Carrier for holding an object to be polished

Abstract

To provide a diamond-like carbon coated carrier for holding an object to be polished used for double-sided polishing, and a manufacturing method therefor. A carrier for holding an object to be polished according to the present invention has a substrate whose entire surface is coated with diamond-like carbon. A method of the present invention includes coating the entire carrier surface with diamond-like carbon using a surface coating apparatus using plasma CVD.

1 . A carrier for holding an object to be polished, comprising a substrate whose entire surface is coated with diamond-like carbon.  
   
   
       2 . A carrier for holding an object to be polished according to  claim 1 , 
 the carrier being used for a polishing apparatus,    the polishing apparatus being a double-sided polishing apparatus for polishing both surfaces of the object to be polished at a time by holding the object to be polished between upper and lower platens covered with abrasive cloth,    the platens and the object to be polished being in pressure contact with each other, and rotating at least one of the upper and lower platens and the polishing object.    
   
   
       3 . A carrier for holding an object to be polished according to  claim 1 , wherein the diamond-like carbon is formed into a film having a thickness of 0.10 μm to 20 μm.  
   
   
       4 . A carrier for holding an object to be polished according to  claim 1 , wherein the substrate is made of one selected from the group consisting of stainless steel, steel, aluminum, an aluminum alloy, a resin, a fiber-reinforced resin, and a composite thereof.  
   
   
       5 . A method of manufacturing the object to be polished according to  claim 1 , 
 the method comprising:    providing a surface coating apparatus using a plasma CVD method in which an anode electrode and a cathode electrode are arranged face to face in a vacuum chamber, a carrier substrate is interposed between the anode electrode and the cathode electrode, and RF power is applied between the anode electrode and the cathode electrode while supplying a material gas to form a diamond-like carbon film on the substrate surface;    interposing a substrate between the anode electrode and the cathode electrode; and    shifting a supporting position of the substrate during formation of the diamond-like carbon film or between current formation and next formation.    
   
   
       6 . A method of manufacturing the object to be polished according to  claim 5 , further comprising: 
 uniformizing a thickness of the carrier substrate; and    coating the substrate surface with diamond-like carbon.    
   
   
       7 . A method of manufacturing the object to be polished,  
     the method comprising: 
 mounting a carrier for holding the object to be polished according to  claim 1 , between upper and lower platens covered with abrasive cloth;  
 holding the object to be polished in a holding hole in the carrier for holding the object to be polished; and  
 rotating at least one of the upper and lower platens and the object to be polished while supplying an abrasive slurry to a surface to be processed to polish both surfaces of the object to be polished,  
 wherein the abrasive cloth is made of one selected from the group consisting of sueded synthetic leather, polyurethane, and a composite prepared by binding non-woven cloth with polyurethane.