Fine particle film forming apparatus and method and semiconductor device and manufacturing method for the same

Abstract

After a barrier film is formed on a pad electrode, Ni particles having a diameter of 2 μm or less are selectively deposited on the barrier film, thereby forming a Ni fine particle film. Then, a bump electrode made of a solder ball is provided on the pad electrode through the Ni fine particle film. Thereafter, the bump electrode is melted by a heat treatment to join the Ni fine particle film to the bump electrode. Thus, a bump electrode structure is finished.

1 . A fine particle film forming apparatus, comprising: 
 a vessel having a gas inlet for introducing a gas therein provided on one of its ends and having a gas blow-off nozzle for blowing off a gas containing fine particles to an outside provided on another of its ends;    a gas flow forming portion for forming a constant gas flow in the vessel from the gas inlet toward the gas blow-off nozzle;    a target provided in the vessel for acting as a fine particle source;    a fine particle generating portion for irradiating light on a main surface of the target, thereby discharging a component of the target into the gas flow to form the fine particles made of the component in the gas flow; and    a moving portion for moving the vessel.    
   
   
       2 . A fine particle film forming apparatus, comprising: 
 a vessel having a gas inlet for introducing a gas therein provided on one of its ends and having a gas blow-off nozzle for blowing off a gas containing fine particles to an outside provided on another of its ends;    a gas flow forming portion for forming a constant gas flow in the vessel from the gas inlet toward the gas blow-off nozzle;    a target provided in the vessel for acting as a fine particle source;    a fine particle generating portion for irradiating light on a main surface of the target, thereby discharging a component of the target into the gas flow to form the fine particle made of the component in the gas flow;    a moving portion for moving the vessel; and    a magnetic field forming portion for forming a magnetic field in a region on the substrate.    
   
   
       3 . A fine particle film forming apparatus according to  claim 1 , wherein the blow-off nozzle has a slit-shaped nozzle or a nozzle having a plurality of spot-shaped nozzles arranged rectilinearly.  
   
   
       4 . A fine particle film forming apparatus according to  claim 2 , wherein the blow-off nozzle has a slit-shaped nozzle or a nozzle having a plurality of spot-shaped nozzles arranged rectilinearly.  
   
   
       5 . A fine particle film forming apparatus according to  claim 1 , wherein the main surface of the target is held in a direction of the gas flow.  
   
   
       6 . A fine particle film forming apparatus according to  claim 2 , wherein the main surface of the target is held in a direction of the gas flow.  
   
   
       7 . A fine particle film forming apparatus according to  claim 1 , wherein the target has a cylindrical shape, the main surface of the target is a cylindrical side face, and the target is rotatable around a rotary shaft parallel with the main surface which is a symmetry axis of a cylinder.  
   
   
       8 . A fine particle film forming apparatus according to  claim 2 , wherein the target has a cylindrical shape, the main surface of the target is a cylindrical side face, and the target is rotatable around a rotary shaft parallel with the main surface which is a symmetry axis of a cylinder.  
   
   
       9 . A fine particle film forming apparatus according to  claim 1 , wherein the target has a disc shape, the main surface of the target is a bottom face or a top face of a disc, and the target is rotatable around a rotary shaft which passes through a center of the main surface and is perpendicular to the main surface.  
   
   
       10 . A fine particle film forming apparatus according to  claim 2 , wherein the target has a disc shape, the main surface of the target is a bottom face or a top face of a disc, and the target is rotatable around a rotary shaft which passes through a center of the main surface and is perpendicular to the main surface.  
   
   
       11 . A fine particle film forming apparatus according to  claim 1 , wherein the main surface of the target is divided into at least a first region and a second region, the first and second regions being made of different components.  
   
   
       12 . A fine particle film forming apparatus according to  claim 2 , wherein the main surface of the target is divided into at least a first region and a second region, the first and second regions being made of different components.  
   
   
       13 . A fine particle film forming apparatus according to  claim 1 , further comprising a temperature control portion for controlling a temperature of an atmosphere around the target in the vessel.  
   
   
       14 . A fine particle film forming apparatus according to  claim 2 , further comprising a temperature control portion for controlling a temperature of the target.  
   
   
       15 . A fine particle film forming apparatus according to  claim 1 , wherein the fine particle forming portion includes a light irradiating portion for irradiating light, and a light irradiating portion for simultaneously irradiating light on a plurality of places on the target in a direction which is substantially perpendicular to the gas flow or for sequentially irradiating the light on the places, respectively.  
   
   
       16 . A fine particle film forming apparatus according to  claim 2 , wherein the fine particle forming portion includes a light irradiating portion for irradiating the light, and a light irradiating portion for simultaneously irradiating light on a plurality of places on the target in a direction which is substantially perpendicular to the gas flow or for sequentially irradiating the light on the places, respectively.  
   
   
       17 . A method for forming a fine particle film, comprising the steps of: 
 preparing a target as a fine particle source;    irradiating light on a main surface of the target, thereby discharging a component of the target to an outside;    forming fine particles from the discharged component; and    carrying the fine particles on a gas flow to a surface of a substrate, thereby forming a fine particle film made of the fine particle on the substrate.    
   
   
       18 .- 49 . (canceled)