US2006005337A1PendingUtilityA1

Cleaning member and cleaning method of substrate processing equipment

Assignee: NITTO DENKO CORPPriority: Jul 8, 2004Filed: Jul 8, 2005Published: Jan 12, 2006
Est. expiryJul 8, 2024(expired)· nominal 20-yr term from priority
H10P 72/0406H10P 95/00
38
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Claims

Abstract

A cleaning member comprising a cleaning layer which is non-adhesive at the temperature range of 25 to 200° C. and has a tensile elastic modulus (Young's modulus) of 3,000 MPa or less, particularly preferably 100 MPa or less, a cleaning sheet having the above cleaning layer as such a cleaning member, or a carrying member with a cleaning function having the above cleaning layer on the carrying member.

Claims

exact text as granted — not AI-modified
1 . A cleaning member comprising a cleaning layer which is non-adhesive at the temperature range of 25 to 200° C. and has a tensile elastic modulus (Young's modulus) of 3,000 MPa or less.  
   
   
       2 . The cleaning member according to  claim 1 , wherein the tensile elastic modulus (Young's modulus) of the cleaning layer is 100 MPa or less.  
   
   
       3 . The cleaning member according to  claim 1  or  2 , which is a cleaning sheet having the cleaning layer.  
   
   
       4 . The cleaning member according to  claim 1  or  2 , which is a carrying member with a cleaning function having the cleaning layer on the carrying member.  
   
   
       5 . The cleaning member according to  claim 4 , wherein the carrying member with a cleaning function comprises the cleaning sheet according to  claim 3  provided on the carrying member through an adhesive layer.  
   
   
       6 . The cleaning member according to  claim 4 , wherein the carrying member with a cleaning function comprises the cleaning layer directly provided on the carrying member.  
   
   
       7 . A cleaning method of a substrate processing equipment, which comprises carrying the cleaning member according to any one of  claims 1  to  6  into the substrate processing equipment.  
   
   
       8 . A substrate processing equipment cleaned by a cleaning method according to  claim 7.

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