US2005258032A1PendingUtilityA1

Holder for an electrochemical process substrate

Assignee: HABER NORMANPriority: Mar 4, 2004Filed: Mar 4, 2005Published: Nov 24, 2005
Est. expiryMar 4, 2024(expired)· nominal 20-yr term from priority
Inventors:Norman Haber
C25D 17/06
40
PatentIndex Score
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Cited by
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Claims

Abstract

A holder for an electrochemical process substrate includes a support member having a pair of separated substrate mounts adapted for mounting a process substrate there between, the support member including a separate trough operatively associated with each substrate mount and adapted for receiving an end portion of a process substrate.

Claims

exact text as granted — not AI-modified
1 . A holder for an electrochemical process substrate, comprising: 
 a support member including a pair of separated substrate mounts adapted for mounting a process substrate there between; and    said support member including a separate trough operatively associated with each substrate mount and adapted for receiving an end portion of a process substrate.    
   
   
       2 . The holder of  claim 1 , wherein each substrate mount includes a top element adapted to be located above a respective trough and adapted for maintaining a portion of a process substrate within said respective trough.  
   
   
       3 . The holder of  claim 2 , wherein each top element includes a portion adapted for extending into a respective trough for biasing a flexible portion of a process substrate into said respective trough.  
   
   
       4 . The holder of  claim 2 , wherein each top element includes one or more openings adapted to direct a portion of a wicking material into a respective trough when said top element is located above said trough.  
   
   
       5 . The holder of  claim 2 , wherein said top elements are adapted to be located directly over said troughs.  
   
   
       6 . The holder of  claim 2 , wherein said top element and said support member each includes complementary magnetic elements adapted for maintaining said top elements in location above said troughs.  
   
   
       7 . The holder of  claim 6 , wherein said complementary magnetic elements in said top elements and said support member are both magnetized.  
   
   
       8 . The holder of  claim 1 , wherein said support member includes one or more elongated channels extending horizontally and adapted for allowing support and movement of said holder.  
   
   
       9 . The holder of  claim 8 , wherein said one or more elongated channels extend perpendicularly to a direction directly between said substrate mounts.  
   
   
       10 . The holder of  claim 1 , further comprising a separate electrical contact operatively associated with each trough and having a portion thereof located within a respective trough.  
   
   
       11 . The holder of  claim 10 , wherein at least one of said electrical contacts includes a connector extending from a side of said support member and being adapted to make contact with a complementary connector with movement of said holder perpendicular to a direction between said substrate mounts.  
   
   
       12 . The holder of  claim 1 , wherein said support member includes a support element extending upwardly to a horizontal imaginary plane between said substrate mounts for supporting a process substrate at one or more intermediate points between said substrate mounts.  
   
   
       13 . The holder of  claim 1 , wherein the process substrate includes porous material.  
   
   
       14 . The holder of  claim 1 , wherein the process substrate is rigid and includes a separate wicking element located for placement in each said trough.  
   
   
       15 . The holder of  claim 1 , wherein each trough includes a first portion adapted for receiving a portion of said process substrate and a second portion adapted for containing a portion of an electrical contact, and further wherein said first and second trough portions are adapted to allow liquid flow there between.  
   
   
       16 . The holder of  claim 1 , wherein said substrate mounts and said support element are shaped to receive a rigid process substrate.

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