US2005205416A1PendingUtilityA1

Heat treatable coated article with niobium nitride IR reflecting layer and method of making same

52
Assignee: GUARDIAN INDUSTRIESPriority: Jan 9, 2003Filed: Feb 4, 2005Published: Sep 22, 2005
Est. expiryJan 9, 2023(expired)· nominal 20-yr term from priority
Inventors:Grzegorz Stachowiak
C03C 17/3435
52
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Claims

Abstract

A coated article is provided so as to include a solar control coating having an infrared (IR) reflecting layer sandwiched between at least a pair of dielectric layers. The IR reflecting layer includes niobium nitride (Nb x N y ). The use of niobium nitride enables the coated article to have good corrosion resistance to acid(s), good mechanical performance such as scratch resistance, and/or good color stability (i.e., a low ΔE* value(s)) upon heat treatment (HT). The coated article may be heat treated (e.g., thermally tempered) in certain example embodiments of the invention.

Claims

exact text as granted — not AI-modified
1 - 38 . (canceled)  
     
     
         39 . A method of making a coated article, the method comprising: 
 sputtering a first dielectric layer on a substrate;    sputtering a layer comprising niobium nitride on the substrate over the first dielectric layer;    sputtering a second dielectric layer on the substrate over the layer comprising niobium nitride; and    wherein the layer comprising niobium nitride is sputtered so as to form a layer comprising Nb x N y  where y/x is from 0.3 to 0.9.    
     
     
         40 . The method of  claim 39 , wherein y/x is from 0.4 to 0.8.  
     
     
         41 . The method of  claim 39 , further comprising heat treating the coated article for at least about 5 minutes at a temperature(s) of at least 580 degrees C., so that the coated article has a ΔE* value (glass side reflective) of no greater than 3.0 due to the heat treating.  
     
     
         42 . The method of  claim 39 , wherein the layer comprising niobium nitride has an index of refraction (n) of from about 2.0 to 2.4.  
     
     
         43 . The method of  claim 39 , wherein the layer comprising niobium nitride has an index of refraction (n) of from about 2.17 to 2.3.  
     
     
         44 . The method of  claim 39 , wherein the first dielectric layer and/or the second dielectric layer comprises silicon nitride.  
     
     
         45 . The method of  claim 39 , wherein the first dielectric layer and/or the second dielectric layer comprises silicon nitride doped with aluminum.  
     
     
         46 . The method of  claim 39 , wherein said sputtering the first dielectric layer on the substrate is performed so that the first dielectric layer is from 30 to 850 Å thick.  
     
     
         47 . The method of  claim 39 , wherein said sputtering the second dielectric layer is performed so that the second dielectric layer is from 200 to 500 Å thick.  
     
     
         48 . The method of  claim 39 , wherein the layer comprising niobium nitride is from 50 to 700 Å thick.  
     
     
         49 . The method of  claim 39 , wherein the layer comprising niobium nitride is from 100 to 500 Å thick.  
     
     
         50 . A method of making a coated article, the method comprising: 
 forming a first dielectric layer on a substrate;    forming a layer comprising niobium nitride on the substrate over at least the first dielectric layer;    forming a second dielectric layer on the substrate over at least the layer comprising niobium nitride; and    wherein the layer comprising niobium nitride comprises Nb x N y  where y/x is from 0.3 to 0.9.    
     
     
         51 . The method of  claim 50 , wherein y/x is from 0.4 to 0.8.  
     
     
         52 . The method of  claim 50 , further comprising heat treating the coated article for at least about 5 minutes at a temperature(s) of at least 580 degrees C., so that the coated article has a ΔE* value (glass side reflective) of no greater than 3.0 due to the heat treating.  
     
     
         53 . The method of  claim 50 , wherein the layer comprising niobium nitride has an index of refraction (n) of from about 2.0 to 2.4.  
     
     
         54 . The method of  claim 50 , wherein the layer comprising niobium nitride has an index of refraction (n) of from about 2.17 to 2.3.  
     
     
         55 . The method of  claim 50 , wherein the first dielectric layer and/or the second dielectric layer comprises silicon nitride.  
     
     
         56 . The method of  claim 50 , wherein the first dielectric layer and/or the second dielectric layer comprises silicon nitride doped with aluminum.  
     
     
         57 . The method of  claim 50 , wherein said sputtering the first dielectric layer on the substrate is performed so that the first dielectric layer is from 30 to 850 Å thick.  
     
     
         58 . The method of  claim 50 , wherein said sputtering the second dielectric layer is performed so that the second dielectric layer is from 200 to 500 Å thick.  
     
     
         59 . The method of  claim 50 , wherein the layer comprising niobium nitride is from 50 to 700 Å thick.  
     
     
         60 . The method of  claim 50 , wherein the layer comprising niobium nitride is from 100 to 500 Å thick.  
     
     
         61 . A method of making a coated article, the method comprising: 
 forming a first dielectric layer on a substrate;    forming a layer comprising niobium nitride on the substrate over at least the first dielectric layer;    forming a second dielectric layer on the substrate over at least the layer comprising niobium nitride; and    wherein the layer comprising niobium nitride comprises more niobium than nitrogen.    
     
     
         62 . The method of  claim 61 , further comprising heat treating the coated article for at least about 5 minutes at a temperature(s) of at least 580 degrees C., so that the coated article has a ΔE* value (glass side reflective) of no greater than 3.0 due to the heat treating.  
     
     
         63 . The method of  claim 61 , wherein the layer comprising niobium nitride has an index of refraction (n) of from about 2.0 to 2.4.  
     
     
         64 . The method of  claim 61 , wherein the layer comprising niobium nitride has an index of refraction (n) of from about 2.17 to 2.3.  
     
     
         65 . The method of  claim 61 , wherein the first dielectric layer and/or the second dielectric layer comprises silicon nitride doped with aluminum.  
     
     
         66 . The method of  claim 61 , wherein said sputtering the first dielectric layer on the substrate is performed so that the first dielectric layer is from 30 to 850 Å thick.  
     
     
         67 . The method of  claim 61 , wherein said sputtering the second dielectric layer is performed so that the second dielectric layer is from 200 to 500 Å thick.

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