Method for coating substrates in inline installations

Abstract

A method for coating substrates in inline installations, in which a substrate is moved through at least one coating chamber and during this movement is coated. In this method, first, a model of the coating chamber is formed which takes into consideration the changes of the chamber parameters caused by the movement of the substrate through the coating chamber. Subsequently, the particular position of the substrate within the coating chamber is acquired. The chamber parameters are subsequently set based on the position of the substrate according to the model of the coating chambers.

1 - 17 . (canceled)  
   
   
       18 . A method for coating substrates in inline installations, in which a substrate is moved through at least one coating chamber and during this movement is coated, comprising: 
 a) forming a model of the coating chamber which takes into consideration those changes of chamber parameters, which are caused by the movement of the substrate through the coating chamber,    b) acquiring the position of the substrate within the coating chamber is acquired,    c) setting the chamber parameters are set based on the position of the substrate according to the model.    
   
   
       19 . The method as claimed in  claim 18 , wherein the model determines a correction function for one or several chamber parameters as a function of the position of the substrate.  
   
   
       20 . The method as claimed in  claim 18 , wherein the correction function is transmitted into a control of the coating installation.  
   
   
       21 . The method as claimed in  claim 18 , wherein the dimensions of the substrate are entered into the model.  
   
   
       22 . The method as claimed in  claim 18 , wherein a mean dynamic coating rate is determined on the basis of the model and the determined coating rate is entered as regulated variable into a virtual regulator, which, by variation of gas flow of discharge power, keeps constant the mean dynamic coating rate.  
   
   
       23 . The method as claimed in  claim 22  wherein the variation of the gas flow or of the discharge power is transmitted as correction function into the control.  
   
   
       24 . The method as claimed in  claim 18 , wherein a mean dynamic coating rate is determined based on the model and the determined coating rate is entered as regulated variable into a virtual regulator, which, by variation of a regulated variable of a further regulator for the in situ stabilization of the operating point, keeps constant the mean dynamic coating rate.  
   
   
       25 . The method as claimed in  claim 24 , wherein the determined variation of the regulated variable of the second regulator is transmitted into the control as correction function.  
   
   
       26 . The method as claimed in  claim 18 , wherein the chamber parameters are the cathode voltage, gas flow, temperature and gas pressure.  
   
   
       27 . The method as claimed in  claim 18 , wherein the substrate is a glass plate.  
   
   
       28 . The method as claimed in  claim 18 , wherein the acquired position of the glass plate is the front edge.  
   
   
       29 . The method as claimed in  claim 18 , wherein for building the model of the coating chamber the Monte Carlo method is utilized.  
   
   
       30 . The method as claimed in  claim 18 , wherein the coating of the substrate takes place by sputtering.  
   
   
       31 . The method as claimed in  claim 30 , wherein the sputtering process is represented by means of Berg's model.  
   
   
       32 . The method as claimed in  claim 18 , wherein the coating chamber is divided into several subvolumes and Berg's model is applied in each of these subvolumes.  
   
   
       33 . The method as claimed in  claim 18 , wherein the model building of the Monte Carlo method and the model building after Berg are mathematically coupled and a coupled system of time-dependent differential equations is formed, from which can be taken the regulated variables for the layer thickness fluctuations minimization.  
   
   
       34 . The method as claimed in  claim 18 , wherein several coating chambers are arrayed in series and the process parameters for all coating chambers are represented through a model.