In-situ surfactant and chemical oxidant flushing for complete remediation of contaminants and methods of using same

Abstract

The present invention relates to removal of subsurface contaminants and methods of same. In more particular, but not by way of limitation, the present invention relates to an integrated method for remediating subsurface contaminants through the use of a low concentration surfactant solution (and methods of making and using novel surfactant solutions) followed by an abiotic polishing process to thereafter achieve a substantially reduced subsurface contaminant concentration that surfactant flushing alone cannot achieve.

1 . A method for substantially removing subsurface contaminants, comprising the steps of: 
 introducing an effective amount of at least one preselected surfactant solution; and    introducing an effective amount of at least one preselected chemical oxidant, wherein the effective amount of the at least one preselected surfactant in combination with the effective amount of the at least one preselected chemical oxidant are capable of substantially removing subsurface contaminants.    
   
   
       2 . The method of  claim 1 , wherein the effective amount of the preselected subsurface contaminant is introduced first and the effective amount of the at least one preselected chemical oxidant is introduced second.  
   
   
       3 . A method for substantially expediting subsurface remediation of contaminants comprising the steps of: 
 introducing at least one surfactant capable of remediating at least one subsurface contaminant and sequentially introducing at least one preselected chemical oxidant.    
   
   
       4 . The method of  claim 3 , wherein, in the step of introducing at least one surfactant solution capable of remediating at least one subsurface contaminant and sequentially introducing at least one preselected chemical oxidant, the preselected chemical oxidant is introduced by the method of injection.  
   
   
       5 . The method of  claim 3 , wherein the subsurface contaminant is a dense non-aqueous phase liquid.  
   
   
       6 . The method of  claim 3 , wherein the subsurface contaminant is a light non-aqueous phase liquid.  
   
   
       7 . The method of  claim 1 , wherein the preselected surfactant solution is selected from the group consisting of an anionic surfactant, a cationic surfactant, a nonionic surfactant or any combinations thereof and one or more combinations thereof.  
   
   
       8 . The method of  claim 7 , wherein the preselected surfactant solution is a mixture of sodium dioctylsulfosuccinate and sodium dihexylsulfosuccinate.  
   
   
       9 . The method of  claim 7 , wherein the preselected surfactant solution is a mixture of sodium dioctylsulfosuccinate and polyoxyethylene sorbitan monooleate.  
   
   
       10 . The method of  claim 7 , wherein the preselected surfactant solution is a mixture of sodium dioctylsulfosuccinate and linear alkyl diphenyloxide disulfonate.  
   
   
       11 . The method of  claim 7 , wherein the preselected surfactant solution is a mixture of alkylamine sodium sulfonate and sodium dihexylsulfosuccinate.  
   
   
       12 . The method of  claim 1 , wherein the effective amount of the at least one preselected chemical oxidant is a free radical.  
   
   
       13 . The method of  claim 12 , wherein the effective amount of the at least one preselected chemical oxidant is selected from the group consisting of hydrogen peroxide, potassium permanganate, and combinations thereof.  
   
   
       14 . The method of  claim 1 , wherein the wt % of effective amount of the at least one preselected surfactant solution is in a range from about 0.05% to about 15%.  
   
   
       15 . The method of  claim 1 , wherein the wt % of effective amount of the at least one preselected surfactant solution is in a range from about 3% to about 8%.  
   
   
       16 . The method of  claim 1 , wherein the wt % of effective amount of the at least one preselected surfactant solution is in a range from about 1% to about 3%.  
   
   
       17 . The method of  claim 1 , wherein the wt % of effective amount of the at least one preselected surfactant solution is in a range from about 0.05% to about 1%.  
   
   
       18 . The method of  claim 1 , wherein the effective amount of the at least one preselected surfactant solution is anionic.  
   
   
       19 . The method of  claim 1 , wherein the effective amount of the at least one preselected surfactant solution is nonionic.  
   
   
       20 . An abiotic process for polishing at least one surfactant remediated subsurface contaminant in order to further remediate at least one subsurface contaminant to substantially undetectable levels, comprising the step of introducing an effective amount of at least one preselected chemical oxidant capable of degrading the remaining at least one of subsurface contaminant to substantially undetectable levels.  
   
   
       21 . The process of  claim 20 , wherein the effective amount of the at least one preselected chemical oxidant is introduced by the method of injection.  
   
   
       22 . The process of  claim 20 , wherein the subsurface contaminant is a dense non-aqueous phase liquid.  
   
   
       23 . The process of  claim 20 , wherein the subsurface contaminant is a light non-aqueous phase liquid.  
   
   
       24 . The process of  claim 20 , wherein the effective amount of the at least one preselected chemical oxidant is a free radical.  
   
   
       25 . The process of  claim 20 , wherein the effective amount of the at least one preselected chemical oxidant is selected from the group consisting of hydrogen peroxide, potassium permanganate, and combinations thereof.  
   
