Method for manufacturing a plated substrate adapted for hard disk medium
Abstract
In plating on an Si substrate, it has been strongly demanded to apply a treatment for providing an excellent adhesion so as to resist a post-processing such as polishing and for facilitating plating. Then, provided is a plated substrate adapted for hard disk medium comprising an Si single crystal; an amorphous layer on the substrate, the amorphous layer having thickness of 2 to 200 nm and containing Si and one or more metals selected from a group consisting of Ni, Cu and Ag; a multicrystal layer on the amorphous layer, the multicrystal layer having thickness of 5 to 1000 nm and containing Si and one or more metals selected from a group consisting of Ni, Cu and Ag. Moreover, provided is a method for manufacturing a plated substrate adapted for hard disk medium comprising steps of applying a chemical etching treatment of a natural oxide film and a surface Si portion on an Si single crystal substrate; and forming a film on the etched surface of the substrate in a sulfate or hydrochloride bath containing no reductant within a pH range of 7.2 to 12.8 at liquid temperature of 70 to 100° C.
Claims
exact text as granted — not AI-modified1 . (canceled)
2 . A method for manufacturing a plated substrate adapted for hard disk medium comprising steps of:
applying a chemical etching treatment of a natural oxide film and a surface Si portion on an Si single crystal substrate, and forming a film on the etched surface of the substrate in a sulfate or hydrochloride bath containing no reductant within a pH range of 7.2 to 12.8 at liquid temperature of 70 to 100° C.
3 . The method for manufacturing a plated substrate adapted for hard disk medium according to claim 2 , wherein a heavy metal component in said sulfate bath is one or more selected from the group consisting of Ni, Cu and Ag.
4 . The method for manufacturing a plated substrate adapted for hard disk medium according to claim 2 , wherein said pH range is controlled by an addition of ammonia.
5 . The method for manufacturing a plated substrate adapted for hard disk medium according to claim 3 , wherein said pH range is controlled by an addition of ammonia.Join the waitlist — get patent alerts
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