Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same

Abstract

A method for forming a self aligned pattern on an existing pattern on a substrate comprising applying a coating of a solution containing a masking material in a carrier, the masking material having an affinity for portions of the existing pattern; and allowing at least a portion of the masking material to preferentially assemble to the portions of the existing pattern. The pattern may be comprised of a first set of regions of the substrate having a first atomic composition and a second set of regions of the substrate having a second atomic composition different from the first composition. The first set of regions may include one or more metal elements and the second set of regions may include a dielectric. The first and second regions may be treated to have different surface properties. Structures made in accordance with the method. Compositions useful for practicing the method.

1 - 49 . (canceled)  
   
   
       50 . A composition for selectively coating a pattern on a substrate, said composition comprising: 
 a carrier material for application to said substrate;    a first polymer having an affinity for regions of said substrate having first chemical characteristics; and    a second polymer having an affinity for regions of said substrate having second chemical characteristics different from said first characteristics.    
   
   
       51 . The composition of  claim 50 , wherein the first polymer is selected from the group consisting of: poly(vinyl pyridines), poly(vinyl pyrrolidones), poly(vinyl imidazoles), poly(styrenes), poly(esters), polyphosphazenes, polythiophenes, polyimines, polyheterocyclics, polyimides, polyoxazoles, polybenzoxazoles, polythiazoles, polypyazole, polytriazole and polythiophene.  
   
   
       52 . The composition of  claim 50 , wherein the second polymer is selected from the group consisting of: poly(vinyl pyridines), poly(vinyl pyrrolidones), poly(vinyl imidazoles) poly(stryenes), poly(esters), poly(methacrylates), poly(acrylates), poly(glycols), polycarbonates, polyvinylacetates, polyalkyls, polyamides, polynitriles, polyureas, polyurethanes, polyethers, polysulfones, polythioethers, polyoxazoles, polyimides, polyheterocyclics, polysilicones and polysilanes.  
   
   
       53 . The composition of  claim 50 , wherein the second polymer contains functional groups selected from the groups consisting of: hydroxys, esters, ethers, aldehydes, ketones, carbonates, acids, phenols, amines, amides, imides, thioesters, thioethers, ureas, urethanes, nitriles, isocyanates, thiols, sulfones, halides, phosphines, phosphine oxides, phosphonimides, nitros and azos.  
   
   
       54 . The composition of  claim 50 , wherein the first polymer and the second polymer are miscible.  
   
   
       55 . The composition of  claim 50 , wherein the first polymer and the second polymer comprise a block copolymer in which the blocks are covalently linked.  
   
   
       56 . The composition of  claim 55 , wherein a first copolymer of the block is selected from the group consisting of: poly(vinyl pyridines), poly(vinyl pyrrolidones), poly(vinyl imidazoles) and poly(stryenes).  
   
   
       57 . The composition of  claim 55 , wherein a second copolymer of the block is selected from the group consisting of: poly(styrenes), poly(methacrylates), poly(acrylates) and poly(glycols).  
   
   
       58 . The composition of  claim 50 , further comprising in combination, a surface modifying material for application to said substrate prior to said composition, said surface modifying material being selected from the group consisting of Si x L y R z , where L is selected from the group consisting of hydroxy, methoxy, ethoxy, acetoxy, alkoxy, carboxy, amines, halogens, and R is selected from the group consisting of hydrido, methyl, ethyl, vinyl, and phenyl (any alkyl or aryl).  
   
   
       59 . The composition of  claim 50 , further comprising in combination, a surface modifying material for application to said substrate prior to said composition, said surface modifying material being selected from the group consisting of: hexamethyldisilazane, vinyltriacetoxysilane, aminopropyltrimethoxysilane, trimethychlorosilane, and trimethylacetoxysilane.  
   
   
       60 . The composition of  claim 50 , further comprising in combination, a surface modifying material for application to said substrate prior to said composition, said surface modifying material being selected from the group consisting of: hydroxys, esters, ethers, aldehydes, ketones, carbonates, acids, phenols, amines, amides, imides, thioesters, thioethers, ureas, urethanes, nitriles, isocyanates, thiols, sulfones, halides, phosphines, phosphine oxides, phosphonimides, nitros, azos, thioesters, thioethers, benzotriazoles, pyridines, imidazoles, imides, oxazoles, benzoxazoles, thiazoles, pyrazoles, triazoles, thiophenes, oxadiazoles, thiazines, thiazoles, quionoxalines, benzimidazoles, oxindoles, and indolines.