Pipe structure, alignment apparatus, electron beam lithography apparatus, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor device manufacturing factory

Abstract

An exposure apparatus includes a movable stage which aligns a substrate in a vacuum chamber, and a pipe structure coupled to the stage. The pipe structure has a double pipe having a resin inner pipe and a resin outer pipe covering an outside of the inner pipe, and a discharge mechanism for discharging fluid in a space between the inner pipe and the outer pipe. A pressure in the vacuum chamber is less than a pressure in the space between the inner pipe and the outer pipe.

1 - 25 . (canceled)  
     
     
         26 . An exposure apparatus comprising: 
 a movable stage which aligns a substrate in a vacuum chamber; and    a pipe structure coupled to the stage, wherein the pipe structure has a double pipe having a resin inner pipe and a resin outer pipe covering an outside of the inner pipe, and a discharge mechanism for discharging fluid in a space between the inner pipe and the outer pipe,    wherein pressure in the vacuum chamber is less than pressure in the space between the inner pipe and the outer pipe of the pipe structure.    
     
     
         27 . The apparatus according to  claim 26 , wherein the inner pipe supplies fluid to the stage.  
     
     
         28 . The apparatus according to  claim 26 , wherein the space between the inner pipe and the outer pipe is maintained to be a vacuum atmosphere.  
     
     
         29 . The apparatus according to  claim 26 , wherein the inner pipe and the outer pipe are formed from a resin material different from each other.  
     
     
         30 . The apparatus according to  claim 29 , wherein the inner pipe is formed from a more flexible resin material than that of the outer pipe.  
     
     
         31 . The apparatus according to  claim 29 , wherein the outer pipe is formed from a resin material so that an occurrence of degassing of the outer pipe is less than that of the inner pipe.  
     
     
         32 . The apparatus according to  claim 29 , wherein the outer pipe is thinner than the inner pipe.  
     
     
         33 . The apparatus according to  claim 29 , wherein the outer pipe has a thickness of about 10 μm to about 100 μm.  
     
     
         34 . The apparatus according to  claim 26 , wherein the inner pipe or the outer pipe has a bellows structure or coil shape.  
     
     
         35 . The apparatus according to  claim 26 , wherein the inner pipe in the outer pipe includes a plurality of inner pipes.  
     
     
         36 . An exposure apparatus comprising: 
 a movable stage which aligns a substrate in a vacuum chamber; and    a pipe structure coupled to the stage, wherein the pipe structure has a double pipe having a resin inner pipe and a resin outer pipe covering an outside of the inner pipe, and a discharge mechanism for discharging fluid in a space between the inner pipe and the outer pipe,    wherein the space between the inner pipe and the outer pipe of the pipe structure is maintained to be a vacuum atmosphere.    
     
     
         37 . The apparatus according to  claim 36 , wherein the inner pipe supplies fluid to the stage.  
     
     
         38 . The apparatus according to  claim 36 , the inner pipe and the outer pipe are formed from a resin material different from each other.  
     
     
         39 . The apparatus according to  claim 38 , wherein the inner pipe is formed from a more flexible resin material than that of the outer pipe.  
     
     
         40 . The apparatus according to  claim 38 , wherein the outer pipe is formed from a resin material so that an occurrence of degassing of the outer pipe is less than that of the inner pipe.  
     
     
         41 . The apparatus according to  claim 36 , wherein the outer pipe is thinner than the inner pipe.  
     
     
         42 . The apparatus according to  claim 36 , wherein the outer pipe has a thickness of about 10 μm to about 100 μm.  
     
     
         43 . The apparatus according to  claim 36 , wherein the inner pipe or the outer pipe has a bellows structure or coil shape.  
     
     
         44 . The apparatus according to  claim 36 , wherein the inner pipe in the outer pipe includes a plurality of inner pipes.