Exposure device and exposure method

Abstract

An exposure device includes a distance measurement section, which measures heights of positions of an exposure surface of a photosensitive material, a hole position identification section, which determines positions of holes in the exposure surface of the photosensitive material, a hole co-ordinate measurement section, which identifies hole positions at the photosensitive material, a displacement data generation section, and a focusing section, which performs focusing control for aligning a focusing position of a light beam from an exposure section with the exposure surface. When a displacement amount of at least a predetermined magnitude is detected by the distance measurement section, the displacement data generation section excludes a position which is judged to be a hole on the basis of results of determinations by the hole position identification section and the hole position identification section, and the displacement data generation section prepares displacement data for focusing control by the focusing section.

1 . An exposure device for exposing a photosensitive material with an exposure section which emits a light beam modulated in accordance with image data while the photosensitive material is relatively moved, the exposure device comprising: 
 a hole position identification section, which determines a position of a hole in an exposure surface of the photosensitive material;    a focusing section, which performs focusing control for causing a focusing position of the light beam from the exposure section to coincide with the exposure surface; and    a displacement data generation section, which generates displacement data for the focusing control by the focusing section, excluding a position which is determined, on the basis of results of determination by the hole position identification section, to be the hole.    
   
   
       2 . The exposure device of  claim 1 , wherein the hole position identification section determines the position of the hole in the exposure surface of the photosensitive material on the basis of measurement data of heights of positions of the exposure surface of the photosensitive material from a distance measurement section, which measures the heights of positions of the exposure surface of the photosensitive material, and 
 the displacement data generation section generates the displacement data without utilizing the measurement data for the position which is determined to be the position of the hole in the exposure surface of the photosensitive material.    
   
   
       3 . The exposure device of  claim 2 , wherein the displacement data generation section compares the measurement data at a first measurement position according to the distance measurement section with the measurement data at a measurement position near the first measurement position according to the distance measurement section and, if a difference between values of these measurement data exceeds a predetermined value, corrects or disregards the measurement data at the first measurement position according to the distance measurement section.  
   
   
       4 . The exposure device of  claim 1 , wherein the hole position identification section comprises a hole formation position information acquisition section, which acquires data of an occasion of hole formation in the photosensitive material by a hole formation section, and 
 the disposition data generation section identifies the position of the hole at the photosensitive material on the basis of the data of the occasion of hole formation in the photosensitive material by the hole formation section, and corrects or disregards the measurement data at that position.    
   
   
       5 . The exposure device of  claim 2 , further comprising, in addition to the distance measurement section and the focusing section, a hole co-ordinate measurement section for identifying the position of the hole at the photosensitive material, 
 wherein, if second measurement data at a second measurement position, which is acquired by the distance measurement section, includes a value equal to or greater than a predetermined value,    the displacement data generation section compares the second measurement position at which the second measurement data is acquired with a hole co-ordinate position obtained by the hole co-ordinate measurement section and, if these two positions coincide, judges that the second measurement position at which the second measurement data is acquired corresponds to the position of the hole at the photosensitive material and, for a predetermined range about the second measurement position, corrects or disregards the second measurement data.    
   
   
       6 . The exposure device of  claim 2 , further comprising, in addition to the distance measurement section and the focusing section, a hole position co-ordinate input section for identification by a user of the position of the hole at the photosensitive material, 
 wherein, if third measurement data at a third measurement position, which is acquired by the distance measurement section, includes a value equal to or greater than a predetermined value,    the displacement data generation section compares the third measurement position at which the third measurement data is acquired with a hole co-ordinate position inputted by the user beforehand and, if these two positions coincide, judges that the third measurement position at which the third measurement data is acquired corresponds to the position of the hole at the photosensitive material and, for a predetermined range about the third measurement position, corrects or disregards the third measurement data.    
   
