US2005158659A1PendingUtilityA1

Photosensitive resin composition for black matrix

Priority: Jan 19, 2004Filed: May 17, 2004Published: Jul 21, 2005
Est. expiryJan 19, 2024(expired)· nominal 20-yr term from priority
Inventors:Chun-Hsien Lee
G03F 7/0007Y10S430/106G03F 7/032
42
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Claims

Abstract

A photosensitive resin composition for a black matrix comprises (A) an alkali-soluble resin; (B) a photopolymerizable monomer; (C) a photoinitiator; (D) a solvent; and (E) a black pigment; wherein the alkali-soluble resin (A) comprises a functional group having a general formula (a-1); viscosity of said photosensitive resin composition for the black matrix is 0.5-4.0 cps at 25° C.; the solid content of said photosensitive resin composition is 5-25 wt. %; and said solvent (D) has a saturated vapor pressure below 4.5 mm-Hg at 20° C.; which presents no pinhole on the surface after low pressure drying, no line and cloud defect on the film, good inner uniformity of the coated film and high photosensitivity after pre-bake, high heat resistance for black matrix after post-bake; which can be coated on the substrate, specifically the large-sized substrate, of liquid crystal display by the slit coating process. (Each of R is independently H, linear or branch alkyl of C1-C5, phenyl or halogen.)

Claims

exact text as granted — not AI-modified
1 . A photosensitive resin composition for a black matrix comprising: 
 (A) an alkali-soluble resin;    (B) a photopolymerizable monomer;    (C) a photoinitiator;    (D) a solvent; and    (E) a black pigment;    wherein said alkali-soluble resin (A) comprises a functional group having a general formula (a-1)                          wherein each of R is independently H, linear or branch alkyl of C1-C5, phenyl or halogen;    wherein the viscosity of said photosensitive resin composition for the black matrix is 0.5-4.0 cps at 25° C. and the solid content of said photosensitive resin composition is 5-20 wt %;    wherein said solvent (D) has a saturated vapor pressure below 4.5 mm-Hg at 20° C.;    wherein said photosensitive resin composition is coated on an LCD substrate by slit coating.    
     
     
         2 . The composition of  claim 1  wherein the viscosity of said photosensitive resin composition for the black matrix is 0.7-3.5 cps at 25° C.  
     
     
         3 . The composition of  claim 1  wherein the viscosity of said photosensitive resin composition for the black matrix is 0.9-3.0 cps at 25° C.

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