Master base for fabrication and method for manufacturing the same

Abstract

A master base for fabrication includes a substrate, a first photoresist layer disposed on the substrate, and a second photoresist layer disposed on the first photoresist layer, wherein the first photoresist layer attenuates or absorbs rays reflected at the interface between the first photoresist layer and the substrate to prevent the reflected rays from interfering with applied rays in a exposing step. A method for manufacturing a master base for fabrication includes the steps of forming a first photoresist layer on a substrate, baking the first photoresist layer at the setting temperature of the first photoresist layer, and forming a second photoresist layer on the first photoresist layer.

1 - 2 . (canceled)  
   
   
       3 . A method for manufacturing a master base for fabrication comprising the steps of: 
 forming a first photoresist layer on a substrate;    baking the first photoresist layer at the setting temperature of the first photoresist layer, and    forming a second photoresist layer on the first photoresist layer.    
   
   
       4 . The method for manufacturing a master base for fabrication according to  claim 3 , wherein the first photoresist layer comprises a plurality of sublayers, and the plurality of sublayers are prepared by repeating the steps of forming a sublayer comprising a photoresist material to bake the sublayer at the setting temperature of the photoresist material.