Low reflective antistatic hardcoat film

Abstract

A low reflective antistatic film is provided which can prevent electrostatic deposition of foreign materials on the surface thereof, has hardness enough high not to cause a deterioration in transparency derived from a scratch or the like created upon being rubbed, and can prevent reflection of outdoor daylight from the surface of a transparent substrate. The low reflective antistatic film comprises: a transparent substrate film; and, provided on the transparent substrate film in the following order, a transparent conductive layer, a hardcoat layer, and a low refractive layer, the low refractive layer having a lower refractive index than the hardcoat.

1 . A low reflective antistatic hardcoat film comprising: 
 a transparent substrate film;    a transparent conductive layer formed on the transparent substrate film;    a hardcoat layer formed on the conductive layer; and    a low refractive layer formed on the hardcoat layer, the low refractive layer having a lower refractive index than the hardcoat layer.    
   
   
       2 . The low reflective antistatic hardcoat film according to  claim 1 , which has a surface resistivity of no more than 2×10 12  Ω/□.  
   
   
       3 . The low reflective antistatic hardcoat film according to  claim 1 , wherein the transparent conductive layer has a surface resistivity of no more than 10 12  Ω/□.  
   
   
       4 . The low reflective antistatic hardcoat film according to  claim 1 , which has a surface resistivity of no more than 2×10 12  Ω/□ as measured in the form of a laminate of the transparent conductive layer and the hardcoat layer provided in that order on the transparent substrate film.  
   
   
       5 . The low reflective antistatic hardcoat film according to  claim 1 , wherein the hardcoat layer has a volume resistivity in the direction of the thickness of no more than 10 8  Ω·cm.  
   
   
       6 . The low reflective antistatic hardcoat film according to  claim 1 , wherein the hardcoat layer comprises a reaction curing resin composition.  
   
   
       7 . The low reflective antistatic hardcoat film according to  claim 6 , wherein 10 to 100% by weight of the resin component in the reaction curing resin composition is accounted for by a reactive organosilicon compound.  
   
   
       8 . The low reflective antistatic hardcoat film according to  claim 1 , wherein the hardcoat layer has a thickness of 1 to 50 μm.  
   
   
       9 . The low reflective antistatic hardcoat film according to  claim 1 , wherein the low refractive layer comprises an inorganic compound layer.  
   
   
       10 . The low reflective antistatic hardcoat film according to  claim 9 , wherein the inorganic compound layer comprises a layer of SiO X  wherein x is 1≦x≦2.  
   
   
       11 . The low reflective antistatic hardcoat film according to  claim 9 , wherein the low refractive layer has been formed by vacuum deposition.  
   
   
       12 . The low reflective antistatic hardcoat film according to  claim 1 , wherein the hardcoat layer comprises a high refractive layer.  
   
   
       13 . The low reflective antistatic hardcoat film according to  claim 12 , wherein the hardcoat layer contains high refractive ultrafine particles.  
   
   
       14 . The low reflective antistatic hardcoat film according to  claim 13 , wherein the high refractive ultrafine particles have a particle diameter of 1 to 50 nm and a refractive index of 1.60 to 2.70.  
   
   
       15 . The low reflective antistatic hardcoat film according to  claim 1 , wherein the low refractive layer comprises a layer formed by a sol-gel process.  
   
   
       16 . The low reflective antistatic hardcoat film according to  claim 15 , wherein the layer formed by the sol-gel process is a layer of SiO 2  gel.  
   
   
       17 . The low reflective antistatic hardcoat film according to  claim 1 , wherein the low refractive layer is a layer of an organic fluorocompound.  
   
   
       18 . The low reflective antistatic hardcoat film according to  claim 17 , wherein the organic fluorocompound layer comprises a fluorinated vinylidene copolymer.