US2005221729A1PendingUtilityA1
Method of repairing a pedestal surface
Individually held — no corporate assignee on recordPriority: Mar 19, 2003Filed: Mar 16, 2004Published: Oct 6, 2005
Est. expiryMar 19, 2023(expired)· nominal 20-yr term from priority
Inventors:Chin Wen Lee
C23C 16/4581
26
PatentIndex Score
0
Cited by
0
References
0
Claims
Abstract
A method of repairing a pedestal heater uses a diamond film stuck onto a silicon wafer to polish the surface of the heater and so remove distortion, coating or surface scratches.
Claims
exact text as granted — not AI-modified1 . A method of repairing a pedestal surface, comprising the step of polishing said surface using a coarse surface of a film.
2 . A method according to claim 1 , wherein the film has a coarseness of from 1 to 45 microns.
3 . A method of repairing a pedestal surface, comprising the step of polishing said surface using a coarse surface with a coarseness of from 1 to 45 microns.
4 . A method according to claim 3 , wherein the coarse surface is a coarse surface of a film.
5 . A method according to claim 1 , wherein the film is mounted on one side of a silicon wafer.
6 . A method according to claim 5 , wherein the film is mounted on the silicon wafer using a mineral oil as an adhesive.
7 . A method according to claim 6 , wherein the mineral oil is a fluorinated oil
8 . A method according to claim 5 , wherein the other side of the silicon wafer from the coarse surface has tape thereon to provide an improved grip.
9 . A method according to claim 1 , further comprising the step of applying IPA between the coarse surface and the pedestal surface prior to polishing.
10 . A method according to claim 1 , wherein the coarse surface comprises diamond grains.
11 . A method according to claim 1 , wherein the pedestal is a heater pedestal.
12 . A method according to claim 1 , wherein the pedestal is a pedestal for use in CVD, PVD, metal/oxide etching, photolithographic scanning or semiconductor processing that requires heating or a vacuum or mechanical devices to secure the position of a wafer to the pedestal surface.
13 . A pedestal repaired according to claim 1 .
14 . A pedestal repair apparatus comprising a silicon wafer, with a coarse film on one side thereof.Join the waitlist — get patent alerts
Track US2005221729A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.