US2005164125A1PendingUtilityA1

Photoimageable composition

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Assignee: SANDIA NAT LABPriority: Apr 17, 2002Filed: Jan 6, 2005Published: Jul 28, 2005
Est. expiryApr 17, 2022(expired)· nominal 20-yr term from priority
Inventors:Paul DentingerKaren KrafcikKelby Simison
G03F 7/0045Y10S430/126G03F 7/40G03F 7/0046Y10S430/115G03F 7/038C07C 381/12
45
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Claims

Abstract

The use of photoacid generators including an alkoxyphenylphenyliodonium salt and/or bis(t-butylphenyl)iodonium salt in a photoimageable composition helps improve resolution. Suitable photoimageable compositions includes: (a) a multifunctional polymeric epoxy resin that is dissolved in an organic solvent wherein the epoxy resin comprises oligomers of bisphenol A that is quantitatively protected by glycidyl ether and wherein the oligomers have an average functionality that ranges from about 3 to 12; and a photoacid generator comprising an alkoxyphenylphenyliodonium salt and/or bis(t-butylphenyl)iodonium salt. Preferred alkoxyphenylphenyliodonium salts include 4-octyloxyphenyl phenyliodonium hexafluoroantimonate and 4-methoxyphenyl phenyliodonium hexafluoroantimonate. The photoimageable composition is particularly suited for producing high aspect ration microstructure.

Claims

exact text as granted — not AI-modified
1 . A method of forming a template or mold suitable for fabricating a microstructure that comprises the steps of: 
 (a) forming a layer of photoimageable composition on a substrate surface wherein the photoimageable composition comprises: 
 (i) a multifunctional polymeric epoxy resin that is dissolved in an organic solvent wherein the epoxy resin comprises oligomers of bisphenol A that are quantitively protected by glycidyl ether and wherein the oligomers have an average functionality that ranges from about 3 to 12; and  
 (ii) a photoactive compound comprising an alkoxyphenylphenyliodonium salt and/or bis(t-butylphenyl)iodonium salt;  
   (b) exposing the layer of photoimageable composition to a pattern of radiation which produces a catalyst capable of changing the photoimageable composition's susceptibility to a developer; and    (c) applying a developer to remove nonexposed portions of the photoimageable compound which are susceptible to the developer thereby creating a layer defining one or more open patterns therein wherein the one or more open patterns have non-linear dimensions.    
     
     
         2 . The method of  claim 1  wherein the photoactive compound is an alkoxyphenylphenyliodonium salt.  
     
     
         3 . The method of  claim 1  wherein the photoactive compound is selected from the group consisting of 4-octyloxyphenyl phenyliodonium hexafluoroantimonate (OPI HFA), 4-methoxyphenyl phenyliodonium hexafluoroantimonate (MPI HFA), methide salts thereof and mixtures thereof.  
     
     
         4 . The method of  claim 1  wherein the multifunctional polymeric epoxy resin comprises a bisphenol A novolac glycidyl ether.  
     
     
         5 . The method of  claim 1  wherein step (b) comprises exposing the layer of photoimageable composition with a pattern of ultraviolet radiation.  
     
     
         6 . The method of  claim 1  wherein the amount photoactive compound present is about 1 to 12 parts by weight based on 100 parts by weight of the resin.  
     
     
         7 . The method of  claim 1  wherein the photoactive compound is 4-octyloxyphenyl phenyliodonium hexafluoroantimonate.  
     
     
         8 . The method of  claim 1  wherein the photoactive compound is 4-methoxyphenyl phenyliodonium hexafluoroantimonate.  
     
     
         9 . The method of  claim 1  wherein the photoactive compound is bis(t-butylphenyl)iodonium hexafluoroantimonate or methide salts thereof.  
     
     
         10 . The method of  claim 1  wherein the oligomers have an average functionality of about 8.  
     
     
         11 . The method of  claim 1  wherein the one or more open patterns formed in step (c) are suitable for fabricating a microstructure wherein at least one of its height, width, diameter or length is less than about 100 microns.  
     
     
         12 . A method of fabricating a metal structure, which has an aspect ratio of from 0.1 to 70, that comprises the steps of: 
 (a) forming a layer of photoimageable composition on a substrate surface wherein the photoimageable composition comprises: 
 (i) a multifunctional polymeric epoxy resin that is dissolved in an organic solvent wherein the epoxy resin comprises oligomers of bisphenol A that are quantitatively protected by glycidyl ether and wherein the oligomers have an average functionality that ranges from about 3 to 12; and  
 (ii) a photoacid generator comprising an alkoxyphenylphenyliodonium salt and/or bis(t-butyphenyl)iodonium salt;  
   (b) exposing the layer of photoimageable composition to a pattern of radiation which changes the photoimageable composition's susceptibility to a developer;    (c) applying a developer to remove nonexposed portions of the photoimageable composition which are susceptible to the developer to create a mold area within an exposed portion of the photoimageable composition;    (d) depositing a metal into the mold area; and    (e) removing the exposed photoimageable composition to yield the metal structure.    
     
     
         13 . The method of  claim 12  wherein step (d) comprises electroplating a metal into the mold area.  
     
     
         14 . The method of  claim 12  wherein the photoacid generator is an alkoxyphenylphenyliodonium salt.  
     
     
         15 . The method of  claim 12  wherein the photoacid generator is selected from the group consisting of 4-octyloxyphenyl phenyliodonium hexafluoroantimonate (OPI HFA), 4-methoxyphenyl phenyliodonium hexafluoroantimonate (MPI HFA), methide salts thereof, and mixtures thereof.  
     
     
         16 . The method of  claim 12  wherein the multifunctional polymeric epoxy resin comprises a bisphenol A novolac glycidyl ether.  
     
     
         17 . The method of  claim 12  wherein step (b) comprises exposing the layer of photoimageable composition with a pattern of ultraviolet radiation.  
     
     
         18 . The method of  claim 12  wherein the metal structure formed has a nonlinear surface.  
     
     
         19 . The method of  claim 12  wherein the metal structure formed has a curved surface.  
     
     
         20 . The method of  claim 12  wherein the amount photoacid generators present is about 1 to 12 parts by weight based on 100 parts by weight of the resin.  
     
     
         21 . The method of  claim 12  wherein the photoacid generator is 4-octyloxyphenyl phenyliodonium hexafluoroantimonate.  
     
     
         22 . The method of  claim 12  wherein the photoacid generator is 4-methoxyphenyl phenyliodoniu m hexafluoroantimonate.  
     
     
         23 . The method of  claim 12  wherein the photoacid generator is bis(t-butylphenyl)iodonium hexafluoroantimonate or methide salts thereof.  
     
     
         24 . The method of  claim 12  wherein the oligomers have an average functionality of about 8.  
     
     
         25 . The method of  claim 12  wherein the metal structure formed in step (e) has non-linear dimensions.  
     
     
         26 . The method of  claim 25  wherein the metal structure defines a three-dimensional solid structure wherein at least one of its height, width, diameter or length is less than about 100 microns.

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