Coating installation

Abstract

The invention relates to a coating installation comprising a recipient ( 1 ) which is divided into a cathode side ( 3 ) and a substrate side ( 4 ) by means of a screen ( 2 ). The cathode side ( 3 ) and the substrate side ( 4 ) respectively have a direct extraction outlet ( 10, 16 ) and a gas admission ( 8, 14 ). The gas admission ( 8 ) on the cathode side ( 3 ) is connected to a process gas source ( 9 ) and the gas admission ( 14 ) for the substrate side ( 4 ) is connected to a reactive gas source ( 15 ).

1 . Coating installation with a vacuum chamber ( 1 ) exhibiting an suction port and a gas feed, in which a sputtering cathode ( 5 ) and a substrate holder ( 12 ) are arranged and for which the vacuum chamber ( 1 ) is divided into a cathode chamber ( 3 ) and a substrate chamber ( 4 ) by an screen ( 2 ) arranged between the sputtering cathode ( 5 ) and the substrate holder ( 12 ), characterized in that the cathode chamber ( 3 ) as well as the substrate chamber ( 4 ) each respectively exhibit a direct suction port ( 10 ,  16 ) and their own gas feed ( 8 ,  14 ), and that the gas feed ( 8 ) into the cathode chamber ( 3 ) is connected to a process gas source ( 9 ) and that the gas feed ( 14 ) for the substrate chamber ( 4 ) is connected to a reactive gas source ( 15 ).  
   
   
       2 . Coating installation in accordance with  claim 1 , characterized in that the cathode chamber ( 3 ) and the substrate chamber ( 4 ) are each respectively connected to their own vacuum pump stand ( 11 ,  17 ).  
   
   
       3 . Coating installation in accordance with  claim 1 , characterized in that in the cathode chamber ( 3 ) as well as in the substrate chamber ( 4 ), the gas feed ( 8 ,  14 ) and the suction port ( 10 ,  16 ) are arranged on opposite sides.  
   
   
       4 . Coating installation according to  claim 1 , characterized in that an anode ( 7 ) is arranged in the vacuum chamber ( 1 ) between the sputtering cathode ( 5 ) and the substrate ( 13 ).  
   
   
       5 . Coating installation in accordance with  claim 1 , characterized in that the anode ( 7 ) in the substrate chamber ( 4 ) is arranged to be covered by the screen ( 2 ) between the screen ( 2 ) and the substrate holder ( 12 ).  
   
   
       6 . Coating installation in accordance with  claim 1 , characterized in that the anode ( 7 ) is formed by two unheated tubes.  
   
   
       7 . Coating installation in accordance with  claim 1 , characterized in that the anode ( 7 ) simultaneously forms the screen ( 2 ).  
   
   
       8 . Coating installation in accordance with  claim 1 , characterized in that the sputtering cathode ( 5 ) is a double magnetron cathode.  
   
   
       9 . Coating installation in accordance with  claim 1 , characterized in that the sputtering cathode ( 5 ) is a rotating cathode.  
   
   
       10 . Coating installation in accordance with  claim 1 , characterized in that a metering device ( 18 ) for reactive gas is arranged in the cathode chamber ( 3 ) and that the regulated output ( 19 ) of the sputtering cathode ( 5 ) exhibited in the coating installation is directly dependent on the concentration of the reactive gas in the cathode chamber ( 3 ).  
   
   
       11 . Coating installation in accordance with  claim 1 , characterized in that the ratio of the focal aperture length of the screen ( 2 ), measured in the transport direction of the substrate ( 13 ), to the width of the sputtering cathode ( 5 ), measured in the transport direction of the substrate ( 13 ), amounts to less than 0.75, preferably to between 0.5 and 0.3.