US2005142284A1PendingUtilityA1

Method for manufacturing a plated substrate adapted for hard disk medium

Priority: Aug 26, 2002Filed: Feb 28, 2005Published: Jun 30, 2005
Est. expiryAug 26, 2022(expired)· nominal 20-yr term from priority
G11B 5/8404G11B 5/73915Y10T428/12847Y10T428/12854Y10T428/12931
45
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Claims

Abstract

In plating on an Si substrate, it has been strongly demanded to apply a treatment for providing an excellent adhesion so as to resist a post-processing such as polishing and for facilitating plating. Then, provided is a plated substrate adapted for hard disk medium comprising an Si single crystal; an amorphous layer on the substrate, the amorphous layer having thickness of 2 to 200 nm and containing Si and one or more metals selected from a group consisting of Ni, Cu and Ag; a multicrystal layer on the amorphous layer, the multicrystal layer having thickness of 5 to 1000 nm and containing Si and one or more metals selected from a group consisting of Ni, Cu and Ag. Moreover, provided is a method for manufacturing a plated substrate adapted for hard disk medium comprising steps of applying a chemical etching treatment of a natural oxide film and a surface Si portion on an Si single crystal substrate; and forming a film on the etched surface of the substrate in a sulfate or hydrochloride bath containing no reductant within a pH range of 7.2 to 12.8 at liquid temperature of 70 to 100° C.

Claims

exact text as granted — not AI-modified
1 . (canceled)  
     
     
         2 . A method for manufacturing a plated substrate adapted for hard disk medium comprising steps of: 
 applying a chemical etching treatment of a natural oxide film and a surface Si portion on an Si single crystal substrate, and    forming a film on the etched surface of the substrate in a sulfate or hydrochloride bath containing no reductant within a pH range of 7.2 to 12.8 at liquid temperature of 70 to 100° C.    
     
     
         3 . The method for manufacturing a plated substrate adapted for hard disk medium according to  claim 2 , wherein a heavy metal component in said sulfate bath is one or more selected from the group consisting of Ni, Cu and Ag.  
     
     
         4 . The method for manufacturing a plated substrate adapted for hard disk medium according to  claim 2 , wherein said pH range is controlled by an addition of ammonia.  
     
     
         5 . The method for manufacturing a plated substrate adapted for hard disk medium according to  claim 3 , wherein said pH range is controlled by an addition of ammonia.

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