US2006046026A1PendingUtilityA1

Transparent conductive film and its manufacturing method, and photoelectric conversion device comprising it

Assignee: KANEKA CORPPriority: Nov 21, 2000Filed: Oct 7, 2005Published: Mar 2, 2006
Est. expiryNov 21, 2020(expired)· nominal 20-yr term from priority
C03C 17/3464Y10T428/24364C23C 16/407Y02E10/50C03C 17/3482C03C 2217/77H10F 77/1692H10F 77/70H10F 71/138H10F 77/703H10F 77/707H10F 77/251H10F 77/244
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Claims

Abstract

A transparent conductive film wherein the height number distribution of projections present on the surface is expressed by a distribution function of X 2 type having a degree of freedom of 3.5 to 15 when the unit of the horizontal axis is a nanometer, the height/width ratio number distribution is expressed by a distribution function of X 2 type having a degree of freedom of 10-35X 2 , the projections having a height of 50-350 nm account for 70% of more, and the projections having a height/width ratio of 0.25-1.02 account for 90% or more.

Claims

exact text as granted — not AI-modified
1 - 10 . (canceled)  
     
     
         11 . A manufacturing method for a transparent conductive film, 
 wherein a transparent conductive film is formed on a surface of a substrate at 550° C. to 650° C. through a thermal decomposition method, and    wherein a mixed gas used in the thermal decomposition method includes at least 10 mole percent of a gas whose density in a standard state is not more than 1 g/L.    
     
     
         12 . The manufacturing method for a transparent conductive film according to  claim 11 , 
 wherein the gas is an inert gas.    
     
     
         13 . The manufacturing method for a transparent conductive film according to  claim 12 , 
 wherein the inert gas is helium.    
     
     
         14 . A manufacturing method for a transparent conductive film, 
 wherein a transparent conductive film is formed through a thermal decomposition method, and    wherein a mixed gas used in the thermal decomposition method includes a chlorine atom containing gas at a concentration of not more than 10 mole percent and tin compounds.    
     
     
         15 . The manufacturing method for a transparent conductive film according to  claim 14 , 
 wherein the chlorine atom containing gas is hydrogen chloride.    
     
     
         16 . The manufacturing method for a transparent conductive film according to  claim 14 , 
 wherein the chlorine atom containing gas is chlorine.    
     
     
         17 - 20 . (canceled)

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