   
       7 . The exposure device of  claim 2 , further comprising, in addition to the distance measurement section and the focusing section, a hole co-ordinate measurement section for identifying the position of the hole at the photosensitive material and a hole position co-ordinate input section for identification by a user of the position of the hole at the photosensitive material, 
 wherein, if fourth measurement data at a fourth measurement position, which is acquired by the distance measurement section, includes a value equal to or greater than a predetermined value,    the displacement data generation section compares the fourth measurement position at which the fourth measurement data is acquired with a hole co-ordinate first position obtained by the hole co-ordinate measurement section and a hole co-ordinate second position inputted by the user beforehand and, if these three positions coincide, judges that the fourth measurement position at which the fourth measurement data is acquired corresponds to the position of the hole at the photosensitive material and, for a predetermined range about the fourth measurement position, corrects or disregards the fourth measurement data.    
   
   
       8 . The exposure device of  claim 1 , wherein, for a predetermined range about a co-ordinate position which is determined to be the hole, the displacement data generation section specifies data which differs from measurement data measured at a measurement position in the range to serve as measurement data peripheral to the co-ordinate position which is determined to be the hole.  
   
   
       9 . The exposure device of  claim 1 , wherein the displacement data generation section subjects measurement data acquired by a distance measurement section to moving average processing and updates the measurement data.  
   
   
       10 . The exposure device of  claim 1 , wherein the focusing section comprises: 
 a plurality of optical members disposed at a respective emission side of at least one exposure head structuring the exposure section, the optical members being formed with wedge shapes of light-transmissive material and being arranged adjacent to one another, along an optical axis of a light beam emitted from the exposure head, with mutually opposite orientations;    an optical member support section, which supports one optical member of the plurality of optical members to be movable along a face thereof which opposes another optical member of the plurality; and    an optical member traversal section, which causes the one optical member to move along the opposing face relative to the other optical member.    
   
   
       11 . The exposure device of  claim 10 , wherein the exposure head performs imaging by altering modulation states of respective pixels to turn the pixels on and off in accordance with inputted image information.  
   
   
       12 . A method for exposing a photosensitive material by emitting a light beam which is modulated in accordance with image data while the photosensitive material is being relatively moved, the method comprising: 
 determining a position of a hole in an exposure surface of the photosensitive material;    performing focusing control for causing a focusing position of the light beam to coincide with the exposure surface; and    generating displacement data for the focusing control, excluding a position which is determined, on the basis of results of determination of the hole position, to be the hole.    
   
   
       13 . The exposure method of  claim 12 , further comprising: 
 measuring heights of positions of the exposure surface of the photosensitive material; and    determining the position of the hole in the exposure surface of the photosensitive material on the basis of measurement data of the heights of positions of the exposure surface of the photosensitive material,    wherein the generating of displacement data generates the displacement data without utilizing the measurement data for the position which is determined to be the position of the hole in the exposure surface of the photosensitive material.    
   
   
       14 . The exposure method of  claim 13 , further comprising: 
 comparing the measurement data at a first measurement position with the measurement data at a measurement position near the first measurement position; and,    if a difference between values of these measurement data exceeds a predetermined value, one of correcting and disregarding the measurement data at the first measurement position.    
   
   
       15 . The exposure method of  claim 12 , further comprising: 
 performing identification of the hole position by acquiring data of an occasion of hole formation in the photosensitive material;    identifying the position of the hole at the photosensitive material on the basis of the data of the occasion of hole formation in the photosensitive material; and    one of correcting and disregarding the measurement data at that position.    
   
   
       16 . The exposure method of  claim 13 , further comprising, if second measurement data at a second measurement position includes a value equal to or greater than a predetermined value: 
 comparing the second measurement position at which the second measurement data is acquired with a hole co-ordinate position obtained by measurement of a hole co-ordinate; and,    if these two positions coincide, 
 judging that the second measurement position at which the second measurement data is acquired corresponds to the position of the hole at the photosensitive material and,  
 for a predetermined range about the second measurement position, one of correcting and disregarding the second measurement data.  
   
   
   
       17 . The exposure method of  claim 13 , further comprising, if third measurement data at a third measurement position includes a value equal to or greater than a predetermined value: 
 comparing the third measurement position at which the third measurement data is acquired with a hole co-ordinate position inputted by a user beforehand; and,    if these two positions coincide, 
 judging that the third measurement position at which the third measurement data is acquired corresponds to the position of the hole at the photosensitive material and,  
 for a predetermined range about the third measurement position, one of correcting and disregarding the third measurement data.  
   
