Window type probe, plasma monitoring device, and plasma processing device

Abstract

This invention relates to a detection port type probe, a plasma monitoring device, and a plasma processing apparatus. It is intended to directly and conveniently detect a state of plasma generated by an application of a radio frequency or a high voltage, and the detection port type probe is provided with at least an electroconductive supporting member ( 5 ) having an opening formed on at least a part of a surface thereof facing to plasma and a dielectric member ( 1 ) having a probe electrode ( 2 ) formed on one side thereof positioned at the opening of the electroconductive supporting member ( 5 ).

1 . A detection port type probe characterized by comprising at least an electroconductive supporting member having an opening formed on at least a part of a surface thereof facing to plasma and a dielectric member having a probe electrode formed on one side thereof positioned at the opening of the electroconductive supporting member.  
   
   
       2 . The detection port type probe according to  claim 1 , characterized by connecting an impedance matching unit to the probe electrode.  
   
   
       3 . The detection port type probe according to  claim 1 , characterized in that the dialectic member is made from an optically transparent glass.  
   
   
       4 . The detection port type probe according to  claim 3 , characterized in that the probe electrode is made from an optically transparent electroconductive substance.  
   
   
       5 . The detection port type probe according to  claim 1 , characterized in that the opening formed on the electroconductive supporting member has a function of a viewing port.  
   
   
       6 . A plasma monitoring device using the detection port type probe defined in  claim 1 , characterized in that a voltage waveform measuring unit for measuring a voltage waveform is disposed at an output end of the detection port type probe.  
   
   
       7 . The plasma monitoring device according to  claim 6 , characterized by comprising a process monitoring mechanism for detecting a stability of plasma by detecting a degree of nonuniformity among cyclical waveform changes of the voltage waveform detected by the voltage waveform measuring unit.  
   
   
       8 . The plasma monitoring device according to  claim 6 , characterized by comprising an anomalous discharge monitoring mechanism for detecting anomalous discharge of plasma from the changes in voltage waveform detected by the voltage waveform measuring unit.  
   
   
       9 . A plasma processing apparatus characterized by comprising the plasma monitoring device defined in  claim 6 .  
   
   
       10 . The plasma processing apparatus according to  claim 9 , characterized in that the electroconductive supporting member provided with the opening is a flange constituting a viewing port of a reaction vessel, and that the dielectric member is a transparent glass plate for sealing the flange.