US2005167634A1PendingUtilityA1

Etchant for nickel silicide

Assignee: LG PHILIPS LCD CO LTDPriority: Dec 27, 2001Filed: Apr 1, 2005Published: Aug 4, 2005

Est. expiryDec 27, 2021(expired)· nominal 20-yr term from priority

Inventors:Hyun-Sik Seo Binn Kim

H10P 50/71H10P 14/3806H10P 14/3411H10P 50/667H10D 30/0321H10D 30/6745H10D 30/6731H10D 30/0314H10D 30/67

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Claims

Abstract

An etchant for etching nickel silicide (NiSi x ) is provided. The etchant includes about 3% to about 10% by weight of hydrofluoric acid and about 1% to about 5% by weight of hydrogen peroxide.

Claims

exact text as granted — not AI-modified

1 . An etchant for nickel silicide (NiSi x ), comprising: 
 about 3% to about 10% by weight of hydrofluoric acid; and    about 1% to about 5% by weight of hydrogen peroxide.    
     
     
         2 . The etchant according to  claim 1 , wherein the hydrofluoric acid of the etchant is about 5% by weight and the hydrogen peroxide of the etchant is about 3% by weight.

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