Baffle plate and plasma etching device having same
Abstract
A plasma etching device includes a baffle plate having a plurality of slots for preventing leakage of plasma gas generated during a plasma generating process while discharging other materials such as exhaust gas, residual products and particles generated during the process. The slots, each of which extends in the form of a curve from an inner circumference of the baffle plate to an outer circumference thereof, expedites the discharge of the exhaust gas and residual products. Therefore, the plasma generating progresses more smoothly and, further, an amount of discharged exhaust gas is increased.
Claims
exact text as granted — not AI-modified1 . A plasma generating device installed within a plasma generating chamber and including a baffle plate having a plurality of slots for discharging exhaust gas or residual products, wherein the plurality of slots are extended from an inner circumference of the baffle plate to an outer circumference thereof in the form of a curve.
2 . The device of claim 1 , wherein each of the plurality of slots has a predetermined width.
3 . The device of claim 1 , wherein the distance between first end portions of two neighboring slots is identical to the distance between second end portions thereof.
4 . The device of claim 1 , wherein each of the plurality of slots has a cross section in which an upper width thereof is larger than a lower width thereof.
5 . The device of claim 4 , wherein the upper width of each slot ranges from about 1.6 to 1.8 mm while the lower width thereof is about 1.0 mm.
6 . The device of claim 1 , wherein a portion on the baffle plate in which the plurality of slots are formed is bent upward or downward in a predetermined angle.
7 . The device of claim 6 , wherein the slot formation portion of the baffle plate is bent upward or downward within an angular range of about 0 to 45°.
8 . The device of claim 1 , wherein the slot formation portion of the baffle plate is bent upward or downward in the form of an arc.
9 . The device of claim 1 , wherein the slot formation portion of the baffle plate is bent upward or downward two or more times in a predetermined angle.
10 . The device of claim 1 or 9 , wherein the plasma generating device is a plasma etching device.
11 . A plasma generating device installed within a plasma generating chamber and including a baffle plate having a plurality of slots, wherein the plurality of slots is extended from an inner circumference of the baffle plate to an outer circumference thereof in the form of a curve.
12 . The device of claim 11 , wherein each of the plurality of slots has a predetermined width.
13 . The device of claim 11 or 12 , wherein a distance between first end portions of the neighboring slots is identical to a distance between second end portions thereof.
14 . The device of claim 11 or 12 , wherein each of the plurality of slots has a cross section in which an upper width thereof is larger than a lower width thereof.
15 . The device of claim 14 , wherein the upper width of each slot ranges from about 1.6 to 1.8 mm while the lower width thereof is about 1.0 mm.
16 . The device of claim 11 or 12 , wherein a portion on the baffle plate in which the plurality of slots are formed is bent upward or downward in a predetermined angle.
17 . The device of claim 16 , wherein the slot formation portion of the baffle plate is bent upward or downward within an angular range from 0 to 45°.
18 . The device of claim 11 or 12 , wherein the slot formation portion of the baffle plate is bent upward or downward in the form of an arc.
19 . The device of claim 11 or 12 , wherein the slot formation portion of the baffle plate is bent upward or downward two or more times in a predetermined angle.
20 . A plasma generating device installed within a plasma generating chamber and including a baffle plate having a plurality of slots for discharging exhaust gas or residual products, wherein the plurality of slots are extended linearly from an inner circumference of the baffle plate to an outer circumference thereof diagonally in a radial direction.
21 . The device of claim 20 , wherein each of the plurality of slots, which are linearly extended from the inner circumference of the baffle plate to the outer circumference thereof diagonally to the radial direction, is bent at least one time.
22 . The device of claim 1 , wherein each of the plurality of slots has a cross-section of a sand watch shape in which an upper width is larger than a lower width and a middle width is smaller than the lower width.
23 . The device of claim 22 , wherein the upper width of each slot ranges from about 1.6 to 1.8 mm, the lower width ranges from about 1.1 to 1.5 mm and the middle width is about 1.0 mm.
24 . A plasma generating device installed within a plasma generating chamber and including a baffle plate having a plurality of slots for discharging exhaust gas, residual products, and the like, wherein a portion on the baffle plate in which the plurality of slots are formed (hereinafter referred to as a slot formation portion) is bent upward or downward in a predetermined angle.
25 . The device of claim 24 , wherein the slot formation portion of the baffle plate is bent upward or downward at least two times.
26 . A plasma generating device installed within a plasma generating chamber and including a baffle plate having a plurality of slots for discharging exhaust gas, residual products, and the like, wherein a portion on the baffle plate in which the plurality of slots are formed (hereinafter, a slot formation portion) is bent upward or downward in the form of an arc.
27 . The device of claim 11 , wherein each of the plurality of slots has a cross-section of a sand watch shape in which an upper width thereof is larger than a lower width thereof and a middle width thereof is smaller than the lower width.
28 . The device of claim 27 , wherein the upper width of each slot ranges from about 1.6 to 1.8 mm, the upper width is about 1.1 to 1.5 mm and the middle width ranges from about 1.0 mm.Join the waitlist — get patent alerts
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