Sensor device for non-intrusive diagnosis of a semiconductor processing system

Abstract

A sensor device, for diagnosing a processing system, generally includes a support platform and one or more sensors mounted on the support platform. The sensor senses a condition, such as direction or inclination or acceleration in one or two axes, of the sensor device and outputs a signal indicative thereof, which is then transferred to a device on or near the processing system. The support platform generally has physical characteristics, such as size, profile height, mass, flexibility and/or strength, substantially similar to those of the substrates that are to be processed in the processing system, so the sensor device can be transferred through the processing system in a manner similar to the manner in which production substrates are transferred through the processing system.

1 . An apparatus for providing information from within a processing system, the apparatus comprising: 
 a support platform adapted for robotic transfer between a central transfer chamber and a substrate support structure in a vacuum processing chamber of the processing system; and    a device disposed on the support platform for obtaining a signal indicative of information obtained from within the processing system.    
   
   
       2 . The apparatus of  claim 1 , wherein the support platform and the device are sized to pass through a slit valve separating the central transfer chamber and the processing chamber.  
   
   
       3 . The apparatus of  claim 1 , wherein the information provided by the device is indicative of the position of the support platform within the processing system.  
   
   
       4 . The apparatus of  claim 1 , wherein the device provides optical information.  
   
   
       5 . An apparatus for providing information from within a processing system, the apparatus comprising: 
 a support platform adapted for robotic transfer between a central transfer chamber and a substrate support structure in a vacuum processing chamber of the processing system; and    a transmitter coupled to the support platform and adapted to broadcast a signal indicative of information obtained from within the processing system, wherein the transmitter is configured to transmit the signal.    
   
   
       6 . The apparatus of  claim 5 , further comprising a receiver disposed remotely from the support platform for receiving the wireless signal from the transmitter.  
   
   
       7 . The apparatus of  claim 6 , wherein the receiver is disposed outside the processing system.  
   
   
       8 . The apparatus of  claim 7 , wherein the receiver is mounted to an exterior of the processing system.  
   
   
       9 . An apparatus for providing information from within a processing system, the apparatus comprising: 
 a support platform adapted for robotic transport between a central transfer chamber and at least one processing chamber; and    a temperature sensor disposed on the support platform.    
   
   
       10 . The apparatus of  claim 9 , wherein the apparatus is sized to pass through a slit valve separating the central transfer chamber and the at least one processing chamber.  
   
   
       11 . The apparatus of  claim 9 , wherein the temperature sensor measures a temperature of a process gas within the at least one processing chamber.  
   
   
       12 . The apparatus of  claim 11 , further comprising: 
 a device disposed remotely from the support platform for receiving the temperature of the process gas.    
   
   
       13 . The apparatus of  claim 9 , wherein the temperature sensor transfers an optical signal indicative of temperature information.  
   
   
       14 . A method of providing information from within a processing system, the method comprising: 
 attaching a device for obtaining information from within the processing system to a support platform adapted for robotic transfer between a central transfer chamber and a substrate support structure in a vacuum processing chamber of the processing system;    utilizing the device to collect information obtained from within the processing system; and    removing the device from the processing chamber.    
   
   
       15 . The method of  claim 14 , wherein the information comprises optical information.  
   
   
       16 . The method of  claim 14 , wherein the information comprises information indicative of the position of the support platform within the processing system.  
   
   
       17 . The method of  claim 14 , wherein the device is a temperature sensor that measures a temperature of a process gas within the processing chamber.  
   
   
       18 . The method of  claim 14 , wherein the device is a temperature probe having an array of temperature sensors configured to detect a thermal gradient across the length of the probe.  
   
   
       19 . The method of  claim 14 , wherein the device provides a metric indicative of motion of the support platform within the processing system.  
   
   
       20 . The method of  claim 14 , wherein the device measures a temperature of the support platform.