US2005153632A1PendingUtilityA1

Methods of preparing semiconductor workpiece process fluid

Assignee: MICRON TECHNOLOGY INCPriority: Jun 3, 1999Filed: Feb 23, 2005Published: Jul 14, 2005
Est. expiryJun 3, 2019(expired)· nominal 20-yr term from priority
B24B 49/10B24B 57/02B24B 37/04
49
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Claims

Abstract

Semiconductor processor systems, systems configured to provide a semiconductor workpiece process fluid, semiconductor workpiece processing methods, methods of preparing semiconductor workpiece process fluid, and methods of delivering semiconductor workpiece process fluid to a semiconductor processor are provided. One aspect of the invention provides a semiconductor processor system including a process chamber adapted to process at least one semiconductor workpiece using a process fluid; a connection coupled with the process chamber and configured to receive the process fluid; a sensor coupled with the connection and configured to output a signal indicative of the process fluid; and a control system coupled with the sensor and configured to control at least one operation of the semiconductor processor system responsive to the signal.

Claims

exact text as granted — not AI-modified
1 - 95 . (canceled)  
   
   
       96 . A method of preparing semiconductor workpiece process fluid comprising: 
 providing plural process fluid components;    mixing the process fluid components to form a semiconductor workpiece process fluid;    monitoring at least one of the process fluid components and the process fluid; and    controlling the mixing responsive to the monitoring.    
   
   
       97 . The method according to  claim 96  wherein the monitoring comprises monitoring the process fluid.  
   
   
       98 . The method according to  claim 96  wherein the monitoring comprises monitoring both process fluid components.  
   
   
       99 . The method according to  claim 96  wherein the monitoring comprises monitoring both process fluid components and the process fluid.  
   
   
       100 . The method according to  claim 96  wherein the monitoring comprises monitoring turbidity.  
   
   
       101 . The method according to  claim 96  wherein the controlling comprises adjusting flow rates of the process fluid components.  
   
   
       102 . The method according to  claim 96  further comprising storing historical data of at least one of the process fluid components and the process fluid after the monitoring.  
   
   
       103 - 129 . (canceled)

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