Method of forming thin film

Abstract

A method of forming a thin film includes: forming a thin film on a substrate by discharging liquid material as a droplet; discharging the liquid material to a liquid material disposing-region that is wider than a thin film forming region; and drying the liquid material thereby to dispose a raising portion at the edge of the thin film in the outside of the thin film forming region.

1 . A method of forming a thin film comprising: 
 forming a thin film on a substrate by discharging liquid material as a droplet;    discharging the liquid material to a liquid material disposing-region that is wider than a thin film forming region; and    drying the liquid material thereby to dispose a raising portion at the edge of the thin film in the outside of the thin film forming region.    
     
     
         2 . The method of forming a thin film according to  claim 1  further comprising: 
 grasping a width of the raising portion at the edge of the thin film; and    determining a liquid material disposing-region based on the width of the raising portion at the edge of the thin film.    
     
     
         3 . The method of forming a thin film according to  claim 1 , wherein when the substrate is a substrate for a liquid crystal display and the thin film is an orientation film, the raising portion at the edge of the thin film is disposed on top of a light-shielding film covering the thin film forming region.  
     
     
         4 . The method of forming a thin film according to  claim 1 , wherein the substrate is a substrate for a liquid crystal display device, and the thin film is an overcoating film.  
     
     
         5 . The method of forming a thin film according to  claim 1 , wherein the thin film forming region is a display area.