric layer has a thickness of greater than or equal to 5 nm.  
     
     
         21 . The coated substrate according to  claim 15 , wherein a non-heat treated, coated substrate as compared to a heat treated, coated substrate has a ΔE cmc(1.5:1)  (T), a ΔE cmc(1.5:1)  (R1) and a ΔE cmc(1.5:1)  (R2) no greater than or equal to 8 units.  
     
     
         22 . The coated substrate according to  claim 15  wherein the substrate is glass.  
     
     
         23 . A coated substrate comprising: 
 a. a first metal based layer selected from tungsten, chromium, tantalum, molybdenum, aluminum, niobium, and mixtures and alloys thereof; and alloys of cobalt and chromium over a substrate;    b. an infrared reflective layer over the first metal based layer;    c. a second metal based layer selected from tungsten, chromium, tantalum, molybdenum, aluminum, niobium, and mixtures and alloys thereof; and alloys of cobalt and chromium over the infrared reflective layer; and    d. a dielectric layer over the second metal based layer.    
     
     
         24 . A coated substrate according to  claim 23 , wherein the infrared reflective layer is selected from gold, copper and silver as well as mixtures and alloys thereof.  
     
     
         25 . A coated substrate according to  claim 24 , wherein the infrared reflective layer is silver.  
     
     
         26 . The coated substrate according to  claim 24 , wherein the infrared reflective layer has a thickness ranging from 1 nm to 50 nm.  
     
     
         27 . A method for making a coated substrate comprising: 
 a. depositing a metal based layer selected from tungsten, chromium, tantalum, molybdenum, aluminum, niobium, and mixtures and alloys thereof; and alloys of cobalt and chromium on a substrate; and    b. depositing a dielectric layer comprising Si x N y , where x/y ranges from 0.75 to 1.5, over the metal based layer.    
     
     
         28 . The method according to  claim 27 , wherein depositing the metal based layer comprises depositing an alloy of cobalt and chromium.  
     
     
         29 . The method according to  claim 28 , wherein depositing the metal based layer comprises depositing a layer having a thickness ranging from 1 nm to 50 nm.  
     
     
         30 . The method according to  claim 27 , wherein depositing the dielectric layer comprises depositing Si 3 N 4 .  
     
     
         31 . The method according to  claim 30 , wherein depositing the dielectric layer comprises depositing a layer having a thickness of greater than or equal to 5 nm.  
     
     
         32 . A method for modifying the R1 color of a coated substrate including a first dielectric layer comprising Si x N y  over the substrate, a metal based layer selected from tungsten, chromium, aluminum, tantalum, molybdenum and mixtures and alloys thereof, and mixtures and alloys of cobalt and chromium over the first dielectric layer, and a second dielectric layer comprising Si x N y  over the metal based layer, wherein x/y ranges from 0.75 to 1.5, comprising adjusting the thickness of the second dielectric layer.  
     
     
         33 . A method for modifying the R2 color of a coated substrate including a first dielectric layer comprising Si x N y  over the substrate, a metal based layer selected from tungsten, tantalum, chromium, aluminum, molybdenum and mixtures and alloys thereof, and mixtures and alloys of cobalt and chromium over the first dielectric layer and a second dielectric layer comprising Si x N y , where x/y ranges from 0.75 to 1.5, over the metal based layer, comprising adjusting the thickness of the first dielectric layer.