US2005205530A1PendingUtilityA1

Centralized control architecture for a laser materials processing system

Assignee: HYPERTHERM INCPriority: Apr 10, 2000Filed: May 13, 2005Published: Sep 22, 2005
Est. expiryApr 10, 2020(expired)· nominal 20-yr term from priority
B23K 26/123B23K 26/38B23K 10/00B23K 37/0235B23K 26/0665B23K 26/1462B23K 26/032B23K 26/14B23K 26/03
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Claims

Abstract

Apparatus, systems, and methods for monitoring the processing of a workpiece that includes directing an incident laser beam onto the workpiece and using an optical detector for measuring a signal emitted from the workpiece as a result of the incident laser beam. The detector generates at least two signals based upon the optical signal. The method also involves use of a light source monitor in determining workpiece processing quality based upon the quotient of the two outputs as well as a magnitude of one of the two quotients.

Claims

exact text as granted — not AI-modified
1 . A method of controlling a laser beam system, the method comprising the steps of: 
 a) directing an incident laser beam onto a workpiece;    b) providing at least one command signal from a controller to at least one auxiliary device to control an output parameter generated by said at least one auxiliary device wherein at least one auxiliary device is one of an energy source and an automatic process controller; and    c) detecting said output parameter generated by at least one auxiliary device and adjusting said at least one command signal provided to at least one auxiliary device based on said detected output.    
   
   
       2 - 47 . (canceled)

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