Translucent applique cutwork machine embroidery and method

Abstract

Translucent applique cutwork embroidery designs can be performed by a sewing machine, preferably a computerized machine with digitized design embroidery patterns. The method employs a foundation fabric 11 and a removable stabilizer 12 . Once a cutwork section 14 in an applique cutwork embroidery design is defined with a set of concentric underlay stitches 13 that bind said foundation fabric to removable stabilizer, said foundation fabric is removed from said cutwork section. An applique fabric 16 is then stitched in place over the cutwork section with another set of concentric underlay stitches 13 that are sewn in approximately the same location as the first set of concentric underlay stitches. Excess applique fabric 16 is cut away. The applique cutwork seam 18 joining applique fabric to foundation fabric is finished with zigzag stitches 17 that overcast all said concentric underlay stitches. Where appropriate, a machine embroidery design 19 is stitched on top of said applique fabric, cascading onto said foundation fabric. Said applique cutwork seam is concealed with satin stitches, or similar concealing stitches 20 . The balance of the embroidery design is stitched onto said foundation fabric. When said removable stabilizer is removed, no further trimming of fabrics or threads is required.

1 . A method for producing applique cutwork embroidery using a sewing machine, which simulates hand stitched applique cutwork embroidery, comprising the steps of: 
 Stitching onto at least one layer of foundation fabric and one layer of removable stabilizer.    Stitching concentric underlay stitches about cutwork sections, binding foundation fabrics to removable stabilizer.    Removing said foundation fabric from within said cutwork sections.    Stitching applique fabric over said cutwork sections using more concentric underlay stitches and bind applique fabric to said foundation fabric and removable stabilizer.    Trim excess applique fabric from outside said cutwork section and concentric underlay stitches.    Zigzag stitch over said concentric underlay stitches to complete applique cutwork seam.    Stitch machine embroidery design to said applique and foundation fabrics.    Satin stitch over said concentric underlay stitches and associated cut fabric edges to conceal same.    Finish stitching balance of applique cutwork embroidery onto foundation fabric.    Remove removable stabilizer.    
   
   
       2 . The method of  claim 1  further comprises the step of stitching concentric underlay stitches in rows of at least two.  
   
   
       3 . The method of  claim 2  further comprises the step of stitching each said row of concentric underlay stitches approximately parallel to one another.  
   
   
       4 . The method of  claim 2  further comprises the step of stitching each set of concentric underlay stitches such that the normal cross sectional distance between outer and inner stitch rows is nearly as long as the desired stitch width of satin stitches used to conceal said concentric underlay and zigzag stitches.  
   
   
       5 . The method of  claim 1  further comprises the step of stitching an embroidery design, or portion thereof, directly onto applique fabric.  
   
   
       6 . The method of  claim 5  further comprises the step of stitching an embroidery design, or portion thereof, directly onto the applique fabric and a means to stitch said embroidery design such that said embroidery design appears contiguous with portions of embroidery stitched solely onto foundation fabric.  
   
   
       7 . The method of  claim 1  further comprises the step of covering concentric underlay stitches with satin stitches, or similar concealing stitches.  
   
   
       8 . The method of  claim 1  further comprises the step of removing the stabilizer material.  
   
   
       9 . The method of  claim 8  wherein the stabilizer material is removed by heat.  
   
   
       10 . The method of  claim 8  wherein the stabilizer material is removed by water.  
   
   
       11 . A method of constructing a seam joining two dissimilar fabrics, whereby said seam is sufficient to retain integrity of same under normal, daily use and stress, comprising the steps of: 
 Stitching concentric underlay stitches in at least two separate rows such that each row of stitches binds applique fabric to foundation fabric along cut fabric edges of each fabric    Stitching said concentric underlay stitches such that each row of stitches is approximately parallel to one other in any one set of concentric underlay stitches.    Zigzag stitching over said concentric underlay stitches such that said zigzag stitches overcast all said concentric underlay stitches in any one set of concentric underlay stitches.