US2005112298A1PendingUtilityA1

Method for making sol gel spacers for flat panel displays

43
Assignee: MICRON TECHNOLOGY INCPriority: Apr 26, 2000Filed: Nov 1, 2004Published: May 26, 2005
Est. expiryApr 26, 2020(expired)· nominal 20-yr term from priority
Inventors:James J. HofmannBrian A. VaartstraBrenda D. KrausDonald L. Westmoreland
G02F 1/13394G03F 7/0017B29C 33/3857C09K 2323/05H01J 2211/36G02F 1/1339
43
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Claims

Abstract

The present invention describes thick film photolithographic molds, methods of making thick film photolithographic molds, and methods of using thick film photolithographic molds to form spacers on a substrate. The thick film photolithographic molds preferably comprise an epoxy bisphenol A novolac resin. The present invention also describes sol gel spacers comprising sodium silicates and potassium silicates. The thick film photolithographic molds and sol gel spacers of the present invention can be used in flat panel displays, such as field emission displays and plasma displays.

Claims

exact text as granted — not AI-modified
1 . A mold for forming spacers on a flat panel display comprising a photolithographic material.  
     
     
         2 . The mold of  claim 1 , wherein the photolithographic material is an epoxy bisphenol A novolac resin.  
     
     
         3 . The mold of  claim 2 , wherein the epoxy bisphenol A novolac resin is SU-8.  
     
     
         4 . The mold of  claim 2 , further comprising a crosslinking agent.  
     
     
         5 . The mold of  claim 4 , wherein the crosslinking agent is a polyol.  
     
     
         6 . A mold for forming spacers on a flat panel display comprising a photolithographic material, wherein the photolithographic material comprises anepoxy bisphenol A novolac resin and a crosslinking agent.  
     
     
         7 . The mold of  claim 6 , wherein the epoxy bisphenol A novolac resin is SU-8.  
     
     
         8 . The mold of  claim 6 , wherein the crosslinking agent is a polyol.  
     
     
         9 . The mold of  claim 8 , wherein the polyol is at least one of triol and a diol.  
     
     
         10 . The mold of  claim 9 , wherein the polyol is a diol.  
     
     
         11 . The mold of  claim 10 , wherein the diol is at least one of a propanediol, a hexanediol and an ethylene glycol.  
     
     
         12 . The mold of  claim 10 , wherein the ratio of terminal groups in the epoxy bisphenol A novolac resin to terminal groups in the diol is about 1.5 to about 1.  
     
     
         13 . A mold for forming spacers on a flat panel display, wherein the mold is prepared by the process comprising: 
 preparing a composition comprising a photolithographic material;    applying the composition on a support;    applying a photomask over the composition;    curing exposed portions of the composition; and    removing un-cured portions of the composition to reveal the mold.    
     
     
         14 . The mold of  claim 13 , wherein the photolithographic material is an epoxy bisphenol A novolac resin.  
     
     
         15 . The mold of  claim 14 , wherein the epoxy bisphenol A novolac resin is SU-8.  
     
     
         16 . The mold of  claim 13 , wherein the composition further comprises a crosslinking agent.  
     
     
         17 . The mold of  claim 16 , wherein the crosslinking agent is a diol.  
     
     
         18 . The mold of  claim 17 , wherein the diol is propanediol, hexanediol or ethylene glycol.  
     
     
         19 . The mold of  claim 13 , wherein the composition further comprises a solvent and a photoinitiator.  
     
     
         20 . The mold of  claim 19 , wherein the photolithographic material is present in an amount of 200-600 parts by weight, wherein the solvent is present in an amount of 200-600 parts by weight, and wherein the photoinitiator is present in an amount of about 1-100parts by weight.  
     
     
         21 . The mold of  claim 13 , further comprising priming the support with a priming agent prior to applying the composition on the support.  
     
     
         22 . The mold of  claim 13 , wherein the mold is a negative mold.  
     
     
         23 . The mold of  claim 13 , wherein the mold is a positive mold.  
     
