Supporting system in exposure apparatus

Abstract

Disclosed is a supporting system having a carrying member for carrying a workpiece thereon and a supporting mechanism for supporting the carrying member from a workpiece transfer position to a workpiece processing position, wherein, adjacent the transfer position, the weight of the carrying member and a force to be applied to the carrying member are substantially balanced, and wherein, adjacent the workpiece processing position, the weight of the carrying member and a force to be applied to the carrying member are substantially balanced.

1 - 36 . (canceled)  
   
   
       37 . An exposure apparatus comprising: 
 carrying means for carrying thereon a substrate; and    supporting means being movable in a gravity direction while supporting said carrying means,    wherein, within a movement range in the gravity direction of said supporting means, there are two points where a supporting force for said carrying means and a weight of said carrying means, having the substrate carried thereon, are balanced.