Loading and unloading apparatus for a coating device

Abstract

The invention relates to a device for loading at least one substrate ( 1 ) into a process chamber of a coating unit and unloading the at least one substrate ( 1 ) therefrom by means of a gripper ( 2 ) of a handling machine. The inventive device comprises a loading plate ( 3 ) which can be gripped by the gripper ( 2 ) and embodies a storage place for each at least one substrate ( 1 ), said storage place being formed by an edge ( 4 ) of an opening ( 5 ) that is assigned to each substrate ( 1 ). The inventive device also comprises a substrate holder ( 7 ) that is provided with a pedestal-type substrate support which is adapted to the loading plate ( 3 ) and on which the substrate plate can be placed such that some sectors of the surface of the substrate support are located at a certain gap distance from the substrate or the substrate lies in a planar manner on a sector of the surface.

1 . Apparatus for loading and unloading a process chamber of a coating device with at least one substrate ( 1 ) by means of a gripper ( 2 ) of an automated handling unit, which apparatus has a loading plate ( 3 ) which can be gripped by the gripper ( 2 ) and forms a supporting location, which is formed by an edge ( 4 ) of an opening ( 5 ) associated with each substrate ( 1 ), for each at least one substrate ( 1 ), characterized by a substrate holder ( 7 ) having a pedestal-like substrate carrier ( 8 ) which is matched to the loading plate ( 3 ) and onto which the substrate plate can be placed in such a manner that the substrate rests flat on a surface portion.  
   
   
       2 . Apparatus according to  claim 1  or in particular according thereto, characterized in that the opening ( 5 ) is associated with the bottom of a recess.  
   
   
       3 . Apparatus according to one or more of the preceding claims or in particular according thereto, characterized in that the opening associated with each substrate ( 1 ) is substantially circular, so that only the edge of the substrate ( 1 ) rests on the edge of the opening.  
   
   
       4 . Apparatus according to one or more of the preceding claims or in particular according thereto, characterized in that the substantially circular loading plate ( 3 ) has a multiplicity of supporting locations ( 6 ).  
   
   
       5 . Apparatus according to one or more of the preceding claims or in particular according thereto, characterized by a receiving cavity, which is surrounded by an annular collar ( 9 ) formed integrally on the rear side of the loading plate ( 3 ), for receiving the substrate carrier ( 8 ).  
   
   
       6 . Apparatus according to one or more of the preceding claims or in particular according thereto, characterized in that the substrate carrier ( 8 ) is driveable in rotation, in particular resting on a gas bearing ( 10 ) or mechanically, for example by means of a planetary gear mechanism.  
   
   
       7 . Apparatus according to one or more of the preceding claims or in particular according thereto, characterized in that the loading plate ( 3 ) is located in a depression in the substrate holder ( 7 ), in such a manner that its surface ( 3 ′) is raised with respect to the surface ( 7 ′) of the substrate holder ( 7 ).  
   
   
       8 . Apparatus for loading and unloading a process chamber of a coating device with at least one substrate ( 1 ) by means of a gripper ( 2 ) of an automated handling unit, which apparatus has a loading plate ( 3 ) which can be gripped by the gripper ( 2 ) and forms a supporting location, which is formed by an edge ( 4 ) of an opening ( 5 ) associated with each substrate ( 1 ), for each at least one substrate ( 1 ), characterized in that the loading plate ( 3 ) is located in a depression in the substrate holder ( 7 ), in such a manner that its surface ( 3 ′) is flush with the surface ( 7 ′) of the substrate holder ( 7 ).  
   
   
       9 . Apparatus according to one or more of the preceding claims or in particular according thereto, characterized by a conically running inner wall ( 9 ′) of the annular collar ( 9 ) and a circumferential wall of the substrate carrier ( 8 ) which is of a matching shape.  
   