     
         24 . A method for adjusting the adhesion between a support and a photolithographic material comprising: 
 providing a support;    applying a priming agent to the support;    preparing a composition comprising a photolithographic material; and applying the composition on the support.    
     
     
         25 . The method of  claim 24 , wherein the priming agent comprises at least one polyol.  
     
     
         26 . The method of  claim 25 , wherein at least one polyol is triethanol amine or ethylene glycol.  
     
     
         27 . The method of  claim 24 , wherein the priming agent is a silane bonding agent.  
     
     
         28 . The method of  claim 27 , wherein the silane bonding agent comprises a silane, a cyclohexane and an epoxy group.  
     
     
         29 . The method of  claim 27 , wherein the silane bonding agent is 2(3,4-epoxycyclohexyl)ethyltrimethoxysilane.  
     
     
         30 . The method of  claim 24 , wherein the priming agent is at least one of phosphoric acid, hydrochloric acid, NH 4 OH, KOH, HF, and NH 4 OH:H 2 O 2 .  
     
     
         31 . The method of  claim 24 , wherein the photolithographic material comprises an epoxy bisphenol A novolac resin.  
     
     
         32 . The method of  claim 31 , wherein the epoxy bisphenol A novolac resin is SU-8.  
     
     
         33 . The method of  claim 31 , wherein the photolithographic material further comprises a crosslinking agent.  
     
     
         34 . A method for forming a negative mold for forming spacers on a flat panel display comprising: 
 providing a positive mold comprising at least one post and a photolithographic material;    covering the positive mold with a composition;    allowing the composition to harden; and    removing the positive mold to reveal the negative mold comprising the hardened composition.    
     
     
         35 . The method of  claim 34 , wherein the photolithographic material comprises an epoxy bisphenol A novolac resin.  
     
     
         36 . The method of  claim 35 , wherein the epoxy bisphenol A novolac resin is SU-8.  
     
     
         37 . The method of  claim 35 , wherein the photolithographic material further comprises a crosslinking agent.  
     
     
         38 . The method of  claim 34 , wherein the composition comprises latex.  
     
     
         39 . A mold for forming spacers on a flat panel display prepared by the process comprising: 
 adding a dry photolithographic material to a mixture comprising a solvent and a photoinitiator;    applying the mixture to a support;    heating the mixture until the mixture forms a flowable composition on the support;    applying a photomask over the composition;    curing exposed portions of the composition; and    removing un-cured portions of the composition to reveal the mold.    
     
     
         40 . The mold of  claim 39 , wherein the photolithographic material comprises an epoxy bisphenol A novolac resin.  
     
     
         41 . The mold of  claim 40 , wherein the epoxy bisphenol A novolac resin is SU-8.  
     
     
         42 . The mold of  claim 40 , wherein the photolithographic material further comprises a crosslinking agent.  
     
     
         43 . The mold of  claim 39 , wherein the photolithographic material is present in an amount of 200-600 parts by weight, wherein the solvent is present in an amount of 200-600 parts by weight, and wherein the photoinitiator is present in an amount of about 1-100parts by weight.  
     
     
         44 . The mold of  claim 39 , further comprising priming the support with a priming agent prior to applying the mixture on the support.  
     
     
         45 . The mold of  claim 44 , wherein the priming agent comprises at least one polyol.  
     
     
         46 . The mold of  claim 44 , wherein the priming agent comprises at least one of triethanol amine, ethylene glycol, 2(3,4-epoxycyclohexyl)ethyltrimethoxysilane, phosphoric acid, hydrochloric acid, NH 4 OH, KOH, HF, and NH 4 OH:H 2 O 2 .  
     
     
         47 . A method for forming a mold comprising: 
 providing a support;    placing alignment marks on the support;    applying a thick film photolithographic material on the support, wherein the thick film photolithographic material is positioned within the alignment marks on the support; and    curing the thick film photolithographic material to form the mold.    
     
     
         48 . The method of  claim 47 , wherein the photolithographic material comprises an epoxy bisphenol A novolac resin.  
     
