US2005242453A1PendingUtilityA1

Master carrier for magnetic transfer

Assignee: FUJI PHOTO FILM CO LTDPriority: Jul 12, 2001Filed: Jun 16, 2005Published: Nov 3, 2005
Est. expiryJul 12, 2021(expired)· nominal 20-yr term from priority
B82Y 40/00H01J 37/3174G11B 5/743Y10S425/81G11B 5/855G11B 5/865B82Y 10/00G11B 5/86Y10T428/21
49
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Claims

Abstract

To improve the quality of transfer signal by reducing loss of azimuth when the magnetic transfer is performed by bringing a master carrier and a slave medium into close contact with each other and applying transfer magnetic field thereto, even if the width of track is narrowed. The master carrier 3 has a pattern which corresponds to a transfer information for high density recording and is formed of a soft magnetic layer 32 with a width W of track of 3 μm or less, wherein the pattern is written and formed by scanning with an electron beam EB of which a writing diameter d is smaller than the width W of track, on a same track over plural times. Writing is performed approximately to a rectangular shape, whereby the loss of azimuth can be reduced and the accuracy of transfer can be enhanced.

Claims

exact text as granted — not AI-modified
1 . A master carrier for magnetic transfer having a pattern which corresponds to a transfer information for high density recording and is formed of a soft magnetic layer with a track width of 0.3 μm or less, 
 wherein said pattern is written and formed by scanning with an electron beam of which a writing diameter is smaller than said width of track, on a same track over plural times.    
     
     
         2 . A master carrier for magnetic transfer according to  claim 1 , wherein said master carrier for magnetic transfer has a substrate with an unevenness pattern and formed of Ni or Ni alloy, and the depth of said unevenness pattern is in a range of 80 nm˜800 nm.  
     
     
         3 . A master carrier for magnetic transfer according to  claim 1 , wherein said master carrier for magnetic transfer has a substrate with an unevenness pattern and formed of resin material, and the depth of said unevenness pattern is in a range of 50 nm˜1000 nm.  
     
     
         4 . (canceled)  
     
     
         5 . (canceled)  
     
     
         6 . (canceled)

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