Reformed wafer boat

Abstract

The present invention discloses a reformed wafer boat. The reformed wafer boat has a plurality of trenches. A first interval is formed between each trench and one adjacent trench, and a second interval is formed between each trench and the other adjacent trench. The wafers placed on the trenches at both ends of the second interval are in form of back to back, and the first interval is formed between surfaces of each wafers. This kind of design does not affect uniformity during process, and the throughput can also be effectively improved.

1 . A reformed wafer boat with a plurality of trenches, each trench is used for placing a wafer and each trench and its adjacent trench form an interval, the plurality of intervals between the plurality of trenches are alternately composed of a first interval and a second interval, the first interval is longer than the second interval, and the wafers placed on the trenches at both ends of the second interval are in form of back to back.  
   
   
       2 . The reformed wafer boat of  claim 1 , wherein the reformed wafer boat is used in a furnace process.  
   
   
       3 . The reformed wafer boat of  claim 1 , wherein the reformed wafer boat is used in a POCl 3  doping process.