   
   
       18 . The exposure method of  claim 13 , further comprising, if fourth measurement data at a fourth measurement position includes a value equal to or greater than a predetermined value: 
 comparing the fourth measurement position at which the fourth measurement data is acquired with a hole co-ordinate first position and a hole co-ordinate second position, which is inputted by a user beforehand; and,    if these three positions coincide, 
 judging that the fourth measurement position at which the fourth measurement data is acquired corresponds to the position of the hole at the photosensitive material and,  
 for a predetermined range about the fourth measurement position, one of correcting and disregarding the fourth measurement data.  
   
   
   
       19 . An exposure device for exposing a workpiece with one or a plurality of an exposure head, which relatively moves with respect to the workpiece, the exposure device comprising: 
 a workpiece displacement measurement section, which measures displacements of an exposure surface of the workpiece;    a hole co-ordinate measurement section, which finds a co-ordinate of a hole formed in the workpiece;    a displacement data generation section, which generates displacement data of the exposure surface in accordance with results of measurement at the workpiece displacement measurement section; and    a focusing section, which aligns a focusing point of a light beam emitted from the exposure head with the exposure surface on the basis of the displacement data generated by the displacement data generation section,    wherein, when a displacement amount equal to or greater than a predetermined magnitude is detected by the workpiece displacement measurement section, the displacement data generation section compares a position of detection of this displacement amount with a hole co-ordinate position found by the hole co-ordinate measurement section and, if the two positions coincide, determines that a step corresponding to the displacement amount corresponds to the hole formed in the workpiece and, for a predetermined range about the hole, sets a displacement amount which differs from the measured displacement amount for generating the displacement data.    
   
   
       20 . An exposure device for exposing a workpiece with one or a plurality of an exposure head, which relatively moves with respect to the workpiece, the exposure device comprising: 
 a workpiece displacement measurement section, which measures displacements of an exposure surface of the workpiece;    a displacement data generation section, which generates displacement data of the exposure surface in accordance with results of measurement at the workpiece displacement measurement section; and    a focusing section, which aligns a focusing point of a light beam emitted from the exposure head with the exposure surface on the basis of the displacement data generated by the displacement data generation section,    wherein, when a displacement amount equal to or greater than a predetermined magnitude is detected by the workpiece displacement measurement section, the displacement data generation section compares a position of detection of this displacement amount with a hole co-ordinate position inputted by a user beforehand and, if the two positions coincide, determines that a step corresponding to the displacement amount corresponds to the hole formed in the workpiece and, for a predetermined range about the hole, sets a displacement amount which differs from the measured displacement amount for generating the displacement data.    
   
   
       21 . An exposure device for exposing a workpiece with one or a plurality of an exposure head, which relatively moves with respect to the workpiece, the exposure device comprising: 
 a workpiece displacement measurement section, which measures displacements of an exposure surface of the workpiece;    a hole co-ordinate measurement section, which finds a co-ordinate of a hole formed in the workpiece;    a displacement data generation section, which generates displacement data of the exposure surface in accordance with results of measurement at the workpiece displacement measurement section; and    a focusing section, which aligns a focusing point of a light beam emitted from the exposure head with the exposure surface on the basis of the displacement data generated by the displacement data generation section,    wherein, when a displacement amount equal to or greater than a predetermined magnitude is detected by the workpiece displacement measurement section, the displacement data generation section compares a position of detection of this displacement amount with a hole co-ordinate position found by the hole co-ordinate measurement section and a hole co-ordinate position inputted by a user beforehand, and, if the three positions coincide, determines that a step corresponding to the displacement amount corresponds to the hole formed in the workpiece and, for a predetermined range about the hole, sets a displacement amount which differs from the measured displacement amount for generating the displacement data.    
   