   
       26 . A method for substantially removing subsurface contaminants, comprising the steps of: 
 introducing an effective amount of at least one preselected surfactant solution, including the steps of:    determining the contaminant solubilization of the surfactant system,    determining the surfactant sorption and precipitation of the surfactant system    determining the surfactant non-aqueous phase liquid behavior properties of the surfactant system to assess the potential for surfactant losses under subsurface conditions, and    performing contaminant extraction-column studies to simulate flow through conditions in the aquifer;    introducing an effective amount of at least one preselected chemical oxidant, including the steps of:    determining relative reaction rates of the reactant,    determining the life span of the reactant,    evaluating the chemical demand associated with pH adjustment, and    identifying geochemical characteristics of the site;    wherein the effective amount of the at least one preselected surfactant in combination with the effective amount of the at least one preselected chemical oxidant are capable of substantially removing subsurface contaminants.    
   
   
       27 . The method of  claim 26 , wherein the effective amount of the preselected subsurface contaminant is introduced first and the effective amount of the at least one preselected chemical oxidant is introduced second.  
   
   
       28 . A method comprising the steps of determining chemical addition ratios and reaction times for a chemical oxidation system based on the following data: 
 reaction kinetics;    pH conditions;    naturally occurring interference within the subsurface of the specific site; and    mobility control of the injected oxidant to the targeted area.    
   
   
       29 . A subsurface contaminant site substantially remediated by the process comprising the steps of: 
 introducing an effective amount of at least one preselected surfactant solution; and    introducing an effective amount of at least one preselected chemical oxidant, wherein the effective amount of the at least one preselected surfactant in combination with the effective amount of the at least one preselected chemical oxidant are capable of substantially removing subsurface contaminants.    
   
   
       30 . The substantially remediated site of  claim 29 , wherein the effective amount of the preselected subsurface contaminant is introduced first and the effective amount of the at least one preselected chemical oxidant is introduced second.  
   
   
       31 . The substantially remediated site of  claim 30 , wherein the preselected surfactant solution is selected from the group consisting of an anionic surfactant, a cationic surfactant, a nonionic surfactant or any combinations thereof and one or more combinations thereof.  
   
   
       32 . The substantially remediated site of  claim 30 , wherein the preselected surfactant solution is a mixture of sodium dioctylsulfosuccinate and sodium dihexylsulfosuccinate.  
   
   
       33 . The substantially remediated site of  claim 30 , wherein the preselected surfactant solution is a mixture of sodium dioctylsulfosuccinate and polyoxyethylene sorbitan monooleate.  
   
   
       34 . The substantially remediated site of  claim 30 , wherein the preselected surfactant solution is a mixture of sodium dioctylsulfosuccinate and linear alkyl diphenyloxide disulfonate.  
   
   
       35 . The substantially remediated site of  claim 30 , wherein the preselected surfactant solution is a mixture of alkylamine sodium sulfonate and sodium dihexylsulfosuccinate.  
   
   
       36 . The substantially remediated site of  claim 29 , wherein the effective amount of the at least one preselected chemical oxidant is a free radical.  
   
   
       37 . The substantially remediated site of  claim 33 , wherein the effective amount of the at least one preselected chemical oxidant is selected from the group consisting of hydrogen peroxide, potassium permanganate, and combinations thereof.  
   
   
       38 . The substantially remediated site of  claim 29 , wherein the wt % of effective amount of the at least one preselected surfactant solution is in a range from about 0.05% to about 15%.  
   
   
       39 . The substantially remediated site of  claim 29 , wherein the wt % of effective amount of the at least one preselected surfactant solution is in a range from about 3% to about 8%.  
   
   
       40 . The substantially remediated site of  claim 29 , wherein the wt % of effective amount of the at least one preselected surfactant solution is in a range from about 1% to about 3%.  
   
   
       41 . The substantially remediated site of  claim 29 , wherein the wt % of effective amount of the at least one preselected surfactant solution is in a range from about 0.05% to about 1%.  
   
   
       42 . The substantially remediated site of  claim 29 , wherein the effective amount of the at least one preselected surfactant solution is anionic.  
   
   
       43 . The substantially remediated site of  claim 29 , wherein the effective amount of the at least one preselected surfactant solution is nonionic.  
   
   
       44 . A subsurface contaminant site substantially remediated by the process comprising the steps of: 
 introducing at least one surfactant capable of remediating at least one subsurface contaminant and sequentially introducing at least one preselected chemical oxidant.    
   
   
       45 . The substantially remediated site of  claim 44 , wherein, in the step of introducing at least one surfactant solution capable of remediating at least one subsurface contaminant and sequentially introducing at least one preselected chemical oxidant, the preselected chemical oxidant is introduced by the method of injection.  
   
   
       46 . The substantially remediated site of  claim 44 , wherein the subsurface contaminant is a dense non-aqueous phase liquid.  
   
   
       47 . The substantially remediated site of  claim 44 , wherein the subsurface contaminant is a light non-aqueous phase liquid.