Flat light source with high and uniform intensity

Abstract

A flat light source with high and uniform intensity includes a reflective frame having several shapes, a ultraviolet insulated layer and a substrate covered on the reflective frame to form a placing space. The ultraviolet light sources are equipped in the placing space, and the ultraviolet light directly or indirectly excites the fluorescence powder layer to radiate the visible light. The visible light directly or reflectively passes through the ultraviolet insulated layer and the substrate to form a flat light source with high and uniform intensity. The present invention can be achieved without the seal and vacuum processes, so that the cost is reduced and the lamp burned situation is solved. The material or shape is selected accordingly, that will have the manufacture flexibility and convenience. Enlarging the coating area of the fluorescence powder layer and enhancing the reflective rate of the reflective frame improve the illumination efficiency.

1 . A flat light source with high and uniform intensity comprises: 
 a reflective frame;    a substrate covered on the reflective frame to form at least one placing space;    at least one fluorescence powder layer placed on the reflective frame in the placing space; and    a plurality of ultraviolet light source installed in the placing space.    
     
     
         2 . The flat light source with high and uniform intensity of  claim 1 , wherein material of the substrate is selected from glass and plastic.  
     
     
         3 . The flat light source with high and uniform intensity of  claim 2 , wherein material of the glass is selected from soda-lime glass, quartz glass, sodium glass, borosilicate glass, boron lead sodium glass and nonleaded glass.  
     
     
         4 . The flat light source with high and uniform intensity of  claim 2 , wherein material of the plastic is selected from Polymethylmethacrylate (PMMA), Polycarbonate (PC) and Polyethylene Terephthalate (PET).  
     
     
         5 . The flat light source with high and uniform intensity of  claim 1 , wherein the substrate has a upper and a lower surfaces, and a transparent conductive layer is located on any surface of the substrate.  
     
     
         6 . The flat light source with high and uniform intensity of  claim 5 , wherein the transparent conductive layer is selected from indium tin oxide (ITO), In 2 O 3  and SnO 2 .  
     
     
         7 . The flat light source with high and uniform intensity of  claim 1 , wherein the substrate has a upper and a lower surfaces, and a transparent conductive layer is located on each surface of the substrate.  
     
     
         8 . The flat light source with high and uniform intensity of  claim 7 , wherein the transparent conductive layer is selected from indium tin oxide (ITO), In 2 O 3  and SnO 2 .  
     
     
         9 . The flat light source with high and uniform intensity of  claim 1  can further have a ultraviolet insulated layer located on at least one surface of the substrate.  
     
     
         10 . The flat light source with high and uniform intensity of  claim 9 , wherein material of the ultraviolet separation layer is selected from optical film, glass and macromolecular compound.  
     
     
         11 . The flat light source with high and uniform intensity of  claim 10 , wherein the optical film is selected from CaF 2 , Na 3 AlF 6 , AlF 3 , ThF 4 , LaF 3 , NdF 3 , CeF 3 , PbF 2 , ZnS, CdS, ZnSe, ZnTe, Sb 2 S 3 , Ge 30 As 17 Te 30 Se 23 , InSb, InAs, PbTe, Si, Ge, SiO 2 , SiO, Al 2 O 3 , Nd 2 O 3 , Cd 2 O 3 , ThO 2 , Y 2 O 3 , Sc 2 O 3 , La 2 O 3 , Pr 6 O 11 , HfO 2 , ZnO, TiO, PbO, ZrO 2 , TiO 2 , ZrTiO 4 , MgO, CeO 2 , Ta 2 O 5 , MgF 2 , NaF and LiF.  
     
     
         12 . The flat light source with high and uniform intensity of  claim 10 , wherein material of the glass is selected from soda-lime glass, quartz glass, sodium glass, borosilicate glass, boron lead sodium glass and nonleaded glass.  
     
     
         13 . The flat light source with high and uniform intensity of  claim 9 , wherein the ultraviolet separation layer in the placing space can be further equipped the fluorescence powder layer when the ultraviolet insulated layer locates between the reflective frame and the substrate.  
     
     
         14 . The flat light source with high and uniform intensity of  claim 1 , wherein the substrate in the placing space can be further equipped the fluorescence powder layer.  
     
     
         15 . The flat light source with high and uniform intensity of  claim 1 , wherein the fluorescence powder layer is selected from mixture of solvent and fluorescence powder, mixture of solution and fluorescence powder, and mixture of macromolecular compound and fluorescence powder.  
     
     
         16 . The flat light source with high and uniform intensity of  claim 1 , wherein the fluorescence powder layer can absorb the ultraviolet light with wavelength 200 nm to 400 nm to radiate visible light.  
     
     
         17 . The flat light source with high and uniform intensity of  claim 1 , wherein the ultraviolet light source is selected from an ultraviolet lamp without fluorescence powder.  
     
     
         18 . The flat light source with high and uniform intensity of  claim 1 , wherein a blocking layer is further formed between the ultraviolet light source and the substrate, position of the blocking layer is selected from surface of the ultraviolet light source and top of the ultraviolet light source, the ultraviolet light directly emitted to the substrate can be reflected to the fluorescence powder layer by the blocking layer.  
     
