Film-processing method and film-processing apparatus

Abstract

A film-processing method according to the present invention includes: a processing step of irradiating electron beams onto a film on a surface of an object to be processed to conduct a process to the film; an electric-current measuring step of capturing the electron beams in a vicinity of the object to be processed to measure an electric-current value during the processing step; and a detecting step of detecting an end point of the process to the film, based on an amount of electron obtained by means of a time integration of the electric-current value. According to the present invention, a suitable irradiation of the electron beams onto the film on a surface of the object to be processed can be realized. Thus, a suitable film quality can be obtained.

1 - 9 . (canceled)  
     
     
         10 . A film-processing method comprising: 
 a processing step of irradiating electron beams onto a film on a surface of an object to be processed to conduct a process to modify a quality of the film;    an emission-intensity measuring step of measuring an intensity of the emission spectrum with respect to a certain wavelength of plasma corresponding to a certain detached gas; and    a detecting step of detecting an end point of the process based on the intensity of    the emission spectrum obtained by the emission-intensity measuring step.    
     
     
         11 . A film-processing method according to  claim 10 , wherein 
 the certain wavelength is an emission wavelength of a hydrogen radical.    
     
     
         12 . A film-processing method according to  claim 10 , wherein 
 the detecting step detects the end point of the process based on time integration of the intensity of the emission spectrum obtained by the emission-intensity measuring step.    
     
     
         13 . A film-processing method according to  claim 10 , further comprising: 
 a calculating step of previously calculating, as a reference value, an integrated intensity of the emission spectrum before an end point of a reference process to a reference film on an object to be processed, wherein    the detecting process detects the end point of the process based on the reference value.    
     
     
         14 . A film-processing apparatus comprising: 
 a processing unit which irradiates electron beams onto a film on a surface of an object to be processed to modify a quality of the film;    an emission-intensity sensor which measures an intensity of the emission spectrum with respect to a certain wavelength of plasma corresponding to a certain detached gas; and    a detecting unit which detects an end point of the process based on the intensity of the emission spectrum measured by the emission-intensity sensor.    
     
     
         15 . A film-processing apparatus according to  claim 14 , wherein 
 the certain wavelength is an emission wavelength of a hydrogen radical.    
     
     
         16 . A film-processing apparatus according to  claim 14 , further comprising: 
 a calculating unit which calculates an integrated intensity of the emission spectrum by means of time integration of the intensity of the emission spectrum, wherein    the detecting unit is adapted to detect the end point of the process based on the integrated intensity.    
     
     
         17 . A film-processing apparatus according to  claim 16 , further comprising: 
 a storing unit which stores a reference value of an integrated intensity of the emission spectrum before an end point of a reference process to a reference film on an object to be processed; wherein    the detecting unit is adapted to detect the end point of the process based on the reference value.    
     
     
         18 . A film-processing apparatus according to  claim 14 , further comprising: 
 a processing container;    a stage disposed in the processing container; and    a plurality of electron beam tubes which irradiate electron beams onto an object to be processed mounted on the stage.    
     
     
         19 . A film-processing apparatus according to  claim 14 , wherein 
 the emission-intensity sensor includes a collimator, an optical fiber and a spectrograph.