     
         49 . The method of  claim 48 , wherein the epoxy bisphenol A novolac resin is SU-8.  
     
     
         50 . The method of  claim 48 , wherein the photolithographic material further comprises a crosslinking agent.  
     
     
         51 . The method of  claim 47 , further comprising priming the support with a priming agent prior to applying the thick film photolithographic material on the support.  
     
     
         52 . A method for forming a mold comprising: 
 providing a support;    placing alignment marks on the support;    applying a transparent photolithographic material over the support;    placing a photomask on the photolithographic material, wherein the photomask is positioned within the alignment marks on the support;    curing the photolithographic material; and    removing the un-cured photolithographic material to reveal the mold.    
     
     
         53 . The method of  claim 52 , wherein the photolithographic material comprises an epoxy bisphenol A novolac resin.  
     
     
         54 . The method of  claim 53 , wherein the epoxy bisphenol A novolac resin is SU-8.  
     
     
         55 . The method of  claim 53 , wherein the photolithographic material further comprises a crosslinking agent.  
     
     
         56 . The method of  claim 52 , further comprising priming the support with a priming agent prior to applying the transparent photolithographic material on the support.  
     
     
         57 . A method of forming at least one spacer on a substrate comprising: applying a negative mold on a substrate, wherein the negative mold comprises a photolithographic material, and at least one hole; 
 applying a spacer material to the negative mold, wherein the spacer material fills the at least one hole;    hardening and bonding the spacer material to the substrate; and    removing the negative mold from the substrate, wherein the hardened spacer material remains bonded to the substrate.    
     
     
         58 . The method of  claim 57 , wherein the method is performed in a vacuum.  
     
     
         59 . The method of  claim 57 , wherein the photolithographic material comprises an epoxy bisphenol A novolac resin.  
     
     
         60 . The method of  claim 59 , wherein the epoxy bisphenol novolac resin is SU-8.  
     
     
         61 . The method of  claim 57 , wherein the spacer material comprises a sodium silicate and a potassium silicate.  
     
     
         62 . The method of  claim 57 , wherein the substrate is the face plate or the base plate of a flat panel display.  
     
     
         63 . A method of forming a spacer on a substrate comprising: preparing a mold comprising at least one hole; 
 filling the at least one hole in the mold with a spacer material; contacting the mold with a substrate;    allowing the spacer material to harden and bond to the substrate; and removing the mold from the substrate, wherein the hardened spacer material remains bonded to the substrate.    
     
     
         64 . The method of  claim 63 , wherein the spacer material comprises a sodium silicate and a potassium silicate.  
     
     
         65 . The method of  claim 63 , wherein the substrate is the face plate or the base plate of a flat panel display.  
     
     
         66 . A spacer for a flat panel display comprising sodium silicate and potassium silicate.  
     
     
         67 . A method for preparing a spacer for a flat panel display comprising: 
 preparing a composition comprising formamide, potassium silicate and sodium silicate;    allowing the composition to form a gel; and    firing the gel to produce the spacer.    
     
     
         68 . A flat panel display comprising: 
 a face plate;    a base plate; and    at least one spacer between the face plate and the base plate, wherein the spacer comprises a sodium silicate and a potassium silicate.    
     
     
         69 . A method of forming spacers on a display comprising: 
 providing a resilient negative mold, the negative mold comprising a first layer and a second layer, the first layer being characterized by a first durometer, the second layer being characterized by a second durometer, the second durometer being higher than the first durometer, the first layer defining a plurality of apertures and a plurality of vacuum pump out channels;    placing the negative mold in contact with a substrate;    using the vacuum pump out channels to remove gas from between the substrate and the negative mold;    filling the apertures with a spacer material;    allowing some of the spacer material to cure and to become attached to the substrate;    separating the substrate from the negative mold.    
     
     
         70 . A method according to  claim 69 , wherein the negative mold comprises an alignment sheet, the alignment sheet defining at least two alignment apertures.  
     
     
         71 . A method according to  claim 70 , wherein the alignment sheet is metallic.

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