Method and data-processing system for rule-based optical proximity correction with simulataneous scatter bar insertion

Abstract

Lithographic fabrication of a microelectronic component is performed with the aid of OPC and a scatter bar structure. At least one scatter bar is applied on a mask in addition to a main structure for the purpose of a subsequent imaging of the main structure from the mask onto a substrate by exposure. At least one correction value for the OPC is selected in a particular manner in dependence upon a spacing between two parts of the main structure or a spacing between neighboring main structures and the presence of a scatter bar between the two parts of the main structure. The manner in which the correction value is defined is determined by so forming an auxiliary quantity for each scatter bar, that the largest auxiliary quantity that is set is less than the smallest spacing between the parts of the main structure, so that in a program for OPC the presence of a scatter bar between the two parts of the main structure is suggested. In this way, correction values for a rule-based OPC method are flexibly defined even in the presence of scatter bars.

1 . A data processing system for defining data representing a layout of a microelectronic component, comprising: 
 means for defining data representing a main structure of the microelectronic component containing a number of microelectronic elements separated by first spacings;    means for defining data representing a first auxiliary structure containing one or more auxiliary elements respectively separated from one of the microelectronic elements by a second spacing;    means for defining data representing a second auxiliary structure by adapting the data representing the auxiliary elements by modifying the second spacings; and    means for carrying out an optical proximity correction with the data representing the main structure and the second auxiliary structure.    
   
   
       2 . The data processing system according to  claim 1 , wherein the first auxiliary structure is a scatter bar structure, and the auxiliary elements are one or more scatter bars.  
   
   
       3 . The data processing system according to  claim 1 , wherein the optical proximity correction is an OPC selected from the group consisting of line-bias based OPC, hammerhead based OPC, and serif based OPC.