     
         19 . The flat light source with high and uniform intensity of  claim 18 , wherein the blocking layer covers half of surface of the ultraviolet light source when the blocking layer locates on surface of the ultraviolet light source, and width of the blocking layer is smaller than width of the ultraviolet light source when the blocking layer locates on top of the ultraviolet light source.  
     
     
         20 . The flat light source with high and uniform intensity of  claim 18 , wherein material of the blocking layer is selected from metal, metallic oxide and optical film.  
     
     
         21 . The flat light source with high and uniform intensity of  claim 20 , wherein material of the metal is selected from aluminum, chromium, gold, silver, stainless steel and copper.  
     
     
         22 . The flat light source with high and uniform intensity of  claim 20 , wherein the optical film is selected from CaF 2 , Na 3 AlF 6 , AlF 3 , ThF 4 , LaF 3 , NdF 3 , CeF 3 , PbF 2 , ZnS, CdS, ZnSe, ZnTe, Sb 2 S 3 , Ge 30 As 17 Te 30 Se 23 , InSb, InAs, PbTe, Si, Ge, SiO 2 , SiO, Al 2 O 3 , Nd 2 O 3 , Cd 2 O 3 , ThO 2 , Y 2 O 3 , Sc 2 O 3 , La 2 O 3 , Pr 6 O 11 , HfO 2 , ZnO, TiO, PbO, ZrO 2 , TiO 2 , ZrTiO 4 , MgO, CeO 2 , Ta 2 O 5 , MgF 2 , NaF and LiF.  
     
     
         23 . The flat light source with high and uniform intensity of  claim 1 , wherein material of the reflective frame is selected from metal, metallic oxide, plastic, plastic covered metal layer, plastic covered metallic oxide layer and compound material of plastic and white ceramic powder.  
     
     
         24 . The flat light source with high and uniform intensity of  claim 23 , wherein material of the metal is selected from aluminum, chromium, gold, silver, stainless steel and copper.  
     
     
         25 . The flat light source with high and uniform intensity of  claim 23 , wherein material of the plastic is selected from Polymethylmethacrylate (PMMA), Polycarbonate (PC) and Polyethylene Terephthalate (PET).  
     
     
         26 . The flat light source with high and uniform intensity of  claim 23 , wherein material of the metal layer is selected from aluminum, TiN, TiC and chromium.  
     
     
         27 . The flat light source with high and uniform intensity of  claim 23 , wherein material of the white ceramic powder is selected from MgO, TiO 2 and Al 2 O 3 .  
     
     
         28 . The flat light source with high and uniform intensity of  claim 1 , wherein the reflective frame has a side surface surrounding the placing space and a bottom surface, the bottom surface is formed a plurality of bumps and top of each bump is formed at least one ultraviolet light source.  
     
     
         29 . The flat light source with high and uniform intensity of  claim 1 , wherein the reflective frame has a side surface surrounding the placing space and a bottom surface, the bottom surface is formed at least one bump and the bump separates the placing space to form a plurality of intervals.  
     
     
         30 . The flat light source with high and uniform intensity of  claim 29 , wherein the bump and the substrate are at a distance.  
     
     
         31 . The flat light source with high and uniform intensity of  claim 29 , wherein the bump touches the substrate.  
     
     
         32 . The flat light source with high and uniform intensity of  claim 29 , wherein an ultraviolet insulated layer can be further formed between the substrate and the reflective frame, and the bump and the ultraviolet insulated layer are at a distance.  
     
     
         33 . The flat light source with high and uniform intensity of  claim 29 , wherein a ultraviolet insulated layer can be further formed between the substrate and the reflective frame, and the bump touches the ultraviolet insulated layer.  
     
     
         34 . The flat light source with high and uniform intensity of  claim 29 , wherein shape of the bump is selected from rectangle, trapezoid, triangle, wavy shape, arc, stair shape and other polygons.  
     
     
         35 . The flat light source with high and uniform intensity of  claim 29 , wherein at least one ultraviolet light source is formed in each interval.  
     
     
         36 . The flat light source with high and uniform intensity of  claim 29 , wherein the ultraviolet light source is formed at extending direction vertical to the bump.  
     
     
         37 . The flat light source with high and uniform intensity of  claim 1 , wherein the reflective frame is a continuous trench.  
     
     
         38 . The flat light source with high and uniform intensity of  claim 37 , wherein at least one ultraviolet light source is formed in each trench.  
     
     
         39 . The flat light source with high and uniform intensity of  claim 37 , wherein the ultraviolet light source is formed at extending direction vertical to the trench.  
     
     
         40 . The flat light source with high and uniform intensity of  claim 37 , wherein shape of the trench is selected from arc, trapezoid, triangle, rectangle, stair shape, wavy shape and other polygons.  
     
     
         41 . The flat light source with high and uniform intensity of  claim 1 , wherein the reflective frame has a side surface surrounding the placing space and a bottom surface, the bottom surface is surface-prepared to form a specific pattern.  
     
     
         42 . The flat light source with high and uniform intensity of  claim 41 , wherein the specific pattern is selected from horizontal pattern, vertical pattern, twill pattern and floral pattern.  
     
     
         43 . The flat light source with high and uniform intensity of  claim 1 , wherein the reflective frame has a side surface surrounding the placing space and a bottom surface, shape of the bottom surface is selected from regular curve and irregular curve.