US2005150455A1PendingUtilityA1

Processing apparatus and processing method

Assignee: TOKYO ELECTRON LTDPriority: Aug 13, 1999Filed: Dec 3, 2004Published: Jul 14, 2005
Est. expiryAug 13, 2019(expired)· nominal 20-yr term from priority
H10P 72/0436H10P 70/234H10P 50/283H10P 70/15H01J 2237/2001H01J 37/32192H10P 50/242
43
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Claims

Abstract

The present invention provides a processing apparatus and a processing method, both of which can carry out a low-temperature process to allow active gas species to react with an oxide film on an object to be processed to form a product film and a heating process to heat the object to a predetermined temperature to evaporate the product film, in succession. This processing apparatus 12 is provided with a shielding plate 103 capable of entering a gap between the object W and a transparent window 28 and also withdrawing from the gap. On condition that the shielding plate 103 is closed to cut off irradiation heat from the transparent window 28, the product film is formed by allowing the active gas species of NF 3 gas to react with a native oxide film on the object under the low-temperature condition. After that, upon closing the shielding plate 103, the native oxide film is removed by applying heat irradiated from a heating lamp 36 to the product film through the transparent window 28. Additionally, the apparatus includes a low-temperature processing chamber 207 allowing NF 3 gas to react with the native oxide film at a low temperature and a heating chamber 209 for heating the product film, independently.

Claims

exact text as granted — not AI-modified
1 - 9 . (canceled)  
   
   
       10 . A processing apparatus for removing an oxide film from a surface of an object to be processed, the processing apparatus comprising: 
 a processing container accommodating the object to be processed therein;    an active gas species generating unit for producing active gas species;    a heater arranged outside the processing container to heat the object to be processed;    a transparent window formed in the processing container between the heater and the object to be processed, the transparent window sheltering the interior of the processing container from the outside in an airtight manner and also allowing heating energy from the heater to pass through; and    a movable shielding plate provided in a gap between the transparent window and the object configured to shield the object from heat radiation from the transparent window, the shielding plate being extractable from and insertable into the gap.    
   
   
       11 . A processing apparatus as claimed in  claim 10  wherein the movable shielding plate is located adjacent to and along the transparent window and configured to obstruct a heat radiation from the transparent window to the object.  
   
   
       12 . A processing apparatus as claimed in  claim 10  or  11 , wherein the active gas species generating unit is configured to produce NF 3  gas.  
   
   
       13 . A processing apparatus as claimed in  claim 10  or  11 , wherein the shielding plate is provided with a cooler for cooling the shielding plate itself.  
   
   
       14 . A processing apparatus as claimed in  claim 10  or  11 , wherein the active gas species generating unit includes: 
 a plasma generating tube having a plasma generating part;    a plasma gas introducing part for supplying both N2 gas and H2 gas into the plasma generating tube; and    a NF 3  gas supplying part for adding NF 3  gas to the active gas species flowing down from an interior of the plasma generating tube.    
   
   
       15 . A processing apparatus as claimed in  claim 14 , wherein 
 the plasma generating part comprises a microwave generating source for generating microwaves and a waveguide for introducing the so-generated microwaves into the plasma generating tube.    
   
   
       16 . A processing apparatus as claimed in  claim 10 , wherein the heater is configured to be actuated after finishing the step of forming the product film.  
   
   
       17 . A processing apparatus as claimed in  claim 10 , further comprising: 
 a shaft connected with the shielding plate;    a driver arranged outside the processing container for driving the shaft; and    a seal for airtight sealing between the shaft and a wall of the processing container;    wherein the shielding plate is inserted into or extracted from a gap between the object and the transparent window by actuating the driver.    
   
   
       18 . A processing method of removing an oxide film from a surface of an object to be processed while using a processing apparatus which includes a processing container accommodating the object to be processed therein, a heater arranged outside the processing container to heat the object to be processed, a transparent window formed in the processing container between the heater and the object to be processed, and a shielding plate provided in such a way that the shielding plate can be inserted into or extracted from a gap between the object and the transparent window, the processing method comprising the steps of: 
 allowing the oxide film formed on the surface of the object to react with active gas species under a condition of low temperature oil condition that the shielding plate is closed to insulate irradiation heat irradiated from the transparent window, thereby forming a product film; and subsequently,    opening the shielding plate and applying irradiation heat irradiated from the heater to the product film through the transparent window to heat the product film to a    predetermined temperature for vaporization, thereby removing the product film.    
   
   
       19 . A processing method as claimed in  claim 18 , wherein the heater is actuated after finishing the step of forming the product.  
   
   
       20 . A processing method of removing an oxide film from a surface of an object to be processed, the processing method comprising: 
 allowing the oxide film formed on the surface of the object to react with active gas species under a condition of low temperature in a first processing chamber, thereby forming a product film;    transporting the object having the product film formed thereon from the first processing chamber to a second processing chamber; and    heating the product film formed on the surface of the object in the second processing chamber, to a predetermined temperature of vaporization, thereby removing the product film.

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