Dual ion beam assisted deposition of biaxially textured template layers

Abstract

The present invention is directed towards a process and apparatus for epitaxial deposition of a material, e.g., a layer of MgO, onto a substrate such as a flexible metal substrate, using dual ion beams for the ion beam assisted deposition whereby thick layers can be deposited without degradation of the desired properties by the material. The ability to deposit thicker layers without loss of properties provides a significantly broader deposition window for the process.

1 - 7 . (canceled)  
   
   
       8 . An apparatus for deposition of a layer of a target material upon a buffered polycrystalline metal substrate by dual ion beam assisted deposition, said apparatus comprising: 
 a substrate holder;    a first ion gun for ion beam assisted deposition of a target material, said first ion gun having an incidence angle of 45° relative to a buffered polycrystalline metal substrate;    a second ion gun for ion beam assisted deposition of a target material, said second ion gun having an incidence angle of 45° relative to the buffered polycrystalline metal substrate and 90° relative to said first ion gun; and,    a source for providing said target material.    
   
   
       9 . The apparatus of  claim 8  wherein said target material is MgO.  
   
   
       10 . The apparatus of  claim 8  further including a temperature controller for heating or cooling a substrate during deposition.  
   
   
       11 . The apparatus of  claim 8  further including a reflected high-energy electron diffraction monitor.