Vacuum processing apparatus and control method therefor

Abstract

There is provided a vacuum processing apparatus and an exhausting apparatus of the vacuum processing apparatus according to which the auxiliary vacuum pump can be made smaller or eliminated, and hence energy-saving and space-saving can be achieved, and moreover the floor space occupied by the exhausting apparatus can be reduced, and hence the vacuum processing apparatus as a whole can be made smaller in size. A main vacuum pump has an intake port connected to a processing chamber in which an article to be processed is processed in a vacuum atmosphere, to exhaust the processing chamber to a vacuum state. An auxiliary vacuum pump is connected to a discharge port of the main vacuum pump to exhaust the main vacuum pump to a vacuum state. The main vacuum pump processing chamber to a vacuum state with a predetermined high back pressure value.

1 - 18 . (canceled)  
   
   
       19 . A method of controlling a vacuum processing apparatus comprising a processing chamber into which a processing gas is introduced and in which an article to be processed is processed in a vacuum atmosphere, a main vacuum pump having an intake port and a discharge port, wherein the intake port is connected to said processing chamber to exhaust said processing chamber to a vacuum state, an auxiliary vacuum pump that is connected to the discharge port of said main vacuum pump to exhaust said main vacuum pump to a vacuum state, and automatic pressure regulating means for regulating a pressure inside said processing chamber, the method comprising the steps of: 
 detecting a value of a pressure inside said processing chamber and a flow rate of the processing gas introduced into said processing chamber; and    controlling at least one parameter out of apparatus control parameters including a rotational speed of said auxiliary vacuum pump, a degree of opening of said automatic pressure regulating means, and a rotational speed of said main vacuum pump, based on the value of the pressure inside said processing chamber and the flow rate of the processing gas introduced into said processing chamber.    
   
   
       20 . A method of controlling a vacuum processing apparatus as claimed in  claim 19 , wherein the vacuum processing apparatus further comprises supply means for supplying a purge gas into a juncture between said main vacuum pump and said auxiliary vacuum pump, and the apparatus control parameters further include a supply rate of the purge gas.  
   
   
       21 . A method of controlling a vacuum processing apparatus as claimed in  claim 19 , wherein said at least one parameter includes the rotational speed of said auxiliary vacuum pump.  
   
   
       22 . A method of controlling a vacuum processing apparatus as claimed in  claim 19 , wherein said at least one parameter includes the degree of opening of said automatic pressure regulating means.  
   
   
       23 . A method of controlling a vacuum processing apparatus as claimed in  claim 19 , wherein said at least one parameter includes the rotational speed of said main vacuum pump.