Developing method and developing unit

Abstract

In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.

1 .- 3 . (canceled)  
   
   
       4 . A developing method for performing development treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, 
 wherein a charged member electrically charged to an opposite polarity to that of a zeta potential of insoluble substances floating in said developing solution is brought into contact with said developing solution.    
   
   
       5 . A developing method according to  claim 4 , 
 wherein said developing treatment comprises:    a first step of loading the developing solution on the substrate; and    a second step of subjecting the substrate to static development while said developing solution is loaded on the substrate,    wherein said developing solution is brought into contact with said charged member in said second step.    
   
   
       6 . A developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, 
 wherein a charged member electrically charged to the same polarity as that of a zeta potential of insoluble substances floating in said developing solution is brought into contact with the developing solution on said substrate, and said charged member is moved.    
   
   
       7 . A developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, 
 wherein a potential gradient is given to said substrate supplied with the developing solution, and a potential of said substrate is cocentrically changed with time.    
   
   
       8 .- 18 . (canceled)  
   
   
       19 . A developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, 
 wherein, when said resist film has conductivity, a voltage is applied to this resist film to keep this resist film at a potential in the same polarity as that of insoluble substances in the developing solution at least during the development treatment.    
   
   
       20 .- 23 . (canceled)  
   
   
       24 . A developing unit performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, comprising: 
 a charged member electrically chargeable to a predetermined polarity; and    a charged member carrier carrying said charged member to bring the charged member into contact with the developing solution on the substrate.    
   
   
       25 . A developing unit according to  claim 24 , 
 wherein said charged member has an equal shape to that of the substrate.    
   
   
       26 .- 27 . (canceled)  
   
   
       28 . A developing unit performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, comprising: 
 a charging unit electrically charging said developing solution to a zeta potential in a predetermined polarity.    
   
   
       29 . A developing unit according to  claim 28 , 
 wherein said charging unit comprises a unit applying a voltage to a pipe through which the developing solution is supplied.    
   
   
       30 . A developing unit performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, comprising: 
 a charged member electrically charged to the same polarity as that of insoluble substances in the developing solution loaded on said resist film; and    a moving member moving said charged member above the substrate.    
   
   
       31 . A developing unit according to  claim 30   wherein said charged member is attached to a nozzle from which the developing solution is supplied onto the substrate.    
   
   
       32 .- 67 . (canceled)  
   
   
       68 . A developing method according to  claim 6 , 
 wherein said substrate is electrically charged to the same polarity as that of the zeta potential of the insoluble substances at least while the charged member is in contact with said developing solution.    
   
   
       69 . A developing method according to  claim 68 , 
 wherein said substrate is electrically charged so as to cause a potential of the substrate to become higher than a potential of the charged member.