   
       22 . A method for exposing a workpiece with one or a plurality of an exposure head, which relatively moves with respect to the workpiece, the method comprising: 
 a workpiece displacement measurement step for measuring displacements of an exposure surface of the workpiece;    a displacement data generation step for generating displacement data of the exposure surface in accordance with results of measurement in the workpiece displacement measurement step;    a focusing step for aligning a focusing point of a light beam emitted from the exposure head with the exposure surface on the basis of the displacement data generated by the displacement data generation step; and    a hole co-ordinate measurement step for finding a co-ordinate of a hole formed in the workpiece,    wherein, when a displacement amount equal to or greater than a predetermined magnitude is detected in the workpiece displacement measurement step, the displacement data generation step includes comparing a position of detection of this displacement amount with a hole co-ordinate position found by the hole co-ordinate measurement step and, if the two positions coincide, judging that a step corresponding to the displacement amount corresponds to the hole formed in the workpiece and, for a predetermined range about the hole, setting a displacement amount which differs from the measured displacement amount for generating the displacement data.    
   
   
       23 . An exposure method for exposing a workpiece with one or a plurality of an exposure head, which relatively moves with respect to the workpiece, the exposure method comprising: 
 a workpiece displacement measurement step for measuring displacements of an exposure surface of the workpiece;    a displacement data generation step for generating displacement data of the exposure surface in accordance with results of measurement in the workpiece displacement measurement step; and    a focusing step for aligning a focusing point of a light beam emitted from the exposure head with the exposure surface on the basis of the displacement data generated by the displacement data generation step,    wherein, when a displacement amount equal to or greater than a predetermined magnitude is detected in the workpiece displacement measurement step, the displacement data generation step includes comparing a position of detection of this displacement amount with a hole co-ordinate position inputted by a user beforehand and, if the two positions coincide, judging that a step corresponding to the displacement amount corresponds to the hole formed in the workpiece and, for a predetermined range about the hole, setting a displacement amount which differs from the measured displacement amount for generating the displacement data.    
   
   
       24 . A method for exposing a workpiece with one or a plurality of an exposure head, which relatively moves with respect to the workpiece, the method comprising: 
 a workpiece displacement measurement step for measuring displacement of an exposure surface of the workpiece;    a hole co-ordinate measurement step for finding a co-ordinate of a hole formed in the workpiece;    a displacement data generation step for generating displacement data of the exposure surface in accordance with results of measurement in the workpiece displacement measurement step; and    a focusing step for aligning a focusing point of a light beam emitted from the exposure head with the exposure surface on the basis of the displacement data generated by the displacement data generation step,    wherein, when a displacement amount equal to or greater than a predetermined magnitude is detected in the workpiece displacement measurement step, the displacement data generation step includes comparing a position of detection of this displacement amount by the workpiece displacement measurement step with a hole co-ordinate position found in the hole co-ordinate measurement step and a hole co-ordinate position inputted by a user beforehand, and, if the three positions coincide, first judging that a step corresponding to the displacement amount corresponds to the hole formed in the workpiece and, for a predetermined range about the hole, setting a displacement amount which differs from the measured displacement amount for generating the displacement data.    
   
   
       25 . An exposure device for exposing a photosensitive material with an exposure section which emits a light beam modulated in accordance with image data while the photosensitive material is relatively moved, the exposure device comprising: 
 an unevenness portion position identification section, which determines a position of an unevenness portion of an exposure surface of the photosensitive material;    a focusing section, which performs focusing control for causing a focusing position of the light beam from the exposure section to coincide with the exposure surface; and    a displacement data generation section, which generates displacement data for the focusing control by the focusing section, excluding a position which is determined, on the basis of results of determination by the unevenness portion position identification section, to be the unevenness portion.    
   
   
       26 . A method for exposing a photosensitive material by emitting a light beam which is modulated in accordance with image data while the photosensitive material is being relatively moved, the method comprising: 
 determining a position of an unevenness portion of an exposure surface of the photosensitive material;    performing focusing control for causing a focusing position of the light beam to coincide with the exposure surface; and    generating displacement data for the focusing control, excluding a position which is determined, on the basis of results of determination of the unevenness portion position, to be the unevenness portion.