   
       10 . Apparatus for loading and unloading a process chamber of a coating device with at least one substrate ( 1 ) by means of a gripper ( 2 ) of an automated handling unit, which apparatus has a loading plate ( 3 ) which can be gripped by the gripper ( 2 ) and forms a supporting location, which is formed by an edge ( 4 ) of an opening ( 5 ) associated with each substrate ( 1 ), for each at least one substrate ( 1 ), the gripper having two gripping arms ( 14 ), characterized by an annular engagement groove ( 12 ), formed by the outer wall of the annular collar, for the engagement of a hook ( 13 ) of the gripper ( 2 ), the length of the gripping arms ( 14 ) being shorter than the diameter of the loading plate ( 3 ), so that as a result of the eccentric engagement of the gripping arms ( 14 ) in a circumferential groove of the loading plate a tilting moment which is produced when the loading plate ( 3 ) is lifted allows the hook ( 13 ) to move into the engagement groove ( 12 ).  
   
   
       11 . Apparatus according to  claim 10  or in particular according thereto, characterized by a centering opening ( 15 ), associated with the edge of the substrate holder ( 8 ), for a centering projection ( 16 ), which carries the hook ( 13 ), of the gripper ( 2 ) to enter, and/or an optical apparatus for centering the substrate holder ( 7 ).  
   
   
       12 . Apparatus according to one or more of the preceding claims or in particular according thereto, characterized by passages ( 17 ) which are open toward the edge ( 8 ′) of the substrate holder for the gripping arms ( 14 ) of the gripper ( 2 ) to enter.  
   
   
       13 . Apparatus according to one or more of the preceding claims or in particular according thereto, characterized in that the material of the loading plate ( 3 ) and the material of the substrate holder are substantially identical.  
   
   
       14 . Apparatus for loading and unloading a process chamber of a coating device with at least one substrate ( 1 ) by means of a gripper ( 2 ) of an automated handling unit, which apparatus has a loading plate ( 3 ) which can be gripped by the gripper ( 2 ) and forms a supporting location, which is formed by an edge ( 4 ) of an opening ( 5 ) associated with each substrate ( 1 ), for each at least one substrate ( 1 ), characterized by a removal device ( 19 ), which interacts with the loading plate ( 3 ), with vertical supports ( 20 ) associated with each opening ( 5 ), over which supports the loading plate ( 3 ) can be fitted in order for the substrates ( 1 ) to be removed from the loading plate ( 3 ).  
   
   
       15 . Apparatus according to  claim 14  or in particular according thereto, characterized in that the vertical supports are formed by in each case at least three vertical pins ( 20 ).  
   
   
       16 . Apparatus according to one or more of the preceding claims or in particular according thereto, characterized in that one or more robots are associated with the apparatus.  
   
   
       17 . Apparatus according to one or more of the preceding claims or in particular according thereto, characterized in that a plurality of process chambers are associated with the apparatus, it being possible for the substrates, resting on a loading plate ( 3 ), to be moved from one process chamber into another process chamber.  
   
   
       18 . Apparatus according to one or more of the preceding claims or in particular according thereto, characterized in that the apparatus has analysis devices, such as FTIR or ellipsometry.  
   
   
       19 . Apparatus according to one or more of the preceding claims or in particular according thereto, characterized by one or more cooling and/or heating stations.  
   
   
       20 . Apparatus according to one or more of the preceding claims or in particular according thereto, characterized by an orientation station for orienting the loading plate ( 3 ).  
   
   
       21 . Apparatus according to one or more of the preceding claims or in particular according thereto, characterized in that the substrate holder ( 7 ) has rotation monitoring grooves for determining its rotational speed and rotary position.  
   
   
       22 . Use of an apparatus according to one or more of the preceding claims, in a manufacturing process for the deposition of semiconductor layers on semiconductor substrates.  
   
   
       23 . Use of an apparatus according to  claim 21  or in particular according thereto, characterized in that the apparatus is used to produce a display.  
   
   
       24 . Use of an apparatus according to one or more of the preceding claims or in particular according thereto, characterized in that the device is used in very general terms for a CVD process or a condensation coating process, and in particular for the deposition of semiconductor layers formed from elements of groups IV,III-V,II-VI, metals, insulators, in particular dielectrics and organic substances on silicon substrates, II-V substrates, II-VI substrates, or insulators, such as glass or plastic.  
   
   
       25 . Use of an apparatus according to one or more of the preceding claims or in particular according thereto, characterized in that the apparatus is operated with hydrogen and/or nitrogen.  
   
   
       26 . Use of an apparatus according to one or more of the preceding claims or in particular according thereto, characterized by an integrated, automatic cleaning procedure for the loading plate ( 3 ) in the apparatus.